New Dimensions in Parametric Analysis
Agilent 4155C Semiconductor
Parameter Analyzer
Agilent 4156C Precision Semiconductor
Parameter Analyzer
Agilent E5250A Low Leakage Switch Mainframe
Parametric Test Leader
Agilent Technologies has become
the world leader in parametric test
(judged by market share) by always
striving to lower your cost-of-test and
provide you with the right test at the
right cost. In the year 2000 Agilent
reached the milestone of installing its
2000th parametric test system. It has
also sold over 10,000 benchtop
parameter analyzers since creating
the first version of this product, the
4145A, back in 1982.
Continuous Innovation
The Agilent 4155C and 4156C
maintain this tradition of continuous
innovation in parametric measurement
and analysis. The new capabilities
of the 4155C and 4156C make them
more than just new “boxes”; they are
complete parametric measurement
solutions. The integrated matrix control
and quasi-static CV measurement
capabilities of the 4155C and 4156C
truly add new dimensions to your
parametric test capability. Most
importantly, the ability to start small
and then build your way up to a fast
and efficient automated parametric
measurement station provides you
with a solution without limits.
The Power of Information
Agilent’s Parametric Test Assistant CD
contains the answers to all of your
parametric measurement challenges.
This unique HTML-based tool contains
over 100 FAQs, as well as PDF versions
of all instrument manuals, data sheets,
and application notes (organized in a
searchable database). It also contains
a JavaScript-based Application
Navigator utility that can help you to
configure solutions based upon your
measurement needs. Moreover, the
entire CD works in both PC and
UNIX environments. Please specify
publication number 5980-0393E to
get your free copy.
Thinking Beyond the Box...
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Start with the Agilent 4155C and 4156C
The superior low-current and low-voltage
resolution and built-in quasi-static CV
measurement capability of the 4155C
and 4156C provide a firm foundation
for future expansion.
Perform Benchtop Analysis
The Agilent 4155C and 4156C combine
with the Agilent E5250A and Agilent
4284A to form an efficient and costeffective benchtop analysis system.
Integrated matrix control ensures that
you can perform CV-IV analysis quickly
and effortlessly without the need for a PC.
Alternatively, if you want instrument control in an MS Windows 98 or NT environment, you can use Agilent Interactive
Characterization Software (ICS).
High-speed Automated Test
The Agilent FLEX command language
gives you a powerful tool for automating
your testing in conjunction with a semiautomatic wafer prober. Automate with
commercial packages such as Metrics
I/CV, or with your own custom software
written in BASIC, C/C++, National
Instruments LabView, or Agilent VEE.
to a Solution Without Limits
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A Powerful and Expandable Solution
Preserve device power
between measurements
with the standby mode.
Execute separate stress
conditions with a single
keystroke.
Automate or create your
own measurements with
Instrument BASIC.
Output hardcopies
through GPIB or parallel
printer port. Also, send
print/plots via LAN port
to networked printers.
Sweep a family of curves with a
simple turn of the knob.
Organize test flow and minimize time
required to obtain semiconductor
parameters with the logical setup pages.
Save setups and measured
results to the MS-DOS
compatible floppy drive, or
to an NFS server via a
10 base-T LAN port.
Extend your capabilities to 1 A/200 V, and
add a low noise ground unit and dual pulse
generators with the Agilent 41501B SMU
and Pulse Generator Expander.
Ease measurement setups and
programming with the full size
detachable keyboard.
Easily analyze measured
results on the large LCD.
Automatically obtain derived
results like GMMAX with a
single button.
Quickly set up measurements
and extract parameters using
context-dependent menu and
sub-menu softkeys.
Ultra-Low Current Capability
The 1 fA resolution (0.01 fA readable
resolution) and 20 fA accuracy of the
Agilent 4156C enable you to meet the
low-current measurement challenges
posed by current and future devices.
Agilent continues to set the standard in
SMU technology and precision, without
sacrificing throughput, flexibility, or
resolution. Moreover, Agilent achieves
this measurement performance without
any cumbersome preamplification
schemes. This means you can use the
4156C to develop your most advanced
processes, including difficult measurements such as subthreshold leakage
and reverse-biased diode currents.
Measure Low Resistance Accurately
The advent of Cu metal processes has
made contact and sheet resistance
measurements increasingly difficult to
perform. With 0.2 µV resolution and
special voltage offset cancellation
capability, the 4155C and 4156C have
the measurement power to enable you
to characterize precisely your low
resistance Cu metal test structures.
Unsurpassed Resolution and Accuracy
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Repeatable Ultra-Low Subthreshold Characteristic
Cu Metal Resistance Structure
Single Sweep Measurement
Capacitance versus voltage (CV)
measurements provide essential
information about many critical
process parameters, such as oxide
thickness (tox), surface state charge
(Qss), and flat band voltage (Vfb).
However, high frequency CV measurements only measure oxide capacitance
in the accumulation mode. Low
frequency or quasi-static CV (QSCV)
techniques often yield better results
because the entire range of operation
of the oxide capacitor can be monitored in one continuous sweep.
Easy Quasi-static CV Setup
The 4155C and 4156C quasi-static
CV measurement function is integrated
into the front-panel control. No programming or additional equipment is
required. Simply pick your voltage
sweep range and the step voltage
interval at which you want to measure
capacitance. The internal firmware
routines take care of the rest.
Reliable Measurement Results
The superior accuracy and resolution
of the 4155C and 4156C guarantee
that your quasi-static CV measurement
results will be consistent and reliable.
You can use the auto-analysis function
of the 4155C and 4156C to calculate
immediately important process
parameters.
Built-in Quasi-static CV Analysis
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Quasi-static CV Measurement Procedure
Quasi-static CV Measurement Setup
Quasi-static CV Measurement Results
∆V
Measure ∆Q
Integration
Time
VAR1 Step
Delay Time
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