STMicoelectronics has recently introduced a new generation of high voltage DMOS
products housed in STAC
up to 1.2 kW for industrial, scientific, and medical applications such as 1.5 T and 3 T
magnetic resonance imaging (MRI). This new air-cavity technology now enables lower
thermal resistance, lower weight, and reduced cost compared to devices in ceramic
packages.
In this application note we report on the design of a 2 kW-100 V, 123 MHz Class AB peak
power amplifier (PPA) for 3 Tesla MRI applications. It almost doubles the output power of
previous amplifiers using MOSFET transistors in standard ceramic packages. The design
techniques and construction practices are described in enough detail to permit duplication
of the amplifier. The devices used in this amplifier are two STAC4932B N-channel
MOSFETs in a push-pull configuration capable of 1.2 kW each, under pulse conditions, and
housed in the STAC244B, a bolt-down air cavity package.
The design goals for the amplifier are:
■ Frequency: 123 MHz
■ Supply voltage: 100 V
■ Pulse conditions: 1 msec – 10%
■ Output power: > 2 kW
■ Gain: > 19 dB
■ Efficiency: > 60%
Figure 1.STEVAL-IMR002V1
®
air cavity packages and capable of delivering an output power of
The main objectives of the 2 kW power amplifier design are board compactness (100 x 150
mm), full SMT technology, and to avoid the use of ferromagnetic components and coaxial
transmission line transformers.
In summary, see circuit diagram in Figure 3, the power amplifier uses double push-pull boltdown devices, 2 x STAC4932B (see Figure 2) operate in Class AB. The two STACs are
driven in push-pull through the transformer T1 together with two in-phase power splitters:
this choice seems to be the best topology layout in terms of circuit size and mechanical
compactness. Moreover, as the temperature coefficient of MOSFET channel resistance is
positive, this makes a short-circuit possible in each pair of STAC4932B drains.
Figure 2.STAC244B bolt-down package
Figure 3.STEVAL-IMR002V1 circuit diagram
Doc ID 022523 Rev 13/17
Design choicesAN4016
Therefore, a compact design can be realized: only one RF output matching network, with
one impedance transformer T2, and an RF input matching network that supports the phase
and amplitude signals on each of the two gates STAC4932B (electrical symmetry).
The schematic incorporates the necessary input / output biasing networks for proper feed
biasing on the gates and drains.
Finally, planar microstrip technology was the main choice for the design of RF circuits: in
particular, the design of transformers T1 and T2 is fully embedded into the substrate (PCB)
itself as RF planar structures, and allows easy assembly of the design.
4/17Doc ID 022523 Rev 1
AN4016Circuit description
2 Circuit description
The Input RF network must be carefully designed respecting the correct electrical symmetry,
because it is affected by driving high level signals (Pin ~ 20 W), and is made up of:
1.Balun transformer T1, λ / 4-25 Ohm transmission line type @ 123 MHz, needed to
lower the 50 Ohm RF input impedance to 12.5 Ohm, and is realized in a stripline
technique on a 2-layer substrate (Roger 4350B, with a thickness of 20 +20 mils: see
Figure 5) and is fed by a suspended microstrip line ('line bridge' in Figure 3). Moreover,
T1, being a quasi one-dimensional RF structure, can be mapped on the PCB without
compromising the electrical symmetry. T1, finally, is loaded from R7 and R29 in order to
dampen reflected waves from the gates and for stability purposes.
2. Two in-phase power splitters (L4, L8, C16, C18, C20) and (L12, L16, C36, C41, C45)
simply decrease the impedance level (2 Ohm), and more importantly, allow the gates of
each STAC4932 to be kept isolated.
3. RF decoupling filters, fed through the VG1 and VG2 connectors (Figure 3) need to bias
each STAC4932B gate. They are essentially LC multi-section filters with capacitors of
several technologies (tantalum, ceramic) to improve effective broadband RF isolation.
Independent voltage dividers act on the 4 gates (R4, R32, R16, R33, R17, R34, R31, R35)
to assure broadband RF stability, while the lower value series resistors (R6, R8, R10, ...)
need to dampen mismatching reflections on the gate impedance and then mitigate any
asymmetries on the gate impedance value.
The output RF network acts on the DMOS drains, in order to achieve optimal impedance by
means of the RF transformer T2, and also to properly feed high DC current filtered at
Vd=100 V, through the output biasing network directly via the primary winding of T2.
