Read this manual before installing, operating, or servicing equipment. Do not install
substitute parts, or perform any unauthorized modification of the product. Return the
product to Sigma Instruments for service and repair to ensure that safety features are
maintained.
Safety Symbols
WARNING: Calls attention to a procedure, practice, or condition that could
possibly cause bodily injury or death.
CAUTION: Calls attention to a procedure, practice, or condition that could
possibly cause damage to equipment or permanent loss of data.
Refer to all manual Warning or Caution information before using this product
to avoid personal injury or equipment damage.
Hazardous voltages may be present.
Earth ground symbol.
Chassis ground symbol.
Equipotential ground symbol.
Warranty Information
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A. Material Parameters
B. Specifications
C. I/O Connections
D. Handheld Remote Controller
E. Declaratio n of Conformity
Chapter 1Quick Start
1.0 Introduction
The SQC-222 is a multi-channel quartz crystal monitor and deposition controller. It
measures two 1 MHz to 6 MHz quartz crystal sensors, and controls up to two
evaporation sources. Eight process control relays, and eight digital inputs are easily
configured to support a broad range of external functions, including source pocket
rotation. The number of sensors, outputs, and digital I/O can be doubled with an
optional expansion card.
This chapter will aid you in the initial setup and operation of your system . Plea se re view
the entire manual for detailed operational, programming, and safety information.
1.1 Front Panel
SoftKeys Control Knob Remote Jack
Front Panel Controls
SoftKeysProvide access to instrument operations and setup menus.
The functions of the SoftKeys change to adapt to different
operations and are displayed on the left of the screen.
Control
Knob
Remote
Jack
Used to adjust values and select menu items. Pushing the
control knob stores the current setting and moves to the next.
Connection jack for the optional handheld remote controller.
See Appendix D.
1-1
Chapter 1Quick Start
1.2 Rear Panel
Manufactured By
Sigma
Σ
instruments
Sensor 3 Sensor 4Output 3 O utput 4
Sensor 1 Sensor 2Output 1 O utput 2
SQC-222 D eposition Controller
Serial No.
I/O 9-16
I/O 1 - 8
100-120/200-240 V~
50/60 Hz
25 VA
Fuse T.5A 250V
RS-232
Rear Panel Connections
Sensor 1 & 2Connects to quartz crystal sensor (see next section).
Output 1 & 2Connects the SQC-222 output to your evaporation supply
control input (see next section).
I/O (1-8)Connects 8 relays and 8 digital inputs to external equipment for
process control. See Appendix C for connections.
RS-232Connects to a computer for programming and data acquisition.
Also used for the PLC I/O option.
Sensor 3 & 4,
Output 3 & 4,
Increases the number of input, output, and digital I/O
connections when the optional expansion card is installed.
I/O 9-16
Measurement ground terminal useful for common system and
cable grounding.
1-2
Chapter 1Quick Start
Power Input and
Fuse
Connects to mains power. The SQC-222 automatically detects
mains voltages of 100-120 and 200-240VAC, 50/60 Hz
ARNING: For continued protection, replace fuses with the
W
proper type and rating.
WARNING: Use removable power cords only of the specified
type and rating, attached to a properly grounded receptacle.
1-3
Chapter 1Quick Start
1.3 System Connections
Sensor
In-V ac
Cable
Feedthrough
Source
Shutter
Evaporation Supply
Output Control Input
6" BNC Cable
O s cillat o r
BNC
Cables
Ground Wire
System Components
SensorHolds the quartz crystal used to measure rate and thickness.
Crystals must be replaced occasionally.
In-Vac CableA coaxial cable that connects the sensor to the feedthrough.
FeedthroughProvides isolation between vacuum and atmosphere for
electrical and cooling lines.
6” BNC CableProvides a flexible connection from the feedthrough to the
oscillator. Keep this cable as short as possible.
