The trademarks of the products mentioned in this manual are held by the companies that
produce them.
INFICON®, Transpector®, and FabGuard® are registered trademarks and FabGuard Explorer™ is a
trademark of INFICON.
Windows®, Windows NT® and Microsoft® are registered trademarks of Microsoft Corporation.
Teflon® is a registered trademark of DuPont Co.
Swagelok® is a registered trademark of Swagelok Co.
All other brand and product names are trademarks or registered trademarks of their respective companies.
The information contained in this manual is believed to be accurate and reliable. However, INFICON assumes
no responsibility for its use and shall not be liable for any special, incidental, or consequential damages related
to the use of this product.
This is to certify that this equipment, designed and manufactured by:
INFICON Inc.
Two Technology Place
East Syracuse, NY 13057
USA
meets the essential safety requirem ents of the European Union and is plac ed on the market accordingly.
has been constructed in accordance with good engineering practice in safety matters in force in the
Community and does not endanger the safety of persons, domestic animals or property when properly
installed and maintained and used in applications for which it was made.
Equipment Description: CPM Pumping Packages including vacuum pumps and controllers.
ITY
It
Transpector and sensor not included.
Applicable Directives: 73/23/EEC as amended by 93/68/EEC
Applicable Standards: EN 61010-1:2001
CE Implementation Date: September 2, 2005
Authorized Representative: Duane H. Wright
INFICON Inc.
This DOC only covers systems that include a Pfeiffer Vacuum turbopump.
89/336/EEC as amended by 93/68/EEC
EN 61326-1:A1:1998/A2:2001, Class A, Emissions per Table 3;
Immunity per Table A.1
Quality Assurance Manager, ISS
ANY QUESTIONS RELATIVE TO THIS DECLARATION OR TO THE SAFETY OF INFICON'S PR ODUCTS SHOULD BE DIRECTED,
IN WRITING, TO THE QUALITY ASSURANCE DEPARTMENT AT THE ABOVE ADDRESS.
09/02/05
Warranty
WARRANTY AND LIABILITY - LIMITATION: Seller warrants the products
manufactured by it, or by an affiliated company and sold by it, and described on
the reverse hereof, to be, for the period of warranty coverage specified below, free
from defects of materials or workmanship under normal proper use and service.
The period of warranty coverage is specified for the respective products in the
respective Seller instruction manuals for those products but shall not be less than
one (1) year from the date of shipment thereof by Seller. Seller's liability under this
warranty is limited to such of the above products or parts thereof as are returned,
transportation prepaid, to Seller's plant, not later than thirty (30) days after the
expiration of the period of warranty coverage in respect thereof and are found by
Seller's examination to have failed to function properly because of defective
workmanship or materials and not because of improper installation or misuse and
is limited to, at Seller's election, either (a) repairing and returning the product or
part thereof, or (b) furnishing a replacement product or part thereof, transportation
prepaid by Seller in either case. In the event Buyer discovers or learns that a
product does not conform to warranty, Buyer shall immediately notify Seller in
writing of such non-conformity, specifying in reasonable detail the nature of such
non-conformity. If Seller is not provided with such written notification, Seller shall
not be liable for any further damages which could have been avoided if Seller had
been provided with immediate written notification.
THIS WARRANTY IS MADE AND ACCEPTED IN LIEU OF ALL OTHER
WARRANTIES, EXPRESS OR IMPLIED, WHETHER OF MERCHANTABILITY OR
OF FITNESS FOR A PARTICULAR PURPOSE OR OTHERWISE, AS BUYER'S
EXCLUSIVE REMEDY FOR ANY DEFECTS IN THE PRODUCTS TO BE SOLD
HEREUNDER. All other obligations and liabilities of Seller, whether in contract or
tort (including negligence) or otherwise, are expressly EXCLUDED. In no event
shall Seller be liable for any costs, expenses or damages, whether direct or
indirect, special, incidental, consequential, or other, on any claim of any defective
product, in excess of the price paid by Buyer for the product plus return
transportation charges prepaid.
No warranty is made by Seller of any Seller product which has been installed,
used or operated contrary to Seller's written instruction manual or which has been
subjected to misuse, negligence or accident or has been repaired or altered by
anyone other than Seller or which has been used in a manner or for a purpose for
which the Seller product was not designed nor against any defects due to plans or
instructions supplied to Seller by or for Buyer.
This manual is intended for private use by INFICON® Inc. and its customers.
Contact INFICON before reproducing its contents.
NOTE: These instructions do not provide for every contingency that may arise in
connection with the installation, operation or maintenance of this equipment.
Should you require further assistance, please contact INFICON.
This product is not for use in a manner not specified by
the manufacturer.
There are no user serviceable components within the
instrument case.
Transpector CPM Operating Manual
Chapter 1
Getting Started
Potentially lethal voltages are present when the line cord
is connected.
Refer all maintenance to qualified personnel.
IPN 074-430-P1F
1 - 1
Transpector CPM Operating Manual
1.2 Introduction
This manual provides information regarding the operation of the INFICON® CPM
Gas Analysis System. This chapter provides an overview of the CPM system.
1.2.1 Purpose of the CPM System
The CPM system is designed to sample a representative fraction of a process
environment and direct the gas sample to the ionization region of a Residual Gas
Analyzer (RGA). The CPM has a dry pumping package that is small, light weight,
and portable. The CPM can detect levels of impurities in process gases at sub-ppm
levels for many components.
1.2.2 Description of the CPM System
The CPM system is comprised of:
FabGuard® or FabGuard Explorer™ software, works with the CPM system
to provide automatic or manual control as well as status information. The
software provides automatic valve control through recipes and manual control
of all components. It includes a full array of basic residual gas analyzer (RGA)
features, including Spectrum or Selected Peaks scanning, Leak Detection and
Recipe Generation.
Quadrupole Sensor, analyzes gases by: (1) ionizing the gas molecules, (2)
separating the ions by their mass-to-charge ratio, and (3) measuring the
quantity of ions at each mass. The sensor can indicate the partial pressures of
gases characteristic of processes occurring within a vacuum or other vessel,
and therefore can be used to investigate the nature of a process or to monitor
process conditions.
Electronics Module (Transpector® 2), controls the sensor. The electronics
module and sensor are a matched set. The electronics module attaches to and
is supported by the sensor.
CPM Controller, consolidates control functions into a single device that is self
standing or rack mountable. The CPM controller works in conjunction with the
Transpector2 to control valve activation, heaters, pumps, and power to all
elements of the system.
Pumping System, is small, light weight, and efficient and can handle lighter
gases allowing process sampling from two atmospheres to high vacuum.
Inlet Valves, a HexBlock™ inlet that can provide several sampling ranges, a
calibration reference, and a process pressure gauge.
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1.3 Using this Manual
CAUTION
WARNING
WARNING - Risk Of Electric Shock
NOTE: Notes provide additional information about the current topic.
HINT: Hints provide insight into product usage.
CAUTION paragraphs caution against actions which may
bring about a malfunction or the loss of data.
WARNING paragraphs warn against actions that may
result in personal injury.
Transpector CPM Operating Manual
ELECTRICAL WARNING paragraphs warn of the
presence of potentially lethal voltages.
IPN 074-430-P1F
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Transpector CPM Operating Manual
1.3.1 Usage of the Modern Metric System
In many places throughout this manual, American measurement units are given
along with their International System of Units eqivalences. However, providing all
measurement units in all discussions becomes cumbersome to the reader.
Therefore, equivalences are not given in all cases. You may perform the
conversion as follows:
To convert from PSIG to bar
PSIG x 0.069 = bar
To convert from PSIG to kPa
PSIG x 6.8947 = kPa
To convert from Torr to mbar
Torr x 1.3332 = mbar
To convert from Torr to Pascals (Pa)
Torr x 133.32 = Pa
To convert from inches (in.) to millimeter (mm)
in. x 25.4 = mm
To convert from feet (ft.) to meters (m)
ft. x 0.3048 = m
When converting from pounds (lb.) to kilograms (kg)
lb. x 0.453593 = kg
IPN 074-430-P1F
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Transpector CPM Operating Manual
1.4 How To Contact Customer Support
Worldwide support information regarding:
Technical Support, to contact an applications engineer with questions
regarding INFICON products and applications, or
Sales and Customer Service, to contact the INFICON Sales office nearest you,
or
Repair Service, to contact the INFICON Service Center nearest you,
is available at www.inficon.com.
If you are experiencing a problem with your instrument, please have the following
information readily available:
the serial number for your instrument,
a description of your problem,
an explanation of any corrective action that you may have already attempted,
and the exact wording of any error messages that you may have received.
To contact Customer Support, see Support at www.inficon.com.
1.4.1 Returning Your Instrument to INFICON
Do not return any component of your instrument to INFICON without first speaking
with a Customer Support Representative. You must obtain a Return Material
Authorization (RMA) number from the Customer Support Representative.
If you deliver a package to INFICON without an RMA number, your package will be
held and you will be contacted. This will result in delays in servicing your
instrument.
Prior to being given an RMA number, you will be required to complete a Declaration
Of Contamination (DOC) form if your instrument has been exposed to process
materials. DOC forms must be approved by INFICON before an RMA number is
IPN 074-430-P1F
issued. INFICON may require that the instrument be sent to a designated
decontamination facility, not to the factory.
1 - 5
Transpector CPM Operating Manual
1.5 CPM Performance Specifications
1.5.1 General Specifications
Table 1-1 General Specifications
Mass Range (AMU)1 - 1001 - 2001 - 300
Resolution<1 AMU wide @ 10% peak height over entire mass range
Response Time for Composition Changes
(response to normal inert gases)
Capillary Delay: t(1.5m) = 0.3 s
t(3.0m) = 1 s
Intermediate Volume Tau = 0.7 s
CPM Isolation time constant = 75 s
1 - 8
IPN 074-430-P1F
1.6 Physical Requirements
3.0 in.
76 mm
6.0 in.
152 mm
14.8 in.
376 mm
18.6 in.
472 mm
7.2 in.
183 mm
11.4 in.
290 mm
1.6.1 Physical Dimensions
Figure 1-1 Pumping System Dimensions
Transpector CPM Operating Manual
IPN 074-430-P1F
Pumping System dimensions
18.6 in x 6.0 in x 14.8 in (472 mm x 152 mm x 376 mm)
CPM Controller dimensions
3.5 in x 6 in x 12 in (89 mm x 152 mm x 305 mm)
Foreline Pump dimensions
4.1 in x 7.1 in x 4.6 in (104 mm x 180 mm x 116 mm)
(See Figure 2-4 in section section 2.3.3.1 for connections):
1 - 9
Transpector CPM Operating Manual
CAUTION
1.6.2 Weight
The weight of the CPM system (without the Foreline Pump and the CPM controller)
is 32 lb (14.5 kg).
NOTE: These weights do not include connecting cables.
1.6.3 Ventilation Requirements
For adequate ventilation, maintain at least 1 in. (25.4 mm)
clearance around the Transpector2 electronics module
and the CPM heaters and pumping system.
If the CPM pumping system and/or the CPM controller is inside an enclosure, the
enclosure must be large or ventilated to provide adequate cooling by the fan on the
CPM pumping system and the fan in the CPM controller.
1.7 Electrical Power Requirements
The CPM system components that require AC power input are:
CPM controller . . . . . . . . . . . . . . . . . Universal input, any voltage in the range
Personal computer . . . . . . . . . . . . . . Universal input, any voltage in the range
1.7.1 Required Supply Voltage
Except for the AC power input requirements, all other required supply voltages are
supplied by the CPM controller.
1.7.2 Acceptable Supply Voltage Range
AC Power requirements are 100, 120, or 230 V(ac), ±10%
NOTE: If the input power is less than 100 V(ac), the time required for the heaters
to reach their nominal temperature may be extended.
230 V(ac), European style, two-pronged plug with ground contact.
1.8 Nitrogen Purge Gas (Corrosive System Only)
The corrosive service Turbo Molecular Pump requires 10 to 25 sccm of purge gas
flow through the bearing region to protect the bearings from corrosion and loss of
bearing lubricant by evaporation. Dry nitrogen is recommended as the purge gas.
The CPM has a regulator that is preset in the factory using a flow meter to produce
10 sccm of nitrogen purge. To produce 10 sccm, the nitrogen regulator should be
set between 10 and 15 PSIG.
For the corrosive service Turbo Molecular Pump
(CVD/Etch), the nitrogen purge gas is required at all times
the system is operational.
Normally, dry nitrogen is supplied at the acceptable pressure range for the Air
Pressure, section 1.11.1 on page 1-13. In this manner, dry nitrogen can be supplied
directly to the solenoid valve block and to the pressure regulator via the supplied
1/4" (6.35 mm) tee. The provided regulator will then supply dry nitrogen at a
IPN 074-430-P1F
reduced pressure for the purge.
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Transpector CPM Operating Manual
WARNING
CAUTION
Dry Compressed Air
Dry Nitrogen
58 - 100 PSIG
20 - 125 PSIG
Bearing Purge
Corrosive System Only
Figure 1-2 Compressed Air Supply Connection
The acceptable range of pressure is 58 PSIG to 100 PSIG (4 to 6.9 bar)
[400 kPa to 690 kPa].
