Nikon L200A User Manual

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Automated IC Inspection Microscope
Automated IC Inspection Microscope L200A
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The next generation in automated
IC inspection microscopy
To minimize the chance of contamination, the L200A's aperture control and other major operations are now motorized, enabling remote control for use on unattended IC production lines. Like other Eclipse-
series microscopes from Nikon, the L200A features industry-acclaimed CFI60 infinity optics. Include an ergonomic design for comfortable viewing, a rigid, vibration resistant construction, and you have a microscope unsurpassed to meet the stringent requirements of the latest semiconductor fabs. The L200A is the next step upward in automated IC inspection microscopy.
Standardized, contamination-free inspections
Cursor keys
LCD screen
DIC adjustment
knob*
Aperture keys
Darkfield key
Brightfield key
Option keys
Objective
selection keys
Enter key
Menu key
Focus dial
Focus Coarse/Fine changeover key
AF-MF changeover key* Focus fine adjustment knob* (When AF is ON)
Lamp intensity Auto/ Manual changeover key
Lamp intensity control knob
Motorized, remote control minimizes the chance of contamination, while enhancing productivity
Frequently used operations such as aperture control, focusing, brightfield­darkfield changeover, nosepiece rotation, lamp intensity control, and DIC setting (option) are all motorized and can be controlled by the remote controller or a PC. In addition, there is virtually no operation that requires manual adjustment above the sample, therefore preventing particle contamination introduced from the operator.
Free from deviations in inspection results, due to human errors and differences in microscope settings
Optimum observation conditions including focus position, aperture, light intensity, as well as DIC prism and polarizer position can be preset objective-by-objective and recalled simply by selecting the objective. This eliminates the need to configure these settings each time the microscope is used, providing standardized observation regardless of who operates the microscope.
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*Active when the respective optional module is attached.
Remote Controller
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Easy configuration into an automated inspection system
Programmed settings
As an inspection process varies depending on substrate, layer, and even the operator, it has been necessary to re­adjust settings for each inspection process. The L200A's programming feature eliminates this process. You just select the settings-such as observation method, objective magnification, point to be checked, focus position, aperture, and light intensity-and save them by attaching appropriate file names. All you need do to begin your inspection is just to specify the file name.
DART software (option)
AF
RS232C (Binary)
Local
Local
Scanning
stage (ISS)
Wafer
Loader
NWL860
Local
PC (DART Software) (Other Software)
Other Euipment
Local
Local
RS232C (Binary)
RS232C (Binary)
RS232C (SECS)
L200A
DIC
Confocal
DUV
Filing
System
Host
Computer
Auto In­spection
Machine
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In combination with wafer loaders
Of course, the L200A can be configured with Nikon's NWL-860 series of wafer loaders and manual or motorized scanning stages to create a wafer inspection system at a minimum cost.
DART Software is an integrated software package that can fully automate the inspection process. DART combined with an NWL860 wafer loader, ISS200 Motorized Stage and a L200A Auto Focus offers a complete automated wafer inspection station. DART software modules allow further upgrades with options such as image archiving, defect review, post probe review and online communications.
Communication System Diagram
L200A configured with NWL-860 INX
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Top-notch basic performance facilitates inspections Accessories to enhance performance
High-contrast darkfield images
A new illumination system produces a Signal to Background (S/B) ratio that is nearly three times greater than former models. This improves sensitivity during darkfield observations, enabling the detection of minute scratches and surface irregularities within the sample, and provides exceptionally high contrast.
CFI LU/L Plan series objectives
Illumination systems
•12V-100W halogen lamphouse
•100W mercury lamphouse
•150W metal halide lamphouse
•75W xenon lamphouse
Stages and wafer holders
•8x8 Stage
•8-inch (200mm) wafer holder
•6-inch (150mm) wafer holder
•6-inch (150mm) mask holder
•5-inch (125mm) mask holder
•4-inch (100mm) mask holder
DXM1200 digital camera
The DXM1200 Digital Camera achieves ultra­high-quality digital images equivalent to approximately 12 million output pixels, plus has a low-noise design for clear, low-light image capture. The camera's software can be set to automatically categorize the images taken, sort them and save them, all automatically—a powerful feature when you take a large number of photomicrographs.
SEMI S2-93A, S8-95 compliant design
Centerable motorized nosepiece
The sextuple motorized nosepiece not only has the same encoded positioning system offered on the Eclipse L200, but it also offers three adjustable objective positions that improve par-centricity even more.
Safeguards against contamination
The body of this microscope is finished with electrostatic discharge (ESD) coatings to prevent foreign particles from adhering to it. Furthermore, the motorized nosepiece uses a shielded center-motor that traps foreign particles inside, preventing them from falling onto the sample.
Vibration-isolation design
Thanks to Computer-Aided Engineering, the L200A is three times less susceptible to floor vibrations when compared with conventional models in this class. This reduces the chance of unwanted blur or image shifts even during high­magnification observations.
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Nikon's renowned CFI60 optics are the fusion of CF design and infinity optics. These new optics feature longer working distances and high N.A.'s. They also produce brighter images with more contrast and reduced flare.
Optical System
A tilting trinocular eyepiece tube with a lower eyepoint designed to be closer to the operator allows you to sit in a more natural erect position. Microscope controls located comfortably up-front in the microscope base minimize hand movement, allowing you to concentrate on the inspection process.