The transformer T2 (ratio 4:1) is designed on the top/bottom layers (see Figure 7) using
substrate Roger 4350B of 60 mils thickness in suspended broadside coupled strips and acts
as a composite transmission line transformer in balanced to unbalanced mode. The RF
output (type N-female connector) is directly connected to the winding output strip of T2 (see
top view in Figure 7) through an air suspended microstrip-line (50 Ohm): in this way, the
current (differential) generated on the primary winding strip (on the top layer) between the
two STACs is moved from T2 versus unbalanced RF output by the ground of the plate
copper carrier (see Figure 8) without further wave discontinuity, therefore avoiding losses
and creating a reliable design to support very high RF output power.
The transformer T2 has been designed using commercially available SW (ADS, HFSS) and
continues the refinement between electromagnetic and circuit simulation: T2, in fact, uses a
lamped capacitor (C25, C26, C23 caps group on winding top strip, and C37, C42 caps
group on the bottom side strip) to tune the proper impedance for DMOS drains.
In particular, the output biasing network (acts through the center tap of the winding top strip
of T2) uses several multilayer ceramic capacitors, and also adds the following electrical
functions:
1.Dampens voltage overshoot generated by each transient effected by pulsed RF
modulation: that is the group L10, R13, C29, C30, C33.
2. Two test points can be inserted between two calibrated Rm resistors for current /
voltage monitoring.
3. Lamp LED D1, for safety purposes.
Doc ID 022523 Rev 15/17
Circuit descriptionAN4016
Finally, the two bipole groups, consisting of L3-C37-R1/R5 and L14-C58-R28/R30, are
inserted in the drain side of the amplifier and give more flexibility to the impedence, for
example, it is used to improve low frequency stability, or to dominate harmonic impedance,
or as broadband internal RF loads.
6/17Doc ID 022523 Rev 1
AN4016Layout, parts list, and design considerations
3 Layout, parts list, and design considerations
As mentioned previously (see Figure 3), the amplifier is built with separated input-output
PCB cards:
a) The input PCB, as shown in Figure 5, integrates the RF balun transformer, T1,
together with the RF decoupling networks.
b) The output PCB, see Figure 7, however, relates to the design of the RF
transformer, T2, with the remaining biasing/filtering networks for the gates and
drains of STAC4932B.
An image of the assembled board is shown in Figure 1, while Tabl e 1 gives the part list.
Figure 4, shows the final assembled board on the copper carrier and heatsink: board
robustness is an important factor in order to ensure electrical stability to manage very high
RF power.
The PCB cards are built in substrate Roger 4350B, in order to reduce dielectric losses
through the Joule effect (50 to 100 W less when compared to FR4 @ 2 kW), and in
particular to maintain thermal expansion compatibility with the copper carrier. Another
aspect of this rigid thermoset laminate allows the creation of a PCB with very good surface
finish, planarity and roughness, which are compatible with copper carrier surfaces that
support it. In fact, a carefully finished PCB surface is recommended: HAL LF with tinned
chemical deposition.
Moreover, accurate mounting procedures need to avoid bending/dirt that can compromise
the planarity of PCB cards.
Doc ID 022523 Rev 17/17
Layout, parts list, and design considerationsAN4016
AM10221V1
Figure 4.2 kW MRI final assembled board
Figure 5 and Figure 7 show the input and output PCB cards, top and bottom-side. A
mechanical drawing of the base-plate is shown in Figure 8: in particular, the two
counterbores housing the transformers T1 and T2, are designed to control the unwanted
parasitic impedance (leakage) to ground.
8/17Doc ID 022523 Rev 1
AN4016Layout, parts list, and design considerations
AM10222V1
Figure 5.Input PCB, and top and bottom view
The new package technology (STAC
®
) allows very low thermal impedance to be achieved,
Rtjc = 0.075 K / W (with T = 1 msec pulsed RF/Duty = 10%), so that, in combination with a
suitable heatsink (heatsink @ Rca <0.2 K / W max.), it permits the junction temperature to
be lower than the rating (Tjmax = 200 degC): in fact, considering a 60% efficiency @ 2200
W, a DeltaTjc = 56 ° C, and DeltaTca <15 ° C, a Tj=95 ° C max. junction temperature can be
expected.
The ability of STAC
®
to dissipate a high power pulse (see AN3232) allows the possibility to
reduce board dimension and external heatsinks; so that, using the flangeless package
STAC 244F (see Figure 6), you can design a new board with the same electrical
characteristics but with a dimension target of 80 x 100 mm.