OscillatorContains the electronics to operate the quartz crystal. Total
cable length to the crystal should be under 40”.
Sensor Input
BNC Cable
Control Output
BNC Cable
Connects the oscillator to the SQC-222 input. Lengths up to
100’ are acceptable.
Connects the SQC-222 output to the evaporation source’s
control voltage input. Keep the length below 10’.
Ground WireA wire, typically braided, that connects the vacuum system to
the SQC-222 ground terminal. Important for noise rejection.
1-4
Chapter 1Quick Start
1.4 Installation
WARNING: Care should be exercised to route SQC-222 cables as far as practical from
other cables that carry high voltages or generate noise. This includes other line voltage
cables, wires to heaters that are SCR-controlled, and cables to source power supplies
that may conduct high transient currents during arc down conditions.
Rack
Installation
Power
Connection
Sensor Input
Connections
Source Output
Connections
Digital I/O
Connections
The SQC-222 occupies a 5.25” high, half-rack space. An
optional installation kit is available to adapt to a full rack (see
Chapter 4). Install the unit in a 19” rack with the supplied
hardware.
The SQC-222 automatically detects mains voltages of 100-120
and 200-240VAC, 50/60Hz .
WARNING: Verify that the power cable provided is connected to
a properly grounded mains receptacle.
Connect the BNC cables and oscillators from your vacuum
chamber feedthrough to the desired SQC-222 sensor inputs.
See the previous section for cabling details.
Connect the BNC cables from the SQC-222 output connectors
to your evaporation supply control input. Consult your Power
Supply operator’s manual for control input wiring instructions.
Refer to Appendix C for details on wiring digital I/O to the SQC222 Relay I/O connectors. Appendix C also covers I/O wiring
with the optional PLC.
Computer
Connection
If you would like to use the Windows software to collect data or
program the SQC-222, attach a 9 pin straight-thru cable from
the RS-232 connector to your computer’s serial port. A cable
is supplied with the SQC-222.
1-5
Chapter 1Quick Start
1.5 Menus
At power up the SQC-222 briefly displays initialization and version information, then the
Main screen.
Note: If you are prompted for a password, use the switches along the left of the screen
to enter the password. The top switch is “1”, the bottom switch is “6.” See the System
Parameters section of this manual for password setup information.
Next
Menu
Process 1 : Layer 1 of 1Run # :0
Stopped
Power (% vs. Time)
100.0
0:00:00
Quick
Edit
Auto /
Manual
50.0
Zero
0.0
Next
Layer
Start
Out#
1
2
3
4
0.0
R a te (A /S )
0.00
0.00
0.00
0.00
6.2
12.5
Dev(%)
00.0
00.0
00.0
00.0
18.8
Thick(kA )
0.000
0.000
0.000
0.000
25.0
Pow(%)
0.0
0.0
0.0
0.0
M a in S c r ee n
The first line of the Main screen shows the name of the currently selected process.
After the process name are the layer that will run when the Start SoftKey is pushed, and
the total number of layers in the process. Further to the right is the number of times this
process has been run.
The second line of the Main screen is a status line. It displays the current phase of the
deposition cycle, and other status or error messages. When the process is running, the
right side of this line shows the process elapsed time.
Three graphs are possible: rate, rate deviation, and output power. The graphs scale the
vertical axis and scroll the horizontal axis based on the data displayed.
Below the graph are two lines that show deposition readings (four lines if the option card
is installed). This section shows current rate, rate deviation, thickness, and output
power as shown above. Alternatively it can show measured rate and thickness versus
rate and thickness setpoints.
1-6
Chapter 1Quick Start
The six SoftKey legends along the left side of the screen will change, depending on the
status of the process and the functions you select. Press Next Menu to display
alternate main screen menus:
Main Menu 1Main Menu2Main Menu 3
Next
Menu
Quick
Edit
Auto /
Manual
Zero
Next
Layer
Start
Selec t th e n ext la yer
Main Menu 1
Access the most
comm only edited
setting s.