The nitrogen pressure must not exceed 100 PSIG
(6.9 bar) [690 kPa].
The nitrogen pressure must be at least 58 PSIG (4 bar)
[400 kPa].
1.9 Vent Gas Requirements for Two-Stage Foreline Pump
Venting with dry Nitrogen is not required unless sampling Hydrogen, although it is
recommended when sampling reactive gases to minimize reactions with surface
areas. Dry Nitrogen should be used for venting with a supply of < 2 PSIG. Simple
1/4" (6.35 mm) plastic tubing can be connected to dry Foreline Pump for venting.
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1 - 12
NOTE: The four-stage Foreline Pump does not utilize a vent valve.
1.10 Exhaust Gas
WARNING
CAUTION
For corrosive applications, exhausting the Turbo Molecular Pump is required. For
non-corrosive applications, exhausting of the Turbo Molecular Pump can be done
in accordance to the facility's requirements. The dry Foreline Pump has a 1/4" (6.35
mm) Swagelok® tube adapter for an exhaust fitting.
1.11 Air Pressure Requirements
The CPM air pressure requirements are discussed in the following sections. Refer
to Figure 1-2 for compressed air supply connection.
1.11.1 Required Air Pressure
Dry compressed air (or dry nitrogen) is used to operate the electro-pneumatic inlet
valves. The minimum air pressure required to operate the inlet valves is 58 PSIG
(4 bar) [400 kPa].
1.11.2 Acceptable Range of Air Pressure
Transpector CPM Operating Manual
The acceptable range of air pressure is 58 PSIG to 100 PSIG (4 to 6.9 bar)
[400 kPa to 690 kPa].
The air pressure must not exceed 100 PSIG
(6.9 bar) [690 kPa].
The air pressure must be at least 58 PSIG (4 bar)
[400 kPa].
IPN 074-430-P1F
1.11.3 Moisture Content of Compressed Air Supply
The compressed air supply used for inlet valve operation should be dried to the
extent that changes in pressure of the compressed air during operation does not
produce condensation in lines, solenoids or valve actuators. Moisture
condensation can cause corrosion.
1 - 13
Transpector CPM Operating Manual
CAUTION
1.11.4 Air Pressure Connections
The compressed air supply connects to the CPM solenoid with 1/4 in.
(6.35 mm) polymer hose. The 1/4 in. (6.35 mm) connector is a friction lock right
angle fitting to adapt the supply hose to the 10-32 threads of the solenoid base.
1.12 Vacuum Requirements
The CPM vacuum requirements are as follows.
1.12.1 Required Vacuum
The CPM System creates vacuum with the Turbo Molecular Pump and Foreline
Pump. If you provide the Foreline Pump, it must provide < 10 Torr (13 mbar) when
there is up to 30 sccm of N
If the Foreline Pump pressure exceeds 10 Torr (13 mbar),
degradation of the data and the CPM system is possible.
purge plus process gas bypass flow.
2
1.12.2 Acceptable Range Of Vacuum
The CPM manifold can achieve < 1x10-8 Torr (1.33x10-8 mbar) of base pressure
(no sample flow) after bakeout and cool down. Achieving this level of vacuum
requires a foreline pressure of < 10 Torr (13 mbar).
1.13 Environmental Requirements
The CPM Environmental requirements are discussed in the following sections.
1.13.1 Use
The CPM is intended for indoor use only.
1.13.2 Altitude Range
The CPM can be used up to a maximum altitude of 6561 ft (2000) m. For operation
at higher altitudes, please consult the factory.
1.13.3 Maximum Humidity
80% relative humidity (no condensation).
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1.13.4 Pollution Degree
Pollution Degree 2 (per EN61010-1:2001)
1.13.5 Maximum Operating Temperature
104°F (40°C) (electronics module)
1.13.6 Minimum Operating Temperatures
68°F (20°C)
1.13.7 Clean Room Requirements
The CPM system construction is clean room compatible (including silicone rubber
heaters).
1.13.8 Anti-Static Conditions
The CPM unit has been tested for static susceptibility and passes standard
EN 61326-1:2000.
Transpector CPM Operating Manual
1.14 Computer System Requirements
INFICON can supply a complete computer system for operation of the Transpector
software that will operate the Transpector Gas Analysis instrument connected to a
CPM System.
The minimum system requirements for FabGuard Explorer Operating Software are
listed in Table 1-4:
Table 1-4 Minimum Computer Requirements for FabGuard Explorer
ParametersFabGuard Explorer
Requirements
IPN 074-430-P1F
ProcessorPentium 4 2.0 GHz or greater
Memory512 MB or greater
Hard Drive
Resolution
Cable RequiredRS-232C Cable (for single
500 MB for program,
additional space needed for
data collection
800 x 600 16-Bit color or
greater
sensor operation) or RS-485
cable for multiple sensor
operation (both cables are
included with the CPM)
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Transpector CPM Operating Manual
The minimum system requirements for FabGuard Sensor Integration and Analysis
Software are listed in Table 1-5:
Table 1-5 Minimum Computer Requirements for FabGuard
ProcessorDual Xeon, 2.0 GHz
Memory512 MB
Hard Drive36 GB
Resolution17" (1280 x 1024)
1.14.1 Operating System
FabGuard Explorer software requires either Windows XP, Vista or 7 operating
systems for operation.
FabGuard Sensor Integration and Analysis Software requires the Windows XP
operating system or higher.
Minimum Requirement
Refer to Chapter 8 for FabGuard Explorer software operation or refer to the
FabGuard CD for software operation.
1.15 Installation Overview
1Install the sensor as explained in section 1.16 on page 1-16.
2Install the electronics module as instructed in section 1.18 on page 1-20.
3Set the Transpector2 DIP switches as explained in section 1.19 on page 1-21.
4Install sniffers, if applicable. See section 1.17 on page 1-20.
5Mount CPM to process tool, if applicable. See section 1.20 on page 1-27.
6Install the CPM controller and the communications cables from the
Transpector2 electronics module to the computer and the CPM controller as
shown in Figure 1-10 on page 1-30.
7Install the CPM Foreline Pump as instructed in section 1.22 on page 1-31.
8Install the software, see section 1.23, Software Installation, on page 1-33.
1.16 Installing the CPM Sensor
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1 - 16
1First, install the sensor as explained in section 1.16.1 on page 1-17.
2Then, install the Transpector2 electronics module as instructed in section 1.18
on page 1-20.
1.16.1 Sensor Installation
CAUTION
CAUTION
When you are installing a sensor, follow these general rules.
Do not touch any surface on the vacuum side of the
sensor with your fingers. If it is necessary to touch any of
these parts, always wear clean linen or nylon laboratory
gloves.
Before installing the sensor on your system, check for
any signs of loose or broken parts.
Do not attempt to clean the sensor in any kind of solvent.
Cleaning the sensor requires its disassembly. If the
sensor is contaminated and needs cleaning, contact the
INFICON Service Department for specific instructions.
Refer to section 1.4 on page 1-5.
Transpector CPM Operating Manual
1.16.1.1 ConFlat® Flanges
The sensor (and extension flange for a High Performance sensor) is installed on
the CPM UHV manifold tee with a 2.75 in (69.85 mm) O.D. ConFlat flange
(DN40CF). ConFlat flanges, and similar compatible types made by other
manufacturers, are widely used for attaching devices to ports on high vacuum
systems.
In order to install these flanges without leaks, it is important to follow the proper
installation procedures. These flanges are sealed with a metal gasket and can be
heated for bakeout to temperatures of 150°C.
1.16.1.1.1 Assembling ConFlat Flanges
IPN 074-430-P1F
To assemble a pair of ConFlat flanges, follow these steps:
1Wipe the sealing areas of the flanges with a laboratory towel using a clean
solvent, such as water free alcohol. These areas must be clean and free of
particulate matter. Also clean the copper gasket between the flanges in the
same manner.
Do not touch the gasket and flange faces with your
fingers during the installation process.
1 - 17
Transpector CPM Operating Manual
Flange
Flange
Copper Gasket
2Install the copper gasket between the two flanges. See Figure 1-3. Always use
a new gasket. Do not attempt to use gaskets more than once.
Figure 1-3 Gasket and flange assembly
3Bring the two flanges together making sure that the gasket fits in the recess in
both flanges. Flange faces should be parallel. If the gasket is properly seated,
it should not be possible to slide the two flanges laterally with respect to each
other.
4Install stainless steel bolts in the bolt holes of the flanges and finger tighten.
5After the bolts have been finger tightened and the flange faces are parallel,
tighten the bolts gradually and evenly in a criss-cross pattern until the flange
faces are brought into even contact with each other.
IPN 074-430-P1F
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Transpector CPM Operating Manual
CAUTION
CAUTION
The bolts used for mounting the sensor to the UHV
Manifold Tee and/or extension flange must be oriented
with the threads away from the Transpector, otherwise
there may be interference between the Transpector
mounting nut and mounting flange bolts. The
Transpector ground strap needs to be installed with
sensor mounting flange bolts.
CPM Tee
Sensor Flange
Transpector2
0.500 max.
Electronics
Module
1.16.1.2 Attaching the sensor to the UHV Manifold Tee
The sensor will be mounted to the CPM UHV manifold tee. See Figure 1-4.
Avoid mounting the sensor and CPM near any magnetic
fields greater than 2 gauss.
It is important that the connection between the sensor
and the vacuum chamber does not interfere with gas
exchange to ensure that the gas composition accurately
reflects that existing in the vacuum chamber.
If materials are evaporated or coatings are deposited in
the vacuum chamber, you must protect the sensor
against the deposition of these materials on its surfaces
by installing a baffle or deflector.
IPN 074-430-P1F
In systems which are baked, include the sensor in the
bakeout zone or provide it with separate heaters
(included with the CPM system).
Figure 1-4 Sensor and Transpector2 Mounting
1 - 19
Transpector CPM Operating Manual
CAUTION
WARNING - Risk Of Electric Shock
The Transpector sensor should be removed from the
manifold and placed in its original plastic shipping
container when shipping the CPM system.
1.17 Sniffer Installation
Install the sniffer into the Swagelok® fitting on the hexblock using the 1/4" (6.35
mm) nut and vespel ferrule supplied with the sniffer.
1.18 Transpector2 Electronics Module Installation
NOTE: The Transpector2 electronics module was calibrated at the factory and
matched to a specific sensor. If mounted to a different sensor of the same
type, the Transpector2 electronics module may have to be recalibrated.
The Transpector2 electronics module should be mounted in an area where the
ambient temperature does not exceed 50°C, and where there is free air circulation
around the unit. Best performance will be achieved if the module is not located
close to major heat sources where it is subjected to wide temperature variations.
1The Transpector2 sensor mounting connector assembly has an O-ring in it.
When the mounting nut is tightened the O-ring compresses making a tight fit on
the sensor housing. Before attempting to mount the sensor, make sure
mounting nut on Transpector2 is loose so the O-ring is not compressed.
2Note the alignment pin on the sensor feed-through and the Transpector2
mounting connector. Carefully slide the Transpector2 onto the sensor. Make
sure the Transpector2 electronics module slides on all the way.
3Hand tighten the mounting nut on the Transpector2 electronics module.
4Tightly fasten the 6 in (152.4 mm) ground strap from the Transpector2
electronics module to the sensor ConFlat flange mounting bolt.
You must install the ground strap to ensure a good
safety ground. Failure to make this connection could
result in a shock hazard and/or personal injury.
IPN 074-430-P1F
1 - 20
1.19 How to Set the DIP Switches
on the Transpector2
The DIP switches are used to address the Transpector2 for communications on the
RS-485 network. The Transpector2 address is configured using the DIP switches
located on the front panel of the Transpector2. They are binary switches and
should be configured between address 1 and address 31. Typically, the address is
between 1 and 8.
The Table 1-6 shows the switch configurations for addresses 1 through 8.
Table 1-6 Network Addresses 1 through 8 (located on the Transpector2)
SW1SW2SW3SW4SW5ADDRESS
OFFOFFOFFOFFON1
OFFOFFOFFONOFF2
OFFOFFOFFON ON3
OFFOFFONOFFOFF4
OFFOFFONOFFON5
Transpector CPM Operating Manual
OFFOFFONONOFF6
OFFOFFONONON7
OFFONOFFOFFOFF8
Switches 6 - 8 are reserved and must be set in the zero or off position.
NOTE: The typical CPM configuration is RS-232C for single sensor operation. The
Transpector SW8 should be set to ON for RS-232C operation. See section
1.19.1, RS-232C Communications on the Transpector2, on page 1-22.
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Transpector CPM Operating Manual
1.19.1 RS-232C Communications on the Transpector2
When RS-232C communication is used by FabGuard Explorer:
SWITCH 8 must be ON.
SWITCH 6 and 7 must be set to select the proper baud rate as selected in the
application software. The software default is 9600 baud. See Table 1-7.
Table 1-7 RS-232C Communications Baud Rates
SW6SW7Baud
OFFOFF9600
ONOFF4800
OFFON2400
ONON1200
Connect the communications interface cable from the Transpector2 electronics
module to the proper serial channel on the host computer, e.g., COM1 or COM2.