Figure 6.STAC244B
Doc ID 022523 Rev 19/17
Layout, parts list, and design considerationsAN4016
Layout, parts list, and design considerationsAN4016
Table 2.Materials part list
ComponentDescription
Line bridge
Board input
Fin fixing
Board output
Mechanical
plate
Roger 4350B, three layers, 20+20 mils, 1 OZ Cu on top-mid-bottom layers, Finit. metal HAL LF;
total Tk=1.2 mm max., top screen printing component, tin chemical surface deposition.
Roger 4350B, three layers, 20+20 mils, 1 OZ Cu on top-mid-bottom layers, Finit. metal HAL LF;
total Tk=1.2 mm max., top screen printing comp., tin chemical surface deposition.
Roger 4350B, two layers, Tk=60 mils, 1 OZ Cu on top- bottom layers, Finit. metal HAL LF; total
Tk=1.6 mm max., top screen printing comp., tin chemical surface deposition.
Roger 4350B, two layers, Tk=60 mils, 1 OZ Cu on top-bottom layers, Finit. metal HAL LF; total
Tk=1.6 mm max., top screen printing comp., tin chemical surface deposition.
PPAMRI_002-Rev B
12/17Doc ID 022523 Rev 1
AN4016Layout, parts list, and design considerations
AM10224V2
Figure 8.Base-plate copper carrier
Doc ID 022523 Rev 113/17
MRI board performance and applicationAN4016
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105110115120125130135
IRL(dB
)
Gain(dB)
Freq(MHz
)
STAC4932B -
Gain & IRL Vs Freq @ Pin=43 dBm
PULSED WIDTH= 1msec, DUTYCYCLE =10%
Vds=100 VDC, Idq=2 x 100 mA
Gain
IRL
STAC244B
AM10225V1
4 MRI board performance and application
The power amplifier has been measured on two different RF scalar test benches: RF Power
Lab. in STM Catania (Italy) and RF Power Lab. in STM Quakertown (USA): the
measurements are in good agreement (+ / -0.15 dB max. error). The test includes a 2
kW/CW attenuator and a pulsed RF generator with high power amplifier driver to manage
large signals at RF input (20 W min.) with good harmonic rejection (-30 dBc).
Figure 9.Gain and IRL frequency response
Figure 9 shows the large signal gain frequency response of the amplifier, as well as the
input return loss, while Figure 10 shows the gain compression curve and the drain efficiency
curve Vs output power at 123 MHz (Idq = 200 mA and Vds = 100 V) and RF pulse width=1
msec, duty cycle=10%. The maximum efficiency is 60% @ 2.2 kW of output power.
14/17Doc ID 022523 Rev 1
AN4016Conclusion
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05001000150020002500
Drain Eff.(%)
Gain(dB)
Pout(W)
STAC4932B -
Gain & Eff. Vs Pout @ 123 MHz
PULSED WIDTH= 1msec, DUTYCYCLE =10%
Vds=100 VDC, Idq=2 x 100 mA
Gain
Eff.
AM10226V1
Figure 10. Gain and drain efficiency vs. output power
For IMS applications, two or more boards can be embedded to realize high power RF chains
(4 kW or more): e.g., 10 kW RF power can be obtained by linking six RF basic units,
properly using a Gysel power combiner, and integrated with the appropriate λ / 4
transmission lines to improve electrical stability, together with a control/monitoring card to
support global safety.
5 Conclusion
A pulsed RF high power amplifier (> 2 kW) has been described as a guideline-design,
oriented to new high voltage DMOS devices at Vd = 100 V: STAC4932B. In particular, the
amplifier combines excellent high frequency response with an efficient use of DC power and
allows a very compact design and robustness, in conjunction with SMT technology and
joined to the fully planar microstrip design (RF transformers). This amplifier can be
understood as the basic unit for high power RF chains to achieve very high power for an RF
pulse generator in the RF systems for medical magnetic resonance imaging (3T-fMRI).
6 References
●RF and Microwave Power Amplifier Design, by Andrei Grebennikov - Mc Graw Hill,
●Essentials of RF and Microwave Grounding, by Eric Holzman - Artech House, 2006
●AN3232 application note.
2005.
Doc ID 022523 Rev 115/17
Revision historyAN4016
7 Revision history
Table 3.Document revision history
DateRevisionChanges
23-Dec-20111Initial release.
16/17Doc ID 022523 Rev 1
AN4016
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