Switch between PID
and Manual power
control.
Zero the thickness
reading on all
channels.
in the process.
Start or Stop the
selected layer.
Next
Menu
Next
Graph
Next
Display
Sensor
Info
Next
Layer
Start
Third menu available only
when process is stopped.
Switch graph between
Main Menu 2
rate, deviation, and
power.
Switch the readout
below the graph.
Dis p lay d eta ile d
sensor information.
Selec t th e n ext la yer
in the process.
Start or Abort the
process.
Next
Menu
Process
Menu
Film
Menu
System
Params
Start
Create or edit process
Create or edit films to
Main Menu 3
layers .
be used as layers.
Modify instrument
related se tting s.
Start the selected
layer.
Because Main Menu 3 provides access to functions that can completely redefine a
process, it is available only when the process is not running.
Spend some time now moving between the three menus. Pay particular attention to the
effects that the Main Menu 2 selections have on the displa y. W e will cover the setu p
parameters of Main Menu 3 in the Building a Process section.
1-7
Chapter 1Quick Start
1.6 Thin Film Deposition Overview
The SQC-222 stores the recipes, and provides the operating functions, required to
control thin film deposition processes. A typical thin film deposition cycle is shown
below.
The cycle can be broken into three distinct phases:
• Pre-conditioning (ramp/soak)
• Deposition
• Post-conditioning (feed/idle)
During pre-conditioning, power is supplied in steps to prepare the evaporation source
for deposition. Once the material is near the desired deposition rate, material
deposition begins.
During deposition, the PID loop adjusts the evaporation source power as required to
maintain the desired rate. In CoDeposition multiple films can be deposited
simultaneously.
When the desired thickness is reached, the evaporation source is set to idle power. At
this point the process may be complete, or deposition of another layer may begin.
1-8
Chapter 1Quick Start
1.7 Building a Process
This section presents a brief guide to building and running a simple one layer process.
Chapter 2 covers instrument operation in much greater detail.
Create a
Film
M a in
Screen
Prev
Menu
Edit
Delete
A film is a material to be deposited, and its associated
deposition settings. Initially the list of films may be empty.
Press Next Menu until the Film Menu SoftKey is displayed.
Press Film Menu to view a list of stored films. Turn the setting
knob to scroll to an entry in the list that is currently labeled
<Empty>.
Press the Create SoftKey to create a default film at that
location. Note the film number that you just created. For now,
accept the default film parameters.
Press Main Screen to return to the main screen.
Process 1
S c ro ll film s w ith k n o b .
1. Film 1
2. Film 2
3. Film 3
4 . F ilm 4
5. Film 5
6. Film 6
7 . F ilm 7
8. Film 8
9. Film 9
10. Film 10
11. Film 11
12. Film 12
13. Film 13
F ilm Se le c t Me n u
Now that we are sure that at least one film exists, we will build a simple single layer
process using that film.
1-9
Chapter 1Quick Start
Select
Process
Edit
Process
Insert
Layer
Press the Process Menu SoftKey to view a list of processes.
Turn the setting knob to scroll to an entry in the list that is
labeled <Empty>.
Press the Create SoftKey to create a default process at that
location.
Press the Select SoftKey to make the selection the active
process.
Press the Edit SoftKey to view a list of layers in the selected
process. The layers list should be blank.
Press Insert Layer, then scroll down the list of films to the film
you just created.
Press Insert Normal to insert the selected film as Layer 1.
The display returns to the Layer Select menu.
To
Ma in
Prev
Menu
Edit
Cut /
Paste
Insert
Layer
P ro c e ss 2 5 -> L a ye r 1 -> F ilm 1
Layer
Layer1
Layer S elect Menu
F ilm
F ilm 1
A process consists of one or more layers. Each layer can have a different film, or even
multiple films (CoDeposition). For this example, we will stop with only a single layer.