NOTE: The application software may be configured to the COM channel used for
communication to the Transpector2 electronics module. Make sure the
interface cable is connected to the COM port that is selected in the
application program. (Refer to the FabGuard Explorer Operating Manual
for more information.)
1.19.2 RS-232C link
This interface connector allows the interface of the Transpector2 to a host
computer via RS-232C. The connector pinout is shown in Figure 1-6 on page 1-26.
The RS-232C link is full duplex, meets a subset of EIA-232-D standards, and
supports 4 baud rates (1200, 2400, 4800, 9600). The baud is selected by
configuration switch 6 and 7 as specified in Figure 1-6. The frame size is 10 bits,
consisting of 1 start, 8 data and 1 stop bits.
There are two modes of RS-232C communication: an ASCII Diagnostic Mode and
a Primary Mode. The mode of operation is selected by configuration
switch 8.
1.19.2.1 Diagnostic link (SW8 - OFF)
When switch 8 is OFF, the RS-232C port communicates in an ASCII mode. This
facilitates service diagnostics.
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1.19.2.2 Primary link (SW8 - ON)
If switch 8 is ON, the Transpector2 runs in a binary mode, using the RS-232C serial
link as the primary source of communication. Data is exchanged with the host
computer in binary format. The host computer must be operating with the proper
INFICON software (or user written software) to use this communication mode.
1.19.3 RS-485 Communications
RS-485 Communication is used by the multi-sensor version of FabGuard Explorer
or FabGuard software.
RS-485 baud is fixed at 57600.
SWITCH 8 must be OFF
SWITCHES 1-5 must be set for a unique address as shown below.
Each Transpector2 electronics module on the network must have a unique address
between 1-31.
1Connect the RS-485 center connector on the RS-485 “Y” cable to the RS-485
connector on the back of the Transpector2.
Transpector CPM Operating Manual
2Connect the female end of the RS-485 interface cable to the male end of the
“Y” cable.
3If this is a multiple Transpector2 installation, connect the RS-485 interface
cable from the next Transpector2. See Figure 1-5 on page 1-25.
If the RS-485 interface is to be used, the host computer must have the TCA485
Communication Adapter installed. See the TCA instruction sheet (IPN
074-304) for installation details. Refer to your computer manual for information
on how to install the optional TCA485 Communication Adapter onto your
computer.
4Connect the RS-232/TCA485 cable from the TCA485 adapter to the COM port
of choice on the host computer
IPN 074-430-P1F
5Connect the power transformer to the TCA485 adapter.
1 - 23
Transpector CPM Operating Manual
1.19.3.1 RS-485 link (SW8 - OFF)
When switch 8 is OFF, the Transpector2 operates using RS-485 for the primary
source of communication. Data is exchanged with the host computer in binary
format. The host computer must be operating with the proper INFICON software
(or user written software) to use this communication mode.
The RS-485 link implements a ninth bit protocol allowing a single computer to
operate up to thirty-one Transpector2 electronics modules. This link is full duplex,
meets EIA-485 standards, and operates at 57600 baud. The frame size is 11 bits,
with 1 start, 8 data, 1 address/data flag and 1 stop bit.
The host computer must be equipped with a TCA485 Communications Adapter.
To select this mode configuration, switch 8 must be in the OFF position. The
Transpector2 electronics module must have a unique address between 1 and 8
selected by configuration switches 1 through 5.
NOTE: Address 0 is reserved. Address 0 is used as a GLOBAL address by the
application program.
1 - 24
IPN 074-430-P1F
9600 Baud
Host Computer
RS232 Port
RS232
RS232
RS232
RS232
CNFG
CNFG
CNFG
CNFG
Aux I/O
Aux I/O
Aux I/O
Aux I/O
RS485
RS485
RS485
RS485
PowerPowerPower
Power
600-1118-P1
TCA Cable
*600-1002-P#
RS485 Interface Cable
*600-1002-P#
RS485 Interface Cable
911-039-P1911-039-P1911-039-P1
Transpector #1
Transpector #2Transpector #N
AC Input
90 - 260 V(ac)
AC Input
90 - 260 V(ac)
AC Input
90 - 260 V(ac)
(Male)(Male)
(Female)
AC Input
90 - 260 V(ac)
Address 2
SW 8 - Off
Address 1
SW 8 - Off
Address N
SW 8 - Off
+24V Supply
+24V Supply
+24V Supply
+24V Supply
911-039-P1
600-1003-P1
RS485 “Y” Cable
*600-1001-P#
RS232 Interface Cable
RS232
9600 Baud
SW 8 - On
SW 6, 7 - Off
RS485 Installation
RS232 Installation
TCA
COM
Host Computer
*Cable Length
P# - # of feet
P15 - 15 ft. (4.6 m)
P30 - 30 ft. (9.1 m)
AC Input
90 - 260 V(ac)
Adapter
Port
(Female)
*600-1002-P#
RS485 Interface Cable
Transpector CPM Operating Manual
IPN 074-430-P1F
Figure 1-5 RS232 and RS485 Communication Connections
1 - 25
Transpector CPM Operating Manual
1 - 26
Figure 1-6 Standard Transpector Electronics pin-outs
IPN 074-430-P1F
Transpector CPM Operating Manual
1.20 Mounting the Pumping System
When directly mounted to a tool or vacuum vessel, the HexBlock can support the
system without any additional supports. A simple support kit is supplied for those
customers who require it due to extended flange configurations. The support kit,
part number 922-209-G1, consists of two 4 ft (1.22 m) support legs, two adjustable
feet and mounting hardware.
The support kit is not required for an atmospheric sampling system. A CPM
configured for atmospheric sampling will come with a small, free standing, support
frame, which will house the CPM controller and Foreline Pump. See Figure 1-7.
Figure 1-7 CPM Configured for Atmospheric Pumping
IPN 074-430-P1F
1 - 27
Transpector CPM Operating Manual
1.20.1 Installing the Support Kit
1Measure the support leg to make sure there is ample room for installation. The
leg may be cut to in smaller spaces.
NOTE: Only one end of the support leg has a threaded hole for the adjustable
foot. When cutting the leg make sure that this end is utilized for the
support.
2Completely screw the adjustable foot into the bottom of the support leg.
3Install the right angle bracket onto the support leg using the T-nut and bolts
provided making sure the hardware is only finger tight. Install the second bolt
and T-nut into the bracket leaving it very loose.
4Slide the T-nut into the CPM foreline block groove and adjust the position of the
leg so that it is perpendicular to the floor with the adjustable foot about 1/2"
(12.7 mm) from the floor. Tighten all hardware and install the safety cap. See
Figure 1-8.
Figure 1-8 Adjusting Leg Position
1 - 28
IPN 074-430-P1F
5Unscrew the adjustable foot until it starts to support the CPM and relieve
pressure from the flange.
6Tighten the lock nut on the adjustable foot against the support leg.
1.21 Installing the CPM Controller
RS 485 (for service)
Turbo PumpFuse
Main
Power
On/Off
Electrical
Input
Ground
Aux I/OCPM I/OForeline
Power
TSP
Power
Heater
The CPM controller is a standard 1/2 rack, 2U height rack mountable unit. The
controller has feet supplied and can sit on the floor within the customer selected
cable length distance from the CPM pumping system. The CPM controller has
various cables extending from the rear of the unit to various places on the CPM
system as shown in Figure 1-10 on page 1-30. A drawing of the rear panel of the
CPM controller is shown in Figure 1-9 for further reference.
All the cables are keyed for proper orientation and connection. For the initial CPM
installation, the cables will be attached to the CPM controller, solenoid valve block,
Transpector electronics, Foreline Pump, Turbo Molecular Pump, heaters and
power via a qualified INFICON representative.
If not already installed, first install the sensor and Transpector2 electronics module,
refer to section 1.16 on page 1-16 and section 1.18 on page 1-20.
Figure 1-9 CPM Controller Rear Panel
Transpector CPM Operating Manual
IPN 074-430-P1F
1 - 29
Transpector CPM Operating Manual
SSERP
HCTIWS
UENP
SEVLAV
XEH
™KCOLB
TELNI
GDC
OBRUT
RALUCELOM
PMUP
232SR
RWP PST
O/I XUA
O/I MPC
584SR
OI XUA MPC
PMT
ECIVRES
PMUP-F
RWP PST
PMUP OBRUT
MPC
ECAFRETNI
RTH
TEKCAJ RETAEH
CP OT
m01 RO ,m5,m3.m1
)xx-8721-006(
ELDNUB
NAF
TURBO
CONTR'
TINU RELLORTNOC MPC
FORELINE
PMUP
KCOLB ENILEROF
xx-4611-006
xx-4611-006
xx-6511-006
xx-5721-006
xx-5721-006
x-6511-006
x-1001-006
xx-1811
-006
1811-006
xx-1911-006
600-1191-xx
1811-006
A FO STIGID OWT TSAL EHT
HTGNEL OT REFER # ELBAC
XX-
DNG
0311-006
x-3001-006
PARTS DNG
ROSNES MPC
Figure 1-10 CPU Cable Connections
IPN 074-430-P1F
1 - 30
Transpector CPM Operating Manual
WARNING
Foreline
Connection
Electro-Magnetic
(Vent Valve)
1/4" Swagelok
Exhaust Port
Nitrogen
Vent
Supply
(< 2 PSIG)
1.22 CPM Foreline Pump Installation
The Foreline Pump for the CPM system is a 24 V(dc) dry Foreline Pump. It obtains
power from the CPM controller and has the following connections: (see Figure
1-11).
Electrical connection from the CPM controller.
Foreline hose connection from the UHV Turbo Molecular Pump foreline block.
Exhaust port connection — Required for corrosive or toxic gas sampling, see
Warning on page 1-31.
Vent valve connection on two-stage Foreline Pump — Recommended when
sampling corrosive or toxic gases. Dry nitrogen at less than 2 PSIG is the
recommendation for the vent valve connection.
Figure 1-11 Two-Stage Foreline Pump Components
IPN 074-430-P1F
If the proper exhaust connections are not installed,
sampling toxic, corrosive or any hazardous gases could
result in lethal amounts of gas being exhausted from this
pump.
1 - 31
Transpector CPM Operating Manual
CAUTION
CAUTION
Foreline
Connection
1/4" Swagelok
Exhaust Port
Figure 1-12 Four-Stage Foreline Pump Components
1 - 32
For corrosive applications, it is recommended to supply
dry nitrogen to the vent valve on the two-stage Foreline
Pump to minimize surface reactions in the foreline due to
venting
If a Customer Supplied pump is used, it must supply a
continuous foreline pressure in the range from 10
-2
to 10Torr.
IPN 074-430-P1F
Torr
1.23 Software Installation
See the appropriate software manual (FabGuard Explorer or FabGuard) for
information regarding the installation of the software.
Transpector CPM Operating Manual
IPN 074-430-P1F
1 - 33
Transpector CPM Operating Manual
This page is intentionally blank.
1 - 34
IPN 074-430-P1F
2.1 CPM Components
7
5
4
3
2
1
13
12
11
9
10
6
1 . . . . . . Process Pressure Gauge
2 . . . . . . Process Connection (CF40, KF40 or KF25)
13 . . . . . Bypass Connection for High Pressure Applications
8
A fully configured corrosive pumping system CPM is illustrated in Figure 2-1. (The
CPM controller is not shown)
Figure 2-1 CPM Pumping System Components
Transpector CPM Operating Manual
Chapter 2
How the CPM System Works
IPN 074-430-P1F
2 - 1
Transpector CPM Operating Manual
CAUTION
2.2 Theory of Operation
Many gas analysis applications involving pressures too high for direct exposure to
the quadrupole sensor (pressures greater than 1.0E-4 Torr/mbar) require a
pressure converter to reduce the pressure and keep the sensor at high vacuum.
With a pressure converter, a quadrupole sensor may be used for high pressure
applications such as sputtering, Chemical Vapor Deposition (CVD), etch, vacuum
furnace analysis, and laser gas analysis.
The CPM has a closed ion source (CIS) and the pressure indicated is the pressure
inside the closed source. The nominal operating pressure inside the closed ion
source is approximately 2E-4 Torr. Since the conductance between the closed
source and the sensor manifold is 0.7 l/sec and given the effective pumping
achieved using the Turbo Molecular Pump attached to this manifold, the pressure
in the mass analyzer region is approximately 23 times lower than in the closed
source. Thus, with the source at ~2E-4 Torr, the pressure in the manifold is
approximately 1.0E-5 Torr.
Pressure converters use orifices and/or capillaries to reduce the partial pressure of
the gas-mixture, typically by a fixed proportion, with minimum mass discrimination.
An orifice, which is a small disk with a defined hole, acts as a conductance
limitation. When both the volume and the high vacuum pump speed are constant,
the orifice hole size determines the pressure at the quadrupole sensor. Orifices are
available in various sizes to cover various pressure ranges.
The software (either FabGuard Explorer or FabGuard)
displays the internal total pressure of the ion source.
Optimum performance is obtained when the total
pressure display reads ~2x10
low energy mode (40eV, 200 A). Operating in high
energy mode (70eV, 2000 A) will give an inaccurate total
pressure reading.