System Diagram
ECLIPSE L200A Conventional model
Type Magnifi- N.A. W.D.
cation (mm) CFI L Plan Epi* 2.5X 0.075 8.80 CFI LU Plan Epi* 5X 0.15 23.50
10X 0.30 17.30
20X 0.45 4.50
50X 0.80 1.00
100X 0.90 1.00 CFI LU Plan Epi ELWD* 20X 0.40 13.00
50X 0.55 10.10
100X 0.80 3.50 CFI L Plan Epi SLWD* 20X 0.35 24.00
50X 0.45 17.00
100X 0.70 6.50 CFI LU Plan Apo Epi* 150X 0.95 0.30 CFI L Plan Apo Epi WI* 150X 1.25 0.25 CFI LU Plan BD 5X 0.15 18.00
10X 0.30 15.00
20X 0.45 4.50
50X 0.80 1.00
100X 0.90 1.00 CFI LU Plan BD ELWD 20X 0.40 13.00
50X 0.55 9.80
100X 0.80 3.50 CFI LU Plan Apo BD 150X 0.90 0.42
* A nosepiece adapter is needed to use these objectives.
Photomicrographic System
CF Projection Lenses PLI 2X, 2.5X, 4X, 5X
V-T Photo Adapter
Illumination Systems
HMX-3 Lamphouse Adapter
Epi Collector Lens
Fiber Guide Adapter
FX-III Series
Mercury Lampsocket 100W
Xenon Lampsocket 75W
Metal Halide Starter
12V-100W Halogen Lamphouse
C-Mount/ENG-Mount TV
Zooming Adapter
Confocal Unit
(Under development)
Mercury Lamphouse HMX-3B
Xenon Lamphouse HMX-4
Liquid Fiber Guide
C-Mount/ENG-Mount
CCD Camera
TV Adapter TV Adapter
L2-TT Trinocular Tilting Eyepiece Tube
Double Port (Under development)
Stages
Auto Focus Module
Filter Sliders Pinhole Slider
8x8 Stage
Motorized Scanning Stage ISS200
ISS200 Remote Controller
L Stage for NWL860 Wafer Loader
Digital Still Camera/
C-Mount CCD Camera
YM-TI Trinocular Eyepiece Tube
8" Wafer
Holder
CFI LU/L Plan Epi Objectives
4-6-inch
Wafer Holder
LU Nosepiece Adapter
CFI UW 10X
CFI UW 10XM
CFI 10X
CFI 10XM
CFI 12.5X
CFI 15X
Adapter
Filar Micrometer
Motorized DIC Module
Breadth Shield
L200A Remote Controller
4-6-inch
Mask Holder
Eyepieces
10XA
CFI LU Plan BD Objectives
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En
WARNING
TO ENSURE CORRECT USAGE, READ THE CORRESPONDING MANUALS CAREFULLY BEFORE USING YOUR EQUIPMENT.
Specifications and equipment are subject to change without any notice or obligation on the part of the manufacturer. September 2002. DART software is developed by Nikon Inc.
NIKON CORPORATION
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Instruments Company
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Accredited by the Dutch Council for
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©2000-02 NIKON CORPORATION
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Specifications
Dimensional diagram
(When AF Module is mounted)
Printed in Japan (0209-03)T
Code No. 2CE-KWLH-1
This brochure is printed on recycled paper made from 40% used material.
Observation method Brightfield, darkfield, DIC, simple polarizing
Main body Episcopic stand, Power supply built-in
Focusing mechanism Stroke: 29mm, Coarse: 12.7mm per rotation
(torque adjustable, focusing stop mechanism provided), Fine: 0.1mm per rotation (in 1µm increments), Guide: 4-guide (two roller-race, torque adjustable)
Episcopic illuminator Motorized aperture diaphragm (centerable,
pinhole slider incorporated ) Fixed field diaphragm (with focus target), Four ø25mm filters (NCB11/ND4,16) can be mounted; Polarizer, Analyzer
Light sources 100W halogen, 150W metal halide, 100W mercury,
75W Xenon
Eyepiece tube UW tilting trinocular eyepiece tube (tilt angle: 0˚-
30˚; erect images), F.O.V.: 25mm, Optical path changeover: 2-way (Bino: Photo 100:0/0:100)
Nosepiece Fixed-motorized sextuple universal nosepiece
(centarable), Highly durable
Stage 8x8 Stage, Cross travel: 205 x 205 mm,
Coarse/fine-movement changeover: manual, Wafer holders: 4-8 in., Mask holders: 4-6 in.
Control Front panel: Nosepiece rotation buttons,
Episcopic aperture diaphragm stop buttons, Light intensity control knob Remote control: LCD panel, Magnification changeover, Motorized Z-axis, Episcopic aperture diaphragm stop buttons, Light intensity control knob, Motorized bright/darkfield changeover key, DIC adjustment knob, Option keys
Eyepieces CFI eyepiece lens series
Objectives CFI LU/L Plan series
Auto focus unit Optional (LED)
Automated function Recipe Programming
Communication RS-232C
Weight Approx. 45kg (when 8x8 Stage and UW eyepiece
tube are used.)
Unit: mm (inch)
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