1-10
Chapter 1Quick Start
Edit
Layer
To
Main
Prev
Menu
Edit
With Layer 1 selected, press Edit to display the Layer Edit
menu for Layer 1.
Process 1 -> Layer 1 -> Film 1
ParameterValueUnits
In it R a te1 0 .0A /s
Fnl T hk
Tim e Setpoint
Thickness Lim it
Start M ode
Output
Max. Power90.0
S le w R a te
Sensor 1
Sensor 2
Sensor 3
Sensor 4
Ramp1
0.100
0:00:00h:m m:ss
0.000
Manual
Out1
90.0
On
Off
Off
Off
Disabled
Layer Edit M enu
k/A
kA
A u to /M a n .
O ut1/O u t2
%
%
O n/O ff
O n/O ff
O n/O ff
O n/O ff
En/Dis
Edit Menu
Operation
Edit
Layer 1
To edit a setting in any menu, turn the control knob to scroll to
the desired setting, then press the Edit SoftKey. The cursor
moves to the setting value, and the SoftKey functions change
to show:
Next: Store the parameter and move to next parameter for
editing.
Cancel: Stop editing and return the selected parameter to its
previous value.
Enter: Stop editing and save values for selected pa rameter.
In Edit mode, adjust the control knob to set the desired
parameter value.
Spend some time navigating through the Layer 1 parameters
and editing values. When you are comfortable, be sure your
values for Layer 1 match those shown above.
Press Main Menu to return to the Main Screen.
We have completed the design of a single layer process.
1-11
Chapter 1Quick Start
1.8 Depositing a Film
Note: You can simulate the steps below, without actually depositing a film, by going to
the System Params Menu and selecting Simulate Mode ON. Simulate mode is useful
for testing processes before applying power to the evaporation supply. See Section 3.6
for detailed System Parameters Menu information.
Verify Sensor
Operation
Show
Power Graph
Verify Output
Operation
Press Next Menu until the Sensor Info option is shown.
Press Sensor Info to display the quartz sensor readings.
Sensor 1 should be ON and display a % life of over 50%. If
not, check your sensor connections (Section 1.3), and refer to
Min/Max Frequency (Section 3.6).
Press Exit to return to the main screen.
Press the Next Graph SoftKey until the graph shows Power (%
vs. Time).
Press the Next Menu SoftKey until the Auto/Manual SoftKey is
displayed. Now press Auto/Manual until Manual/Auto is
displayed. Press Start to begin deposition in manual mode.
Slowly turn the control knob to increase the control voltage to
your evaporation supply. Verify that the Power(%) reading for
Output 1 (lower right, below graph) approximates the actual
output of your evaporation supply. If not, check your hookup
(Section 1.3), and refer to Scale Voltage (S ecti on 3.6) .
Caution: Observe the output power versus your evaporation
supply’s actual output. If there is a problem, press the Stop
SoftKey immediately.
Enter
Auto Mode
Please take time to review the remainder of this manual for detailed operational,
programming, and safety information.
Press the Next Menu key until the Manual/Auto SoftKey is
shown. Press Manual/Auto to change the SoftKey display to
Auto/Manual. This places the output under PID deposition
control.
Press Stop at any time to halt deposition and set output power
to zero.
1-12
Chapter 1Quick Start
1-13
Chapter 2 Operation
2.0 Introduction
This chapter describes common tasks associated with operating the SQC-222. It
assumes that you understand basic operation of the menus and parameter setup as
described in Chapter 1. Detailed definitions of each parameter can be found under the
appropriate menu description in Chapter 3.
2.1 Definitions
Several terms will be used repeatedly throughout this manual. It is important that you
understand each of these terms.
Material: A physical material to be deposited. A database of approximately 100
materials is stored in the SQC-222, and additional materials may be added using the
setup software. Three parameters completely define a material: Name, Density, and ZFactor. A table of common materials, their density, and Z-Factor is listed in Appendix A.