2.3 Instrument Overview
2.3.1 System Block Diagram
A schematic representation of a CPM is shown in Figure 2-2.
-4
Torr. This is measured in
IPN 074-430-P1F
2 - 2
Transpector CPM Operating Manual
Figure 2-2 CPM Block Diagram
IPN 074-430-P1F
2 - 3
Transpector CPM Operating Manual
CAUTION
2.3.2 CPM Aux I/O Connector
User I/O is accomplished through a 15 pin DSUB connector on the CPM controller
labeled CPM Aux I/O, see Figure 2-3 for a pinout diagram. The controller is shipped
with a protective cap covering the CPM Aux I/O connector.
Grounding valve control pins on CPM Aux I/O opens
electropneumatic valves regardless of system state
A mating DB15 Male connector is supplied in the ship kit for connecting to the
desired CPM Aux I/O connections.
Figure 2-3 CPM Aux I/O Pinout Diagram
2 - 4
IPN 074-430-P1F
2.3.2.1 Remote Control Functions
CAUTION
Grounding valve control pins on the CPM controller Aux
I/O opens electropneumatic valves regardless of system
state. To eliminate any conflicts, only one method of
valve control should be used
Electropneumatic valves can be remotely controlled by grounding contacts. These
relays have normally open contacts, which have a contact rating of
24 V(dc) at 0.5 Amps. See Table 2-1.
Table 2-1 Valves/Setpoint Relays
NamePinFunction
V1 (LP)4pulled to ground valve open
V2 (HP)11pulled to ground valve open
Transpector CPM Operating Manual
V3 (HC)3pulled to ground valve open
V4 (BYPASS)10pulled to ground valve open
V5 (CAL)2pulled to ground valve open
IPN 074-430-P1F
2 - 5
Transpector CPM Operating Manual
2.3.3 Ultra-High Vacuum System
The vacuum system for the CPM is required to provide low pressure to
(1) establish a sample flow from the process by pressure difference, and
(2) provide a low pressure for optimum operation of the ion source, mass analyzer
and ion detector.
A dry pumping system is used to minimize hydrocarbons in the residual gas
background. This is achieved with a Turbo Molecular Pump and a Foreline Pump
to provide the foreline pressure. This Turbo Molecular Pump has a high
compression ratio between the high vacuum side and the Foreline Pump side for
all gases including hydrogen. Hydrogen is the ultimate major residual gas
component in ultra-high vacuum, therefore the high compression ratio for hydrogen
is important for producing the desired low base pressure.
2.3.3.1 Foreline Subsystem
The foreline components of the CPM include a flexible foreline hose of various
lengths (
connection. The Foreline Pump typically produces base pressures (no gas flow) of
2 Torr which is significantly less than the 10 Torr needed for the Turbo Molecular
Pump operation. To assure reliable startup of the Foreline Pump, the foreline is
vented to near atmosphere on shutdown. The vent valve can be programmed, via
the control software, for delay and venting time.
10 m), the Foreline Pump and a vent valve at the Foreline Pump
The 2 Torr operating pressure for the foreline is in viscous flow such that the
foreline does not require a large diameter. The inside diameter of the Teflon®
foreline is 1/4" (6 mm) which produces a 2 Torr pressure drop across a 10 m length
of foreline with 20 sccm of gas flow.
NOTE: The vent valve located on the Foreline Pump will open for the configured
time period when the CPM is shutdown. The default time period is 10
seconds. Additionally, the vent valve is opened briefly when the CPM
controller is first powered up and remains open until communications are
established. This opening is usually a few seconds.
NOTE: The four-stage Foreline Pump does not utilize a vent valve.
IPN 074-430-P1F
2 - 6
2.3.4 Heater(s) Subsystem
WARNING
The CPM is designed with dual temperature (150°C and 90°C) heaters. A tee
heater comes with the CPM. The tee heater is a snap-on assembly. All heaters are
dual element silicone rubber pad heaters with silicon rubber foam insulation. Power
for the heaters is controlled by the CPM controller, which automatically powers the
dual elements appropriately according to whether 120 V(ac) or 230 V(ac) is
provided. Control of the heater(s) is via the appropriate software package. The
software will allow control of the heater(s) at low temperature (90°C) or high
temperature (150°C). The status of the heaters is also displayed via LEDs on the
front panel of the CPM controller.
During or immediately after bakeout, the heating jacket
and metal surfaces in the vicinity of the heating jacket
may be hot. These surfaces may exceed 100°C at the
maximum ambient operating temperature (i.e., 50°C),
which will cause burns if touched directly without using
the proper personal protection equipment.
Transpector CPM Operating Manual
IPN 074-430-P1F
2 - 7
Transpector CPM Operating Manual
2.3.5 CPM Controller Subsystem
The CPM controller contains all of the AC components, the AC-DC converter which
supplies the +24 V(dc) for the Transpector, the Foreline Pump, the Turbo Molecular
Pump controller, and valve control for solenoid operations.
The AC-DC converter has an universal input which accepts input voltages in the
range of 85 - 253 V(ac).The output of this converter is 24 V(dc) @ 8A. This 24 V(dc)
is fed to the Transpector electronics through the CPM controller interface cable.
The Turbo Molecular Pump controller card also requires +24 V(dc). A high-side
switch is located between the AC-DC converter and this card. A control line from
the CPM I/O connector controls the Turbo Molecular Pump input power.
The heater drive circuit controls the AC voltage to the heaters. The heaters used in
the CPM system contain two heating elements. Since the AC input to the AC-DC
converter is a universal input, an automatic configuration of the heater elements is
implemented, therefore no manual configuration of the CPM controller is required
for operating on the various line voltages. For AC line input of 100-120 V(ac), the
two heating elements are set in a parallel configuration, and for 230 V(ac) input, the
elements are set in a series configuration. This automatic configuration circuit
consists of a voltage detector circuit which monitors the AC input and generates a
signal which controls a DPDT relay for the heaters, which configures the elements
either in series or parallel. The heaters are interlocked to not turn on if the pump is
not up to speed or if there are any faults.
2 - 8
IPN 074-430-P1F
2.3.6 Solenoid Valves
The solenoid valves are physically mounted to a bracket on the Turbo Molecular
Pump foreline block. The solenoid valves are a group of valves joined together as
one manifold assembly. These solenoids control all the valves on the CPM system
(electropneumatic version pumping systems). They are controlled by the CPM
controller rocker switches or via the valves/Aux I/O connector.
When the actual solenoid valves are activated, they allow the compressed air to
travel from the input air supply (70-110 PSIG (4.8 to 7.6 bar) [480 kPa to 760 kPa])
to the appropriate valve for opening the valve. All the valves are
electropneumatically operated except for the vent valve, which is electromagnetic.
There are four solenoid valves which control the following valves: (See Figure 2-4.)
For more details about the function of each valve, see section 4.2.1 on page 4-3.
Each of the solenoids has a red LED that will illuminate when the solenoid is
activated. Additionally, a green LED on the CPM controller will illuminate when the
solenoid is activated.
There is one compressed air input connection that is a compression fitting that will
use 1/4" tubing.
2 - 9
Transpector CPM Operating Manual
Exhaust Muffler
Air Supply
Line Connection
9-Pin D Connector
Air
Lines
To
Val ves
V3
V1
V0
V2
V5
V4
Figure 2-4 Solenoid Valve Block
2.3.7 Transpector Subsystem
The Transpector2 electronics module and sensor form the heart of the CPM
system. The sensor is a quadrupole partial pressure analyzer and analyzes gases
by:
ionizing some of the gas molecules.
separating the ions by mass.
measuring the quantity of ions at each mass.
The masses, unique for each substance, allow the identification of the gas
molecules from which the ions were created. The magnitudes of these signals are
used to determine the partial pressures (amounts) of the respective gases.
The Transpector2 electronics module mounts to the sensor and provides all the
requirements for operating the sensor, making the appropriate ion current
measurements, communicating to a computer and sending the resulting output to
the computer.
IPN 074-430-P1F
2 - 10
2.4 Application
The CPM includes a pumping system for reducing the pressure of process gas to
a pressure at the CPM ion source which optimizes the partial pressure
measurements made by the CPM. The design dimensions of pressure reduction
orifices are chosen to produce 2x10
for the stated maximum pressure for a given orifice. The flow rate of gas through
the CPM that produces this pressure is:
Transpector CPM Operating Manual
-4
Torr pressure in the closed ion source (CIS)
Q(T-L/s)= P
= 2x10
= 1.4x10
where P
CIS
CIS SCIS
-4
(Torr) x 0.7 (L/s)
-4
(T-L/s)
is the pressure at the CIS ion source within the CPM tee region, S
CIS
is the pumping speed of the closed ion source and Q is the throughput of the CIS
ion source. This flow rate is produced by process gas flowing through the process
gas orifice which is
Q(T-L/s) = (P
Process - PCIS
where the conductance C
) * C
Process Orifice
Process Orifice
determines the orifice diameters needed to
~ 1.4x10-4 (T-L/s)
produce this flow for each process pressure. A selection of orifice diameters are
available for reducing pressure for a multi-decade range of (maximum) process
pressures from 0.001 Torr to 100 Torr. For example, a 10 Torr orifice has a 20
micron diameter hole to produce approximately 2x10
-4
Torr at the CIS when the
process has 10 Torr of nitrogen. Since process pressures can vary within the
operating range of the process, different pressure reductions may be needed. The
CPM system has a variety of inlet orifices that allow pressure range sampling which
typically covers measurement of the base pressure of the process chamber (for
leak detection and base vacuum analysis) with a high conductance port and two
orifices for process pressures. Various inlet systems are described with their typical
use in section 2.5 on page 2-12.
IPN 074-430-P1F
2 - 11
Transpector CPM Operating Manual
2.5 Sample Inlet Systems and Examples of Use
2.5.1 Inlet System
Figure 2-5 shows the HexBlock inlet.
Figure 2-5 HexBlock Inlet
Table 2-2 Inlet System
Hex Block InletsINFICON Part Number
Hex Block Inlet with one orifice (V1) and high vacuum (V3)923-604-G11
Hex Block Inlet with one orifice (V2) with high pressure
by-pass (V4) and high vacuum (V3)
Hex Block Inlet with two orifices (V1) and (V2)923-604-G13
Hex Block Inlet with two orifices (V1) and (V2) with high
pressure by-pass (V4)
Hex Block Inlet with two orifices (V1), (V2), and high vacuum
(V3)
Hex Block Inlet with two orifices (V1), (V2) with high pressure
by-pass (V4), and high vacuum (V3)
923-604-G12
923-604-G14
923-604-G15
923-604-G16
The orifice is a small laser drilled socket set screw that acts as a conductance
limitation. The orifice has a press fitted seal mounted to the bottom of the set screw.
When both the volume and the high vacuum pump speed are constant, the orifice
hole size determines the pressure at the sensor. Orifices are available in various
IPN 074-430-P1F
2 - 12
Transpector CPM Operating Manual
sizes to cover various pressure ranges. Table 2-3 and Table 2-4 shows different
orifices for low and high pressure range application and Figure 2-6 on page 2-14
shows pressure ranges for sampling which will assist in choosing the proper orifice
for the application.
Table 2-3 Hex Block orifices (V1 for low pressure, typically background)
HexBlock orificesINFICON Part Number
10 mTorr orifice923-706-G6
15 mTorr orifice923-706-G8
100 mTorr orifice923-706-G5
360 mTorr orifice923-706-G7
1 Torr orifice923-706-G4
3 Torr orifice923-706-G9
10 Torr orifice923-706-G3
Table 2-4 Hex Block orifices, sniffers and capillaries
(V2 for high pressure, typically process pressure)
Size of orifices, sniffers and capillaries INFICON Part Number
10 mTorr orifice923-706-G6
15 mTorr orifice923-706-G8
100 mTorr orifice923-706-G5
360 mTorr orifice923-706-G7
1 Torr orifice923-706-G4
3 Torr orifice923-706-G9
10 Torr orifice923-706-G3
IPN 074-430-P1F
30 Torr orifice
923-706-G10
(requires high pressure by-pass)
7 Torr sniffer
923-707-G3
(requires high pressure by-pass,30.5 cm length)
10 Torr sniffer
923-707-G1
(requires high pressure by-pass. 5 cm length)
100 Torr sniffer
(requires high pressure by-pass. 5 cm length)
923-707-G2
2 - 13
Transpector CPM Operating Manual
Figure 2-6 Pressure Ranges for Sampling for CPM Inlet Orifices and Sniffers
2.5.2 High Pressure Sampling: Orifice Bypass (V4)
When process pressures exceed 10 Torr, the process gas is dense enough that the
gas molecules collide with each other more often than with the walls of the
sampling system. In this transition or viscous flow regime, the time constant for
detecting changes in process gas composition becomes dominated by the time it
takes for the gas species that changes in the process to diffuse through the gas
matrix and arrive at the sampling orifice. This diffusion time is proportional to the
process pressure and the square of the distance from the process to orifice. This
sampling method effectively shortens the diffusion distance from process change
to the sampling orifice by drawing a small quantity (10 sccm) of the process gas
through the sampling valve and bypass valve to the interstage port of the Turbo
Molecular Pump. When the process gas flows in this manner, the diffusion distance
of the gas is reduced to about 2 cm and the response time for changes in the
process gas is significantly reduced.
IPN 074-430-P1F
2 - 14
2.5.3 Dual-Capillary Sampling Option
The Dual-Capillary Sampling option provides a sampling means to reduce the
pressure of a process atmosphere in the range of 300 Torr to 1400 Torr to an
intermediate pressure of <10 Torr for the CIS using hardware shown in Figure 2-7.
The exit orifice to the pumping line limits the flow to the Turbo Molecular Pump and
establishes the interstage pressure. The 1/16" O.D. capillary can be inserted into
the process to an appropriate position through the Swagelok-4VCR connection
fitting. The capillary position is locked in place and sealed by tightening the
Swagelok nut with a re-usable ferrule.
Figure 2-7 Dual-Capillary Sampling Option (shown with calibration reference)
Transpector CPM Operating Manual
IPN 074-430-P1F
2 - 15
Transpector CPM Operating Manual
2.6 Advice and Tips
2.6.1 Achieving Good Base Pressure in the CPM
The CPM vacuum manifold should be baked out after initial installation, or after
maintenance where the RGA sensor has been exposed to air. After an 8 hour
bakeout and cool down, the base pressure should be less than 5E-7 Torr at 40 eV,
200
A. If not, examine the background mass spectrum to look for the largest peak.
If the spectrum is dominated by mass 18, then continued baking is needed to
reduce the water vapor.
2.6.2 Avoiding Trapped Gas when
Sampling Valves are Closed
When V2 is closed, the process pressure that is sampled is trapped between V2
and O2. This gas will pump out in a few minutes. However when possible, it is
better to keep V2 open until the process pressure has been evacuated. Then V1
can be opened to scan the background spectrum of the process vacuum system.
It is good practice to close the sampling valves when finished with measurements
to avoid pressure bursts to the RGA if the process is vented. However, the CPM
will turn off the emission and EM and close all sampling valves if a total pressure
trip occurs.
2 - 16
IPN 074-430-P1F
3.1 Theory of Operation
Ion
Source
Mass
Filter
Detector
A Closed Ion Source (CIS) analyzer is designed to sample a representative fraction
of a process atmosphere and direct the gas sample to the ionization region of a
Residual Gas Analyzer (RGA). The sampling and flow of the gas sample is
accomplished by successive reduction of pressure from the process to the Turbo
Molecular Pump through fixed geometry pump-in channels. By design, the sample
pressure in the ion source is higher than in the analyzer by a factor of 23. This
source/analyzer pressure ratio is true only for the CVD/Etch source. For the PVD
version, the ratio is higher by approximately seven times. Proper design enables
the CPM to detect levels of impurities in process gases significantly lower than
open-ion source RGA analyzers and at sub-ppm levels for many components.
Transpector CPM Operating Manual
Chapter 3
Theory and Application Guide
3.2 Sensors
The three main parts of the CPM sensor are:
the ion source (ionizer),
the quadrupole mass filter,
the ion detector.
All of these parts are mounted on an electrical feedthrough flange, which is bolted
to the vacuum manifold. See Figure 3-1.
The sensor works only in a high-vacuum environment because the ions, once
created, must not collide with other gas molecules as they move through the
sensor — otherwise, they might not be detected.
IPN 074-430-P1F
Figure 3-1 CPM Sensor
3 - 1
Transpector CPM Operating Manual
1
2
3
4
5
6
7
8
9
10
1 Sealing Disk
2 Spring
3 Anode Cylinder
4 Filament Block
5 Shield Washer
The Transpector PVD CIS, optimized for detecting parts per million (ppm)
impurities in a process gas (usually argon), has a fairly closed anode construction
that allows the sampled gas to be ionized at full process pressure. See Figure 3-2.
The CVD/Etch CIS is designed to be used in conjunction with a pressure reducing
orifice since process pressures are often far greater than the maximum at which
the ion source itself can operate. Additional modifications have been made to the
source which will extend the lifetime of the ion source in aggressive gas
applications.
Figure 3-2 The Closed Ion Source
Inside the ion source, a heated filament emits electrons which bombard the
incoming gas molecules giving them an electrical charge. While this charge may
be either positive or negative, the Transpector CPM detects only positive ions.
Once a molecule is charged, or ionized, electric fields can be used to manipulate it.
The filament is a tungsten wire. This type is often chosen for the PVD source
because it produces the fewest artifacts (for example, CO and CO
spectrum. For the CVD/Etch source, tungsten is chosen because it offers the best
resistance to aggressive gases, particularly those containing fluorine and chlorine.
3 - 2
) in the
2
IPN 074-430-P1F
Transpector CPM Operating Manual
CAUTION
Tungsten filaments can be destroyed if operated at too
high a pressure because they react with oxygen and
water vapor at the filament operating temperature.
The term “emission current” refers to this stream of electrons emitted by the
filament. The filament is heated with a DC current from the emission regulator
circuit, with the resulting temperature of the filament used as the means of
controlling the emission current.
The filament is centered over a hole in the anode cylinder. The potential (voltage)
on the anode is positive with respect to the filament. The electron repeller, a flat
plate, is located behind the filament and is electrically connected to the negative
side of the filament. The potential difference between the filament and the anode
determines the kinetic energy (usually called the electron energy) of the emitted
electrons. The electron energy in turn determines how gas molecules will ionize
when struck by the electrons.
For the CPM, the electron energy can be operated from 70 eV down to 10 eV.
Operation below 70 eV is restricted to emission currents of no greater than 200
microamperes. At 70 eV or above, an emission current of 2 milliamperes is
available to maximize sensitivity for background monitoring and leak checking.
The ions formed within the anode cylinder are pulled away by the potential on the
focus lens and formed into an ion beam. (The focus lens is sometimes called an
extractor, since it extracts the ions from the region in which they are created.) The
focus lens also serves to focus the ion beam into the hole in the source exit lens.
To attract positive ions, the focus lens is biased negatively with respect to the
anode.
The potential on the source exit lens is negative with respect to the anode, and (for
the particular design illustrated here) the focus lens as well. The ion beam passes
through the hole in the exit lens and is injected into the mass filter.
IPN 074-430-P1F
The two different ion sources, PVD and CVD/Etch, have two different throughputs.
The PVD ion source has a pumping speed of about 0.1 liter / second. This pumping
speed will create a pressure differential between the ion source and the quadrupole
region. The PVD ion source is designed to operate with a maximum process
pressure up to about 10 mtorr (1.3E-2 mbar). The pressure in the closed ion source
will be about 160 times higher than the pressure in the quadrupole. Nominally, 3
mTorr in the ion source will produce about 2E-5 Torr in the quadrupole region.
The CVD ion source has a pumping speed of about 0.7 liter / second. This pumping
speed will create a pressure differential between the ion source and the quadrupole
region. The CVD ion source is designed to operate with a maximum process
pressure up to about 2 mTorr (2.7E-3 mbar). This ion source is typically used with
an orifice to reduce the high pressure down to about 2E-4 Torr (2.7E-4 mbar). The
3 - 3
Transpector CPM Operating Manual
pressure in the closed ion source will be about 23 times higher than the pressure
in the quadrupole (e.g., 2.3E-4 Torr in the ion source will produce about 1E-5 Torr
in the quadrupole region).
See section 4.7, Filament Control, on page 4-10 for more ion source information.
3.2.2 The Quadrupole Mass Filter
The ions produced in the ion source are injected into the mass filter, which rejects
all ions except those of a specific mass-to-charge ratio. Most ions contain only one
unit of charge. In the Transpector family, the mass filter is a quadrupole type, to
which is applied a combination of RF and DC potentials. The RF frequency and
amplitude determine the mass, and the RF/DC ratio determines the filter selectivity.
See Figure 3-3.
Figure 3-3 The Sensor’s Quadrupole Mass Filter
3 - 4
The mass filter’s four rods (hence the term “quadrupole”) are alternately charged
to direct ions of specific masses down through the center, deflecting all larger and
smaller masses (hence the term “mass filter”).
The mass filter consists of four parallel rods, or poles, in a square array. The rods,
and the insulators in which they are mounted, form an extremely precise
mechanical assembly. The distance between the center of the square array and the
closest rod surface is known as the quadrupole radius, with the symbol r
. Ideally,
0
the rod should have a hyperbolic shape (towards the center of the assembly) rather
than round. If the ratio of the round rod radius to r
is made equal to 1.148, the
0
resulting electric field is a reasonably good approximation of the desired hyperbolic
shape.
Opposite rods are electrically connected together. The ions are directed into the
space between the poles, in a direction nominally parallel to the length of the rods.
There the ions are separated according to their mass-to-charge ratios by the lateral
forces resulting from the potentials applied to the poles.
IPN 074-430-P1F
Transpector CPM Operating Manual
XV 2ftcosUPZ++=
YV 2ft+cosU–PZ+=
V14.438 M f2r
0
2
=
The applied potentials consist of an RF component and a DC component. The RF
potential on one set of rods is out of phase by 180° with respect to the RF potential
on the other set of rods, but of the same amplitude. For one pair of rods, the “X”
pair, the DC potential is positive. For the other, the “Y” pair, the DC potential is of
the same magnitude but negative. The DC and RF potentials are referenced to a
“center voltage” (sometimes called the “pole zero”). The following equations
summarize the potentials applied to the rods:
[1]
[2]
where
potential, and
The RF component removes the low-mass ions from the beam. Ions of sufficiently
low mass have their motions remain in phase with that of the applied RF. These
ions will gain energy from the field and oscillate with increasingly large amplitudes.
Eventually, as they travel along the length of the rods, they will strike one of the
rods and be neutralized. On the other hand, high mass ions are focused by the RF
component to an area close to the quadrupole’s long axis, the Z axis.
The DC component is superimposed on the RF to remove high mass ions from the
beam. The DC field deflects the high mass ions toward the negative poles,
opposing the focusing effects of the RF field. Eventually, these high mass ions
strike the negative rods and are neutralized. By a suitable choice of DC-to-RF ratio,
the mass filter can be made to discriminate against both high and low mass ions to
the desired degree.
The kinetic energy directed along the Z axis of the mass filter (usually called the ion
energy) is primarily dependent on the difference between the potential at which the
ions were formed (approximately the anode voltage), and the pole zero. The ion
energy is usually only slightly modified by the electric field (the “fringing” field)
between the source exit aperture and the quadrupole. Imbalances in the amplitude
of the two phases of RF applied to the rod pairs, and of the DC voltages also
IPN 074-430-P1F
applied, result in a further modification of the ion energy.
The mass of the ions passed by the filter is determined by the RF amplitude, the
RF frequency, and the quadrupole radius, as shown by the following equation:
V is the RF amplitude, f is the RF frequency, t is time, U is the DC
PZ is the pole zero.
[3]
where
atomic mass units (AMU) per electron charge,
and
For example, a 200 AMU singly charged ion would pass through a quadrupole with
nominal 1/4” diameter rods (an
peak-to-peak RF amplitude of approximately 700 Volts.
V is the peak-to-peak RF amplitude in Volts, M the mass of the ion in
f the RF frequency in megahertz,
r
the quadrupole radius in centimeters.
0
r
of 0.277 cm), operating at 1.78 MHz, at a
0
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Transpector CPM Operating Manual
The mass of ions transmitted (M) is directly proportional to the RF amplitude
(provided
f is constant). As the RF amplitude is increased, progressively higher
mass ions will be made to oscillate in phase with the RF field and thus gain
sufficient energy to strike the poles. Of course, the DC voltage must also be
increased to maintain the high mass rejection properties of the filter. A mass
spectrum can therefore be obtained by sweeping the RF amplitude, along with the
DC voltage.
The next section (Scanning Characteristics) discusses the variation in the
efficiency of transmission of ions through the filter with mass. Following that,
section 3.2.2.2, The Zero Blast, on page 3-7 discusses the behavior of the filter at
very low masses where the applied voltages approach zero.
3.2.2.1 Scanning Characteristics
As previously discussed, the quadrupole acts as a mass filter for a mixed beam of
ions, rejecting those of both high and low mass, while passing those of an
intermediate mass. The selectivity of the mass filter is expressed in terms of
resolution, R, which is numerically given by the ratio of the center mass, M, to the
width, M (both in AMU), of the pass band. Since the number of the ions passed
by the filter falls off gradually as the edge of the pass band is approached, the width
is defined at the point where the ion current falls to some specified fraction (usually
1/2 or 1/10) of the maximum value. The width of the pass band is determined by
the DC-to-RF ratio.
While the quadrupole drive circuits can be designed so that R varies in any desired
manner with M, it is usually most convenient to keep M constant at a value, which
ensures adequate separation of masses that are 1 AMU apart. This mode of
scanning is called Constant M. As a result, R is proportional to M, and therefore
the efficiency with which ions of mass M are transmitted through the quadrupole
decreases with M. Thus, the sensitivity of the sensor decreases as M increases.