Film: A film describes in detail how a material will be deposited. It includes the material
definition and all of the preconditioning, deposition, and post conditioning variables
necessary to accurately deposit the materi al. Bec ause th e film de fini ti on does not
include rate and thickness information, a single film can be used in several different
layers and processes. The SQC-222 stores up to 25 films.
Layer: Layers are the basic building blocks of processes. A layer consists of a film and
the thickness and rate setpoints for that stage of the process. Layers also define which
outputs and sensors will be used at that point in the process. Codeposition of multiple
films occurs when more than one output is active during a layer.
Process: A process is a sequence of layers to be deposited. The SQC-222 can store
up to 25 processes, consisting of a total of 400 layers.
Phase: A step in the deposition cycle. Preconditioning phases include Ramp 1, Soak 1,
Ramp 2, Soak 2. Deposit phases include indexer rotate, shutter delay, deposition, and
deposition rate ramps. Post conditioning phases include Feed Ramp, Feed, and Idle
Power.
2-1
Chapter 2 Operation
2.2 Defining a Film
A film is a material to be deposited, plus all of its associated setup parameters. Keep in
mind that a film can be used in multiple layers, or even multiple processes. Editing a
film’s parameters will cause changes to every location where the film is used.
To define a film, press Next Menu until Film Menu is shown (Menu 3). Press FilmMenu. A list of 25 films (or <Empty>) will be displayed. To define a new film, scroll to
<Empty> and press Create. A new Film# is added to the list of existing films (you can
use the SQC-222 setup software later to assign descriptive film names). Press Edit to
display the parameters fo r this film.
To
Main
Prev
Menu
Edit
F ilm
Conds.
Deposit
Controls
P ro c e s s 1 Editin g : F ilm 1
ParameterValueUnits
P Term50None
I T e rm
D Term0.0Sec.
F ilm T oolin g
Pocket
C rystal Qu ality
Crys t a l Stability
Xtal Fail M ode
Material
Density
Z Factor
0.7
100
None
Disabled
Disabled
Halt
Aluminum
2.73
1.08
F ilm E d it M e n u
Sec.
%
gm/cc
P Term is the proportional gain, that is the % process rate change divided by the %
input power change. The I Term (integral) sums the rate deviations over time to more
accurately achieve the rate setpoint. The D Term (derivative) speeds response to
sudden changes in rate. Volumes have been written on determining the proper PID
settings. See the section on Loop Tuning later in this chapter for a common PID loop
tuning procedure. Start with P=25, I=.5, D=0.
Film Tooling adjusts for differences in actual versus measured thickness for this film
(material). This parameter is seldom used, but can adjust for material specific
dispersion patterns. See Xtal Tooling in the System Par a meters menu for the more
commonly used tooling correction.
Pocket selects the source pocket used for this film. This parameter requires that the I/O
Setup section of the System Parameters me nu be pr og r am med for pocket rel ay s .
2-2
Chapter 2 Operation
The next chapter covers Crystal Quality, Stability, and Fail Mode. For initial operation
leave Quality and Stability disabled, and Fail Mode set to Halt.
With Material highlighted, press Edit to scroll through the list of available materials.
Select the desired material and press Enter. You could also change the Density and ZFactor for the selected material, but it is unlikely those values are wrong. To add a new
material or edit the name of an existing material, you must use the SQC-222 setup
software.
Film conditioning adjusts the output power level to achieve a desired material state
before and after deposition. Press Film Conds to enter the film conditioning menu.