IPN 074-430-P1F
3 - 6
3.2.2.2 The Zero Blast
When the mass filter is tuned to very low masses, the RF and DC voltages applied
to the rods approach zero. The quadrupole then ceases to act as a filter, and a
large current of unseparated ions is detected. This current is called the “zero blast.”
See Figure 3-4.
The zero blast, present in all quadrupole-based sensors, can interfere with the
observation of masses 1 and 2 when significant quantities of higher-mass ions are
present. In some instruments, the magnitude of the zero blast is concealed by
preventing the voltages from reaching zero.
Figure 3-4 The Zero Blast
Transpector CPM Operating Manual
The zero blast — the large current of unseparated ions that enters the mass filter
IPN 074-430-P1F
when it is tuned to very low masses — can interfere with the observation of masses
1 and 2 when significant quantities of higher-mass ions are present. With the
Transpector2 electronics, the zero blast only produces parts-per-million
interference to masses 1 and 2.
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Transpector CPM Operating Manual
3.2.3 The Ion Detector
The ion detector region of the sensor consists of the quadrupole exit lens and the
detector itself. Often, the quadrupole exit aperture is biased negatively with respect
to the anode, focusing ions that have been transmitted through the quadrupole into
the detector element. The detector can be a simple Faraday Cup (FC), an Electron
Multiplier (EM), or a combination of both.
3.2.3.1 The Electron Multiplier (EM) Detector
The Electron Multiplier (EM) acts as an in situ preamplifier for improved sensitivity.
Although there are several different types of EM, their operating principals are the
same. Incoming ions are accelerated into the input of the EM by a high negative
voltage (usually -1.0 kV or more). When an ion strikes the surface of the EM, one
or more secondary electrons are emitted. These electrons are accelerated to a
second surface which is at a more positive potential, where additional electrons are
generated.
This process repeats itself until a pulse of electrons emerges from the output of the
EM and is collected on a Faraday Cup. The result is that as many as a million
electrons or more can be produced by each incident ion. The current from a
Faraday detector is positive (for positive ions) while an EM detector puts out a
negative signal.
The ratio of the electron output current to the incident ion current is known as the
EM gain. The gain primarily depends on the EM type, the voltage applied to the EM
input, the voltage applied across the EM, the condition of the EM, and, to a lesser
extent, the mass and chemical nature of the incident ion. In general, the EM gain
decreases as the ion mass increases.
The advantage of the EM detector sensor is it’s high sensitivity (as much as 0.25
amps/Torr), thus making it possible to measure partial pressures as low as 1x10
-13
Torr for some instruments in the Transpector family. A typical FC sensor would
-5
have a sensitivity of only 1x10
partial pressure of 5x10
-12
amps/Torr, resulting in a minimum detectable
amps/Torr. (Again, this value depends on the particular
Transpector model.)
IPN 074-430-P1F
3 - 8
3.3 How to Interpret The Result
This section explains how to interpret the measurements the CPM produces. It is
divided into three main parts:
1section 3.3.1, Qualitative Interpretation Of Mass Spectra,, explains how to
determine which substances are present in the gas sample being analyzed.
2section 3.3.2, Quantitative Interpretation of Mass Spectra (Calculating Partial
Pressures), on page 3-24, shows how to estimate how much of each substance
is present.
3section 3.3.3, Additional Information For Interpreting Mass Spectra, on page
3-30, provides additional information that may help you interpret mass spectra.
Software packages for the Transpector family of instruments generally include
routines which serve as aids in the interpretation of spectra and the calculation of
partial pressures and relative concentrations.
For a discussion of how the Transpector produces its measurements, refer to
Chapter 2, How the CPM System Works.
Transpector CPM Operating Manual
3.3.1 Qualitative Interpretation Of Mass Spectra
The basic graphical output of a partial pressure analyzer is the mass spectrum. A
mass spectrum is a pattern of peaks on a plot of ion intensity as a function of ion
mass-to-charge ratio. Each chemical substance has a characteristic mass
spectrum. Different instruments will give slightly different spectra for the same
substance. The particular characteristics of the ionizer, mass filter, and detector,
not to mention the manner in which the sample is introduced into the mass
spectrometer, all influence the spectrum that is produced.
Rarely will a mass spectrum be obtained for a pure substance. Most of the time
(especially for residual gas analyzers), the spectrum obtained will be a composite
of the individual substances which together comprise the actual sample present.
See Figure 3-5.
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Transpector CPM Operating Manual
Figure 3-5 A Mass Spectrum
Figure 3-5 shows the mass spectrum of air. The top graph is a trend analysis
showing the most important masses verses time. The bottom graph shows the data
taken during scan 41 and shows the air spectra over a logarithmic four decade
y-axis. The prominent peaks for air are mass 28 from Nitrogen, mass 32 from
Oxygen, mass 40 from Argon and mass 18 from water vapor.
IPN 074-430-P1F
3 - 10
3.3.1.1 Ionization Process
When a sufficiently energetic electron strikes a gas molecule, there are many
processes that can occur, just some of which are summarized in Table 3-1.
Table 3-1 Electron Impact Ionization Processes
XYZ + e-
In all cases, the reactants are a high energy electron, e
The products of the first reaction are the molecule with a single electron removed
(the so-called parent ion) and two low energy electrons. In the second reaction, two
electrons are removed from the gas molecule, resulting a doubly charged ion.
Triply (or even more highly) charged ions are also possible, provided the incident
electron has enough energy.
+
XYZ
+ 2e
2+
XYZ
XY + Z
+
XY
+ Z + 2e
+
X
+ YZ + 2e
X + YZ
XZ + Y
+
XZ
+ Y + 2e
+ 3e
+
+ 2e
+
+ 2e
+
+ 2e
Transpector CPM Operating Manual
-
-
-
-
-
-
-
-
(1)
(2)
(3)
(4)
(5)
(6)
(7)
(8)
-
, and a gas molecule, XYZ.
Reactions 3 through 8 are all examples where the original molecule is broken into
fragments, at least one of which is positively charged (negative ions can also be
produced in this manner). Only the positive ion fragments are observed; the neutral
(uncharged) fragments are not detected. The mass spectrum obtained when the
parent molecule breaks apart under electron impact is commonly referred to as the
fragmentation pattern (or, sometimes, the cracking pattern). The fragmentation
pattern for nitrogen at an electron energy of 70 eV is given in Figure 3-6.
IPN 074-430-P1F
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Transpector CPM Operating Manual
Figure 3-6 A Nitrogen Fragmentation Pattern
This nitrogen fragmentation pattern shows 14N+ (14 AMU), 14N
14N15N+
(29 AMU).
+
(28 AMU), and
2
In general, peaks from multiple charged species will be less intense than those for
the corresponding singly charged ion. For example, the doubly charged peak for
argon is typically less than one fifth as intense as the singly charged peak (it should
be noted that this intensity ratio is sensitive to the incident electron energy).
There are some situations when it is difficult to determine whether the ion is singly
or multiply charged. When a molecule is composed of two atoms of the same
element, the typical partial pressure analyzer cannot distinguish between the singly
charged one-atom fragment ion and the doubly charged two-atom molecular ion,
which will both have the same mass-to-charge ratio. Refer to Figure 3-6 above; the
peak at 28 AMU is the parent ion, N
peak at 14 AMU is from N
+
or N
+
. It is not discernible from this spectrum if the
2
2+
. It has been demonstrated, by other means, that
2
the 14 AMU peak in the nitrogen spectrum is from the singly charged fragment ion.
Most ions (with the important exception of complex hydrocarbons) have masses
very close to integer values. When the mass of an ion is not evenly divisible by the
number of charges on it, the mass-to-charge ratio will not be an integer. Thus, Ar
2+
will appear at 13.33 AMU, while F
will show up at 9.5 AMU.
3+
IPN 074-430-P1F
3 - 12
3.3.1.2 Isotope Ratios
An additional cause of multiple peaks in the mass spectrum of a pure substance is
that most (but not all) elements are composed of more than one isotope. For
example, 99.63% of all nitrogen atoms in nature have a mass of 14 AMU; only
0.37% have a mass of 15 AMU. Carefully examine the nitrogen spectrum in Figure
3-6. The largest peak at 28 AMU is the parent ion, N
isotope peak,
since there are two nitrogen atoms in the ion, each one of which has a 0.37%
chance of being 15 AMU.
Some elements have many intense isotopes. For example, xenon is 0.096% mass
124, 0.090% mass 126, 1.92% mass 128, 26.44% mass 129, 4.08% mass 130,
21.18% mass 131, 26.89% mass 132, 10.44% mass 134, and 8.87% mass 136.
Isotope ratios, like fragmentation patterns, are a very useful aid in recognizing
specific materials. Under normal partial pressure analyzer ionization conditions,
the peak height ratios for the various isotopes of an element will be the same as
the ratios of their natural abundance’s. That is, the probability of ionizing, for
example, the mass 35 isotope of chlorine (
ionizing the mass 37 isotope (
from HCl will be 3.07 to 1 (75.4% / 24.6%).
14N15N+
Transpector CPM Operating Manual
+
. The peak at 29 AMU is the
2
, and is 0.74% (two times 0.37%) as high as the parent peak
35
37
Cl). Thus, the peak height ratio of mass 35 to 37
Cl) is the same as the probability of
For a listing of the isotopic ratios for the lighter elements, see Table 3-2. For a
complete listing of the natural abundances for the isotopes of all the elements, see
the Handbook of Chemistry and Physics from CRC Press.
Table 3-2 Isotope Ratios
Isotope Ratios
ElementMass No.Relative
Abundance
H199.985
20.015
He30.00013
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B1019.78
C1298.892
N1499.63
4~100.0
1180. 22
131.108
150.37
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Transpector CPM Operating Manual
Table 3-2 Isotope Ratios (continued)
Isotope Ratios
ElementMass No.Relative
Abundance
O1699.759
170.0374
180.2039
F19100.0
Ne2090.92
210.257
228.82
Na23100.0
Al27100.0
Si2892.27
294.68
303.05
P31100.0
S3295.06
330.74
344.18
360.016
Cl3575.4
3724.6
Ar360.337
380.063
4099.600
IPN 074-430-P1F
3 - 14
3.3.1.3 Electron Energy Effects
As was previously mentioned, the exact fragmentation pattern observed will
depend on the energy of the bombarding electrons. Figure 3-7 (from a paper by W.
Bleakney, Physical Review, 36, p. 1303, published in 1930) graphs the number of
argon ions (of different charge states) produced per incident electron per Torr of
gas pressure as a function of electron energy.
Figure 3-7 Electron Energy Effects
Transpector CPM Operating Manual
This graph shows the number or argon ions, N, formed per electron per Torr at
0°C versus electron energy.
The appearance potential — the minimum electron energy required to produce a
specific ion — for Ar
+
is 15.7 eV. The number of argon ions produced rises steeply
with energy until a maximum is reached at about 55 eV. As the electron energy
+
rises above this level, the rate of Ar
IPN 074-430-P1F
Typically, in mass spectrometry, electron impact ionization is carried out at an
electron energy of 70 eV. This value is chosen primarily for two reasons. First, it is
production slowly decreases.
above the minimum energy required to produce at least some positive ions from
any sufficiently volatile chemical species. Second, it is near the energy at which the
rate of ion production is at its maximum for most of the common gases. Thus,
operating at 70 eV provides a universal detector with good sensitivity for gases
typically encountered.
Sometimes there is a problem with mass spectral overlap — ions with differing
chemical composition form chemically distinct source molecules, but with the same
mass. For example, there is a problem with detecting small amounts of water vapor
in argon, as is often desired when monitoring a PVD process. Normally, water
vapor is monitored at 18 AMU (H
O+). There is a problem with overlap from the
2
doubly charged argon-36 isotope which also shows up at mass-to-charge ratio 18
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Transpector CPM Operating Manual
(most mass filters, including quadrupoles, are really mass-to-charge ratio filters
and not true mass filters). Approximately 3,400 parts per million of all argon atoms
2+
are the mass 36 isotope. Also, at 70 eV, the doubly-charged argon ion, Ar
about 15% of the intensity of the singly charged Ar
approximately 510 ppm (3,400 ppm times 15%) of
+
ion. Thus, there will be
36Ar2+
at 18 AMU, making it
, has
impossible to detect several ppm of water vapor at the same mass. Another ion
+
from water vapor, e.g. the OH
+
OH
at 17 AMU from water vapor has in intensity of only 25% of that of the parent
ion, H
O+. Thus, to detect several ppm of water vapor would require the detection
2
at 17 AMU could be used instead. Unfortunately,
of less than one ppm of current at 17 AMU. This is difficult because there will be
some tailing of the 510 ppm
36Ar2+
peak at 18 AMU over onto 17 AMU.
The best solution to this argon/water vapor problem is to make use of a property of
ions known as the appearance potential. The appearance potential for an ion from
a given substance is the minimum electron energy required to produce that
particular type of ion from the specified substance. A list of appearance potentials
for various ions from common gases is given in Table 3-3.
Table 3-3 Appearance Potential for Some Common Ions
Appearance Potential
IonGasMass-to-Charge
+
Ar
Ar
Ar
N
N
O
O
CO
CO
O
C
CO
O
C
H
OH
H
HF
2+
3+
+
2
+
+
2
+
+
2
+
+
+
+
+
+
+
O
2
+
+
2
+
argon4015.7
argon2043.5
argon13.3>70
nitrogen2815.6
nitrogen1424.3
oxygen3212
oxygen1614.01
carbon dioxide4413.8
carbon dioxide2819.4
carbon dioxide1619.4
carbon dioxide1222.7
carbon monoxide2814.1
carbon monoxide1620.9
carbon monoxide1220.9
water vapor1812.6
water vapor1713.5
hydrogen215.5
hydrogen fluoride2016.1
(eV)
IPN 074-430-P1F
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Transpector CPM Operating Manual
CAUTION
From Table 3-3, it can be seen that the appearance potential for Ar2+ is 43.5 eV,
while that for H
O+ is only 13.5 eV. Therefore, by choosing an electron energy
2
below 43.5 but above 13.5 eV, it is possible to produce the water vapor ion without
producing doubly charged argon ions, thus permitting the detection of water vapor
at 18 AMU.
The Transpector CPM sensor and electronics are capable of operation at electron
energies below 70 eV, with reduced electron emission (200 microampere,
maximum). For purposes of monitoring PVD processes, it is recommended that the
CPM be operated at 40 eV with an electron emission current of 200 microampere
(to reduce power to the filament). The software has the capability to switch the
CPM between 70 eV, 2.0 milliampere (CIS “high”) for background monitoring, and
40 eV, 200 microampere (CIS “low”) for process monitoring.
When using FabGuard Explorer, it is possible to change the electron energy in the
CIS “on” mode to any voltage between 10 and 100 eV.
Especially below 20 eV, it is necessary to limit the
electron emission current so as not to overpower the
filament which would result in shortened filament life.
Setting the electron energy is accomplished by selecting
the TUNE PARAMETERS menu while operating in the
TUNE mode.
3.3.1.4 A Qualitative Interpretation Guide
To use a partial pressure analyzer to identify unknown substances, you must
recognize three characteristics: fragmentation patterns, multiply charged ions, and
isotope ratios. Simple spectra are, in general, relatively easy to interpret and will
yield useful identifications. The analysis of complicated mixtures of substances is
much more difficult.
IPN 074-430-P1F
Table 3-4 is intended as a spectrum interpretation guide which may be of use when
first examining an unknown spectrum. The guide lists the masses of peaks,
possible ion identities for each of these masses, and common sources for each of
these ions. This list is by no means all-inclusive, and only goes up to 50 AMU.
Processes such as CVD and Etch often involve fairly complex chemicals which
provide very complicated spectra that extends to masses well beyond 50 AMU.
NOTES: (1) Fragments of several hydrocarbons, such as mechanical pump
oil, diffusion pump oil, vacuum grease, cutting oil, and organic
IPN 074-430-P1F
solvents.
(2) Fragments of several chlorinated hydrocarbons, such as carbon
tetrachloride, tichloroethylene, and many freons.
(3) Fragments from both straight chain hydrocarbons and benzene
ring hydrocarbons.
(4) F = Fragment ion; P = Parent ion; DI = Doubly ionized
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Transpector CPM Operating Manual
3.3.1.5 Dry Etching Chemistries
Table 3-5 lists some materials to be etched, some of the typical chemistries used,
some of the chemical species which may be important, and a list of masses which
can be used to monitor each of these species. It should be noted that there exist
many different chemistries for etching any given film, and that only a few of the
more common etch processes are listed. The important species listed for each
process were picked for the list on the basis of their either being the reagent gases
for the listed process, known reaction product gases, potentially troublesome
impurities (for example, H
means be considered an all-inclusive list; there may be other important species,
such as highly reactive intermediates, which have not been included. The list of
monitored masses for each process is also only a general guide. Note that
significant spectral overlap exists (for example, COF
for the listed masses which must be taken into account when interpreting the data.
Furthermore, many of the cracking patterns for the important species are very
complicated because of the molecule’s complexity and/or because of multiple
isotope peaks, and only a few of the more intense or unique masses are listed.
Table 3-5 Dry Etching Chemistries
O), or probable by-product gases. This should by no
2
and SiF4 or CO, CO2 and N2)
2
Etched
Material
Al (& alloys)BCl
Typical
Reagents
/Cl2 (+N2)BCl
3
Important
Species
3
Cl
2
N
2
O
2
AlCl
3
Al2Cl
6
HCl
H
O
2
Monitored
Masses
81, 83, 116, 118, 46, 48
70, 72, 74
28, 14
32, 16
134, 97, 62, 27
266, 231, 196, 161, 134, 97, 62
36, 38
18, 17
IPN 074-430-P1F
3 - 20
Table 3-5 Dry Etching Chemistries (continued)
Transpector CPM Operating Manual
Etched
Material
W (& alloys)
(TiN liner)
W (& alloys)
(TiN liner)
Typical
Reagents
SF
6
NF
3
Important
Species
SF
6
WF
6
F
2
HF
H
O
2
O
2
N
2
WOF
4
TiF
4
NF
3
WF
6
F
2
HF
H
O
2
N
2
O
2
WOF
4
TiF
4
Monitored
Masses
127, 89, 108
279, 281
38
20
18, 17
32, 16
28, 14
257, 259
86, 67, 105, 48
52, 33, 71
279, 281
38
20
18, 17
28, 14
32, 16
257, 259
86, 67, 105, 48
SiO
2
(& BPSG*)
IPN 074-430-P1F
CHF
CHF
/CF4,
3
3/O2
CHF
CF
O
SiF
CO
HF
H
2
COF
C2F
3
4
2
4
2
51, 69
69, 50
32, 16
85, 66, 47
44, 28, 16, 12
20
O
2
6
18, 17
47, 66
119
3 - 21
Transpector CPM Operating Manual
Table 3-5 Dry Etching Chemistries (continued)
Etched
Material
Si3N
4
Reagents
Poly-SiBCl
HBr/Cl2/O
Typical
CF4/O
/Cl
3
Important
Species
2
CF
O
SiF
NF
CO
4
2
4
3
2
HF
H
O
2
COF
2
N
2
CO
2
BCl
Cl
SiCl
3
2
4
HCl
H
O
2
2
HBr
Cl
O
SiCl
SiBr
SiBrXCl
2
2
4
4
(1-X)
H2O
HCl
Monitored
Masses
69, 50, 31
32, 16
85, 66, 47
52, 33, 71
44
20
18, 17
47, 66
28, 14
28, 12
81, 83, 116, 118, 46, 48
70, 72, 74
133, 135, 170
36, 38
18, 17
80, 82
70, 72, 74
32, 16
170, 133, 135
348, 267, 269
many peaks
18, 17
36, 38
3 - 22
* BPSG - boro-phospho-silicate glass
IPN 074-430-P1F
3.3.1.6 Tungsten CVD
Table 3-6 lists some of the materials of interest and the masses at which to monitor
them for blanket tungsten or tungsten silicide deposition. Oxygen and water vapor
are unwanted contaminants during tungsten deposition because they react with the
tungsten hexafluoride to produce tungsten oxyfluorides and oxides, which, except
for WOF
WOF
may be the only indication that water vapor or oxygen are also present, but
4
not detected by the mass spectrometer because of rapid reaction with the tungsten
hexafluoride.
Table 3-6 Tungsten CVD Materials Of Interest
Transpector CPM Operating Manual
, are nonvolatile and can result in particle generation. The presence of
4
ChemicalTypeMonitoring Mass
WF
H
SiH
6
2
4
reagent279
reagent2
reagent30, 31, 32
Arreagent40
N
2
reagent28
(interference from SiH4)
HFproduct20 (at 35 eV)
O
2
contaminant32
(interference from SiH4)
H
Ocontaminant18 (at 35 eV)
2
WOF
4
by-product257
3.3.1.7 Copper MOCVD
Table 3-7 lists some of the materials of interest and the masses for monitoring them
for the deposition of copper using Cu
I
(hfac)(tmvs). Oxygen and water vapor are
unwanted contaminants.
IPN 074-430-P1F
Table 3-7 Copper MOCVD Materials Of Interest
ChemicalTypesMonitoring Mass
I
Cu
(hfac)(tmvs)reagent201, 63
H
2
reagent2
Arreagent40
tmvsproduct100, 85
H(hfac)product139
O
2
H
Ocontaminant18
2
contaminant32
(if Ar present, use 35 eV)
3 - 23
Transpector CPM Operating Manual
PP
a
K
abIab
=
PP
a
M
ab
AbIab=
M
ab
1
FF
ab
XF
a
------------------------------=
3.3.2 Quantitative Interpretation of Mass Spectra
(Calculating Partial Pressures)
Partial pressure is defined as the pressure of a designated component in a gas
mixture. By Dalton’s Law, the sum of all the partial pressures is the total pressure.
The partial pressure analyzer is designed so that the height of a peak in a mass
spectrum is proportional to the number of ions giving rise to that peak. Also by
design, the number of ions is more or less proportional to the partial pressure of the
substance giving rise to that peak (over some specified operating pressure range).
Therefore, the height of a peak is proportional to the partial pressure of the
substance giving rise to that peak.
The following equation shows the relationship between the partial pressure of
substance determined by measuring the ion current at mass b:
[1]
The partial pressure of substance a is symbolized by PP
proportionality constant for the peak at mass b from substance a, and I
, while Kab is the
a
ab
is the ion
current at mass b from substance a.
The proportionality constant, K
, depends on the nature of the substance being
ab
detected and on the characteristics of the partial pressure analyzer. The substance
dependent part is called the material factor, M
called the analyzer factor, A
, and depends primarily on the ion mass, b. Therefore,
b
. The Instrument dependent part is
ab
the original equation [1] can therefore be rewritten as follows:
[2]
The material factor, M
, depends on the fragmentation pattern for the particular
ab
substance, the fragmentation pattern for a reference gas (usually nitrogen), and the
ease with which the substance can be ionized relative to the same reference gas.
The relationship involved is shown in equation [3]:
[3]
The term FF
is the fragmentation factor for substance a at mass b. It is equal to
ab
the fraction of the total current of all ions from substance a which have a mass b.
Finally, XF
XF
=1). That is, it is the ratio of total ion current (for all masses) from substance a
N
is the ionization probability of substance a, relative to nitrogen (i.e.,
a
to the total ion current from nitrogen, both measured at the same true partial
pressure. Both fragmentation factors and ionization probabilities depend strongly
on the energy of the ionizing electrons. If the correct values of these factors are not
known for the exact conditions of the particular analyzer being used, they can be
approximated using published values for other conditions with, generally, only a
small loss in accuracy.
IPN 074-430-P1F
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Transpector CPM Operating Manual
Fragmentation factors can be calculated from fragmentation patterns given in the
general references cited in Chapter 10, Bibliography. Other valuable references
include the Index of Mass Spectral Data from ASTM, and EPA/NIH Mass Spectral
Data Base by Heller and Milne and an extensive library of spectra is available from
the National Institute of Standards and Technology.
Table 3-8 lists the fragmentation factors (FF) for the major peaks for selected
substances.
NOTE: Actual fragmentation factors vary significantly depending especially on the
ionizer, electron energy, and mass filter turning. For best accuracy,
measure fragmentation factors with the same instrument used for the
analysis, under the same tuning conditions
IPN 074-430-P1F
3 - 25
Transpector CPM Operating Manual
Table 3-8 Typical Fragmentation Factors for the Major Peaks of Some Common Substances
.
(At 70eV Electron Energy)
MassFFMassFFMassFF
Acetone (CH
COHelium HeOxygen O
3)2
43.4641.0032.82
58.1116.18
42.03Hydrogen H
2
27.0521.00Toulene C6H5CH
Argon Ar92.24
40.87Krypton Kr39.07
20.1384.4565.04
86.1363.03
Benzene C
6H6
82.10
78.4383.10Trichlorethylene C
51.09130.17
52.09Methane CH
4
50.0816.44132.16
15.3997.10
Carbon Dioxide CO
2
14.0960.08
44.8613.05
28.0612.02Water H
16.0517.0118.77
12.0117.21
Methanol CH
OH16.02
3
Carbon Monoxide CO31.31
28.8732.21Xenon Xe
12.0829.07132.26
16.0428.04129.26
29.01131.22
Neon Ne134.11
Ethanol C
OH20.91136.09
2H5
31.4522.09
45.22
46.08Nitrogen N
2
27.0728.87
29.0514.12
29.01
2
3
91.33
HCl
2
3
95.16
O
2
IPN 074-430-P1F
3 - 26
Transpector CPM Operating Manual
Ionization probability factors can be approximated by substituting the relative ion
gauge sensitivities for various gases. Table 3-9 gives relative ion gauge
sensitivities for some common gases.
NOTE: This table lists relative ionization gauge sensitivities for selected
molecules. The data was compiled from Empirical Observations on the Sensitivity of Hot Cathode Ionization Type Vacuum Gauges by R. L.
Summers (NASA Technical Note NASA TN D5285, published in 1969).
Similar, although more limited, lists of ionization sensitivities can be found
in the books by O’Hanlon (Chapter 8, Section 1.1) and Drinkwine and
Lichtman (Table I, page 5).