To
M a in
Prev
Menu
Edit
Process 1 Editing: Film 1
Param eterValueUn its
Ramp1 Power
Ramp1 T ime
Soak1 Time
Ramp2 Power
Ramp2 T ime
Soak2 Time
Feed Power
Ramp Time
Feed Time
Idle Powe r
Ramp Time
Film C onditioning Menu
25.0%
0:00:10
0:00:05h:mm:ss
50.0
0:00:05
0:00:05
0.0
0:00:00
0:00:00
0.0
0:00:00
h:mm:ss
%
h:mm:ss
h:mm:ss
%
h:mm:ss
h:mm:ss
%
h:mm:ss
Ramp1 starts at 0% power and increases the power during Ramp1 Time to the Ramp 1
power level. Set the Ramp 1 Power and Time to gradually bring the material to a near
molten state. Set the Soak 1 Time to a value that will allow the material to
homogeneously achieve that state. Ramp 2 is used to slowly bring the material to a
power level that nearly matches the desired deposition power. Use Soak 2 to hold the
material at that level until deposition (i.e. rate control) begins.
If you use wire feed to replenish material after deposition, set the Feed Power and times
as required. The idle conditioning phase typically ramps output power back toward zero
at the end of a process.
From the Film Conds menu, press Prev Menu to return to the main Film Params menu.
2-3
Chapter 2 Operation
Now press Deposit Controls. The Deposit Controls menu contains parameters that
modify operation during the deposition phase.
Process 1 Editing: Film 1
To
Main
Prev
Menu
Edit
Shutter delay causes the SQC-222 to delay opening the shutter until the process has
stabilized at the desired deposition rate. Capture is the % rate deviation that must be
achieved to open the shutter and go to the Deposit phase. Shutter delay is the
maximum amount of time to wait for capture to be achieved. Set Shutter Delay and
Capture to zero to disable this feature.
ParameterValueUnits
Shutter Delay
Capture
Control Error
Setting
Error
Rate Sampling
Setting
0:00:00h:mm:ss
0.0
(Ignore, Stop, Hold)
Stop
0.0
(Cont, Time, Acc based)
Continuous
Deposition Controls Menu
%
%
%
During co-deposition, the SQC-222 waits for all films to achieve capture before moving
to the deposit phase. If any film fails to achieve rate capture within its programmed
shutter delay time, an error occurs.
If the SQC-222 is unable to maintain the desired deposition rate (for example, out of
material or a bad sensor), one of three actions is possible. Keep trying (Ignore), set
power to zero to halt deposition (Stop), or maintain constant power (Hold) and
extrapolate thickness from the last good rate reading. Until your process is known and
stable, it is best to leave the Control Error setting on Ignore.
Rate sampling can extend sensor life in high rate processes. Select Cont (continuous)
to disable rate sampling. A Time selection closes the shutter for a fixed time, then
opens the shutter for a fixed time to sample the rate. Acc Based (accuracy based)
sampling closes the shutter for a fixed time, then opens the shutter until the desired rate
is achieved. Rate Sampling assumes a very stable process!
2-4
Chapter 2 Operation
2.3 Defining a Process
To define a process, press Next Menu until the Process Menu SoftKey is shown. Press
Process Menu. A list of 25 processes (or <Empty>) will be displayed. To define a new
process, scroll to <Empty> and press Create. A new Process# is added to the list of
existing processes (use the SQC-222 setup software to assign descriptive process
names).
Press Select, then Edit to display the sequence of layers and films that comprise the
selected process.
To add a layer, scroll to the desired location in the layer sequence, and press InsertLayer. Select a film from the list and press Insert Normal to insert a new layer. Layers
are always inserted at the selected layer. The selected layer and subsequent layers will
be shifted down.
Hint: When building a process it may be easiest to add a “dummy” last layer and keep
inserting above that layer. When the process is complete, delete the “dummy” layer.
To add a film to an existing layer so that materials will be codeposited, highligh t the
layer after the desired codeposition layer. Press Insert Layer, select the desired film,
then press Insert CoDep. The codeposited film will be inserted in the layer above the
selected layer, and indented to show that it is a codeposition film.