HINT: Actual ionization probabilities vary significantly depending especially on the
ionizer and the electron energy. For best accuracy, measure the relative
ionization probability using a hot cathode ionization gauge (calibrated for
nitrogen) to monitor a known pressure of the substance of interest. The
ratio of the gauge reading to the known true pressure is the relative
ionization probability. To determine the true pressure, use a gauge which is
gas species independent (e.g., a capacitance manometer) or a gauge with
a known sensitivity factor (e.g., a spinning rotor gauge).
IPN 074-430-P1F
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Transpector CPM Operating Manual
Table 3-9 Ionization Probabilities For Some Common Substances
The analyzer factor, Ab, depends on the transmission and detection characteristics
of the analyzer, the Electron Multiplier gain (if the analyzer is so equipped), and the
basic sensitivity, as indicated in equation [4]:
[4]
Here, TF
factor is the fraction of ions at mass b which pass through the mass filter, relative
to nitrogen ions at mass 28. Nominally, the transmission factor is equal to 28
divided by the mass of the ion, b.
The detection factor, DF
Multiplier, the detection factor is a function of the mass of the ion and its chemical
nature, and is measured relative to that of a reference gas, typically nitrogen. In
general, as the mass ion increases, the Electron Multiplier detection factor
decreases.
The gain of the Electron Multiplier, G, measured at mass 28 for nitrogen, is the
Electron Multiplier output current divided by the Faraday mode output current,
under otherwise identical conditions. The multiplier gain is a strong function of the
high voltage applied.
The sensitivity of the instrument, S, is the Faraday mode ion current from a given
pressure of pure nitrogen measured at mass 28, and is typically expressed in
amps/Torr.
The overall relation between partial pressure and ion current, given in equation [5],
is quite general. The constants for this equation can be obtained from various
tables, but for the best accuracy, they should be measured for each instrument.
is the transmission factor of the mass filter at mass b. The transmission
b
, is equal to 1 for a Faraday Cup detector. For an Electron
at mass b which pass through the mass filter,
relative to ions with a mass of 28 AMU;
nominally, T
DF
. . . . . . . . . . . . . . . . . . . . . . . . . detection factor for mass b ions from
ab
= 28 / M (dimensionless).
FM
substance a, relative to nitrogen at 28 AMU;
assumed to be 1.00 for Faraday detectors,
but varies for Electron Multiplier detectors
(dimensionless).
G . . . . . . . . . . . . . . . . . . . . . . . . . . . Electron Multiplier gain for nitrogen ions at 28
AMU (dimensionless; set equal to 1 for a
Faraday Cup detector).
S. . . . . . . . . . . . . . . . . . . . . . . . . . . . sensitivity of instrument to nitrogen, the ion
current at 28 AMU per unit of nitrogen partial
pressure (usually in amps/Torr).
I
. . . . . . . . . . . . . . . . . . . . . . . . . . . ion current of mass peak b resulting from
ab
3.3.3 Additional Information For
Interpreting Mass Spectra
The following paragraphs contain additional information which may be of use when
interpreting mass spectra.
3.3.3.1 Ion Source Characteristics
It is important to recognize that even a closed ion source, and the particular inlet
system selected, can have an effect on the mass spectrum obtained.
The analyzer itself is a source of gas molecules because of outgassing from its
surfaces. Usually, the outgassing levels can be reduced by baking the analyzer in
vacuum and by using the Degas function (wherein the ion source surfaces are
bombarded by high energy electrons). Overnight bakeouts at the maximum
allowable temperature, are the best way to minimize the effects of outgassing of
the sensor, manifold, and inlet system.
substance a (in amps; assumes that there
are no other substances present which
contribute significantly to the total current at
mass peak b).
IPN 074-430-P1F
3 - 30
Transpector CPM Operating Manual
CAUTION
NOTE: It can take more than three hours for all parts of the sensor to reach
maximum temperature during a bakeout, and more than six hours to cool
back down.
Make sure that the Electron Multiplier high voltage is
turned off if the bakeout temperature exceeds 150°C.
Otherwise, permanent damage to the EM may result.
It is possible that the opposite of outgassing can occur, that is, gas molecules can
be captured by the surfaces of the sensor. This effect is called “pumping”. In such
cases, the magnitude of the signals of the gases pumped will be lower than is
properly representative of the composition of the gas in the vacuum chamber.
Significant temporary pumping effects will frequently occur following degassing of
the ion source.
Reactions involving gas molecules on surfaces of the analyzer can result in a
change of composition. Gases can either be consumed by the surfaces, or
produced by the surfaces. One example of gas consumption is the reaction of
oxygen with a hot filament, particularly when tungsten filaments are used. The
typical result is an anomalously low concentration of oxygen detected. See
O’Hanlon’s book (Chapter 8, Section 2) for more information on filament materials
and their interactions with the gas being analyzed. An example of gases being
produced from surfaces is the liberation of carbon monoxide molecules from a
thorium oxide coated iridium filament by a sputtering mechanism in the presence
of significant quantities of argon. It is for this reason that the PVD version of the CIS
uses tungsten filaments.
There are cases where at least some of the ions detected are emitted from
surfaces in the ion source under electron bombardment, and are not generated in
the gas phase from neutral molecules. This process is known as electron
stimulated desorption (ESD), or sometimes as electron induced desorption (EID).
IPN 074-430-P1F
When the sensor has been exposed to fluorine containing substances (such as
sulfur hexafluoride, chlorofluorocarbons, perfluorotributylamine, or
perfluorokerosene) for extended periods of time, it is not uncommon for a strong F
+
peak at 19 AMU to remain even after the fluorine containing substance has been
removed. When operating in the UHV region, EID/ESD of H
+
, C+, O+, and CO+
(and other ions) is not uncommon. The clue to diagnosing this problem is that the
observed fragmentation patterns do not match known gas phase patterns. See
pages five and six, and typical spectra TS2 through 5, 16, 28, and 30 of Partial
Pressure Analyzers and Analysis by Drinkwine and Lichtman for more information
on EID/ESD.
3 - 31
Transpector CPM Operating Manual
Partial pressure analyzers are also characterized by varying degrees of mass
discrimination, that is, the sensitivity of the instrument is a function of mass. Ion
sources show mass discrimination because various substances offer different
degrees of difficulty of ionization. Generally, heavy, large molecules are ionized
more readily than light, small molecules. There is a rough correlation between the
number of electrons in a molecule and its ease of ionization. Although the total ion
yield (that is, the sum of ions of all masses) is electron energy and ionizer
dependent, a reasonable estimate for the number of ions produced (relative to
some standard, usually nitrogen) in a partial pressure analyzer is the relative
ionization gauge sensitivity.
3.3.3.2 Scanning Characteristics
Quadrupole mass filters can also exhibit mass discrimination characteristics
depending on how the control voltages are varied during the sweep through the
mass range. Most instruments are designed to operate with a constant peak width
(constant M) which results in a resolution which is proportional to the mass. This
characteristic provides a good degree of peak separation throughout the mass
spectrum, but results in an ion transmission efficiency (that is, the fraction of all ions
of the selected mass entering the mass filter which are transmitted through it)
which decreases as mass increases.
The way the mass scale is “calibrated” or “tuned” — the way the peak positions and
widths are adjusted — can have a significant effect on the transmission efficiency
of the mass filter across the mass spectrum. If the adjustments are not made
properly, the ratios of peak heights across the mass range will not be correct.
3.3.3.3 Fragmentation Factors
The fragmentation factor is the fraction of the total ion current contributed by ions
of the chosen mass. Only peaks contributing at least one percent to the total ion
current are included in the list. The sum of the factors for all the peaks in a mass
spectrum cannot exceed 1.00. The sum can be less than 1.00 if only some of the
peaks are listed (either there are many peaks, or some of the ions produced lie
outside the mass range of the particular instrument used).
The data presented in Table 3-8 on page 3-26 are typical fragmentation factors for
some common gases at an electron energy of 70 eV. These fragmentation factors
can vary considerably with electron energy. For instance, at 35eV the only
significant peak made in argon is Ar
+
at 40 AMU.
IPN 074-430-P1F
3 - 32
4.1 CPM Controller Front Panel
CPM Controller
V1 (Low Pressure)
V2 (High Pressure)
V3 (High Conductance)
V4 (Bypass)
V5 (Calibration Std.)
LOW
HIGH
Accelerate
Normal
Fault
Remote On
HEATERTURBO PUMPVALVESPOWER
4.1.1 LED Indicators
Figure 4-1 CPM Front Panel Indicators
Transpector CPM Operating Manual
Chapter 4
Operation
VALVES (illuminated Green when valve is open)
V1: Low Pressure (LP)
V2: High Pressure (HP)
V3: High Conductance (HC)
V4: Bypass
V5: Calibration reference
HEATER
IPN 074-430-P1F
Low: ~90°C (Amber LED Illuminated)
High: ~150°C (Both LEDs Illuminated)
4 - 1
Transpector CPM Operating Manual
WARNING - Risk Of Electric Shock
TURBO PUMP
Accelerate: Amber LED Illuminated when the Turbo Molecular Pump is on, but
not at normal state.
Normal: System is normal and a good vacuum has been attained. System
Normal is described as the Turbo Molecular Pump reaching a speed greater
than or equal to 72,000 RPM.
Fault: System fault (See Chapter 6, Diagnosing Problems).
Remote On: Amber LED when illuminated indicates service mode is enabled.
For use only by qualified technical support personnel. For information, contact
INFICON customer support (refer to section 1.4 on page 1-5).
To eliminate personal injury the Turbo Molecular Pump
must be completely at rest and the controller power
supply must be disconnected before the Turbo Molecular
Pump connecting cable can be removed.
POWER
Illuminates when electrical power is applied to the CPM controller.
IPN 074-430-P1F
4 - 2
4.2 HexBlock
CAUTION
The HexBlock is a solid piece of machined inert 316 stainless steel that provides
several inlets, a process pressure gauge (CDG) and a calibration reference. It
allows for up to three pressure ranges, including a high conductance inlet that
covers various applications such as High Density Plasma Etch (HDP), TiN
Deposition such as TDMAT, W CVD, or any other semiconductor process.
It also has many other advantages, such as:
Small vacuum path lengths,
Minimum surface area,
Interchangeable orifices,
Various process connections (CF40, KF40 and KF25),
Various sniffer (capillary) inlets for sampling at the process.
The orifices mounted into the HexBlock are replaceable. Pressure ranges for V1
are 3mTorr to 10 Torr and for V2 are 3 mTorr to 100 Torr.
Transpector CPM Operating Manual
The tool and the CPM must be vented before changing
orifices, except when a tool isolation valve is installed.
4.2.1 HexBlock Inlet
V1 - Low pressure sampling (LP). Indicates background pressures for some
etch or CVD process. (No bypass available.)
V2 - High pressure sampling (HP). Indicates process pressures for etch, CVD
and 300 mm degas sampling. (Bypass is optional.)
IPN 074-430-P1F
V3 - High Conductance. This is similar to a wide open position and can be used
for any high vacuum condition lower than 1 mTorr.
V4 - Bypass. This is used in conjunction with V2 whenever there is a high
pressure application (above 5 Torr). V4 connects to the interstage of the Turbo
Molecular Pump and pulls the gases from the process to improve the response
time of high pressure applications.
Additional hardware includes another valve (V4) and a stainless tube between
the Turbo Molecular Pump and V4. Having this option will allow high pressures
sampling (>1 Torr) with minimum response time. The sample draw inlet
consumes 10 sccms of process gas to the orifice located at V2. This will cut the
response time down from several minutes to less than 10 seconds for a 100
Torr process.
4 - 3
Transpector CPM Operating Manual
CAUTION
NOTE: V4 will open before V2 to prevent pressure bursts. When V2 is closed,
V4 remains open for several seconds to pump out any residuals left
from sampling the process.
V5 - Calibration reference. Used for mass tuning and as a sensitivity reference.
This calibration reference provides:
a means to tune the RGA,
a reference for adjusting the EM voltage,
a way to check whether the orifices are getting dirty or clogged,
a reference for tracking the performance of the RGA.
The Calibration valve refers to the option of adding a Calibration reference to
the CPM system. The Calibration reference is located near the ion source of
the CPM system.
NOTE: The Transpector2 emission and electron multiplier are turned off prior
to opening the Calibration Valve (V5). This is due to trapped gas in the
calibration reference.
INFICON also offers an FC5311 tuning reference gas as an option used for
adjusting peak position for high AMU CPMs. It is controlled via a manual valve.
This tuning calibration mixture is a volatile liquid and is located at the inlet of the
high vacuum pump.
Due to the nature of the FC5311 reference gas, it may take
up to 24 hours of pumping to remove all trace levels of
the FC5311 compound after use. It is recommended that
a bakeout be performed if the FC5311 reference gas is
sampled.
Sniffer (capillary) - The sniffer option allows sampling closer to the actual
process reactions and it gives a faster response time and better signal (uses
valve V2).
CDG Port - The CDG port is for measuring process pressure. The CDG
automatically opens and closes the inlet valves based upon process pressure
setpoints. It also helps to prevent accidental or erroneous inlet valves from
being opened.
IPN 074-430-P1F
4 - 4
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