The display below shows two films being codeposited with Film1, then a fourth film
being deposited as an additional layer. While layers are always numbered sequentially,
the films are sequential only for this example. Any film can be used in any layer.
To
Ma in
Prev
Menu
Edit
Cut /
Paste
Insert
Layer
P ro c e ss 2 5 -> L a ye r 1 -> F ilm 1
Layer
Layer1
L a y e r2
L a y e r3
Layer4
F ilm
F ilm 1
F ilm 2
F ilm 3
F ilm 4
Layer S elect M enu
2-5
Chapter 2 Operation
To delete a layer, highlight it in the Layer Select menu and press Cut/Paste.
On the Cut/Paste menu, press Cut to remove the layer. Press Prev Menu to return to
the Layer Select menu.
To
Main
Prev
Menu
Copy
Cut
P ro c e ss 2 5 -> L a ye r 1 -> F ilm 1
Layer
Layer1
L a y e r2
L a y e r3
Layer4
Cu t/Paste Menu
F ilm
F ilm 1
F ilm 2
F ilm 3
F ilm 4
To move or duplicate a layer, highlight it in the Layer Select menu and press Cut/Paste.
On the Cut/Paste menu, press Cut to remove the layer. A copy of the layer is
automatically saved to copy/paste memory. Press Copy to save a copy to memory
without removing the layer. Without leaving the Cut/Past menu, highlight the layer that
you want to insert the cut layer above and press Paste Normal or Paste CoDep.
Operations on the Cut/Past menu can be repeated several times. Each cut operation
overwrites the cut/paste memory. Pressing Prev Menu on the Cut/Past menu returns to
the Layer Select menu. The contents of copy/paste memory are lost!
Note: Once a film is assigned to a process layer, you cannot change the film. Instead,
cut the layer, then insert a new layer and select the desired film.
2-6
Chapter 2 Operation
2.4 Defining a Layer
To edit a Process Layer, press Process Menu. Select the desired process, then press
Edit. Finally, select the desired layer and press Edit.
To
Main
Prev
Menu
Edit
Process 1 -> Layer 1 -> Film 1
ParameterValueUnits
In it R a te1 0 .0A /s
Fnl Thk
Tim e Setpoint
Thickness Lim it
Start Mode
Output
Max. Power90.0
S le w R a te
Sensor 1
Sensor 2
Sensor 3
Sensor 4
Ramp1
0.100
0:00:00h:mm :ss
0.000
Manual
Out1
90.0
On
Off
Off
Off
Disabled
k/A
kA
A u to /M a n .
O ut1/O u t2
%
%
O n/O ff
O n/O ff
O n/O ff
O n/O ff
En/Dis
Layer Edit M enu
Initial Rate and Final Thickness are the main process setpoints for the film used in this
layer. Time Setpoint and Thickness Limit are secondary values that will activate a rela y
when they are reached.
Start Mode controls operation in multi layer processes. In Auto Start the layer starts
immediately on completion of the previous layer. Manual Start waits for a user signal
via the front panel, RS-232, or digital input to start the layer. Don’t confuse this Manual
Start mode with the Manual Power SoftKey function.
The Output entry assigns the layer/film parameters to a specific SQC-222 rear panel
output. The layer and film parameters for power, preconditioning, PID settings, etc. will
be applied to the selected output. Assign the Max Power and Slew Rate appropriate for
this material and your power supply. For now, set both to 100%. Set them to lower
values if you find that small power changes cause excessively large changes in
deposition rate.
The SQC-222 can use multiple sensors to measure a film’s deposition rate and
thickness. If multiple sensors are selected, an average of the sensors is used. Set
each sensor that will be used to measure this film to ON.
Rate Ramps allow the PID controlled deposition rate to change over time, under PID
control. Each rate ramp has a starting thickness, an elapsed time to ramp to the new
rate, and a new rate setpoint. Each process layer can have up to two rate ramps.
2-7
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