Nikon LV100D, LV150, LV150A User Manual

En

Specifications and equipment are subject to change without any notice or obligation
on the part of the manufacturer. April 2005.

©2000-05 NIKON CORPORATION

This brochure is printed on recycled paper made from 40% used material.

WARNING

TO ENSURE CORRECT USAGE, READ THE CORRESPONDING MANUALS
CAREFULLY BEFORE USING YOUR EQUIPMENT.

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Industrial Microscopes LV150/150A/100D

Industrial Microscopes

32

A modular microscopy system for breadth and depth

• Printer heads

• Micro sensors

• Optical switches

• GMR heads for HDD

• Medium/small PCB

• FPC

• Interposer substrates

• Bare wafers

• Lithography process

• Probe, test processes

• Post-dicing

• Macromolecules, monomeric materials

• Organic/inorganic materials

• Polymers • Thin film

• Magnetic materials

• Crystals • Metallugraphy

• Precision molds • LCD, color filters

• Polarizing filters

• Organic EL

• CCD • CMOS

• LCOS • DMD

• LF/TAB • WL-CSP

• QFP • SIP

• BGA, CSP, FC

VersatilityVersatility

Versatility

Extend your vision

Optical performance

Improved performance

Extend

your

vision

Extend

your

vision

Optical

performance

Optical

performance

Basic

Performance

Improved

performance

• OA equipment parts

• Cell phones, PDAs, DSC, PC parts

• Automobiles, aeronautics

MEMS

PCB

Casts and parts

Precision molds

FPD

Display devices

Semiconductors

Materials Packages

Versatility

5

Extensive range of industrial stages and
accessories

Users can select suitable models based on sample and stage
stroke. All stages are highly durable with triple-plate design.

Dia base unit for diascopic illumination

In the Eclipse LV series, the LV-DIA Dia Base is available for
diascopic illumination OEM use. Users can now take full
advantage of the modular design. A UN2 transformer is used
for the power supply.

The modular design of the Eclipse LV series
allows an unprecedented level of versatility. The
Eclipse LV series offers flexibility that enables it
to cover a wide variety of products and
applications, extending from development and
quality control to inspection in the manufacturing
process. Users will recognize the superb
performance of the Eclipse LV series when
inspecting semiconductors, FPD, packages,
electronics substrates, materials (material
science), medical devices, cast/metallic/ceramic
parts, precision molds, MEMS, telecommuni­cations devices, and a wide variety of other
samples.

Versatility

Accepts taller samples

The maximum sample height can be increased to 82mm from
47mm by inserting the LV-CR Column Riser 35 between the
main body and arm of the microscope. This feature is useful
for viewing the surfaces of precision molds, optical materials
and other thick samples.

Non-Nikon stages (LV150 or LV150A
only)

Use of non-Nikon stages, such as the Suruga Seiki B23-60CR,
in combination with the LV-SUB Substage 2 allows the
microscope to handle taller samples of up to 116.5 mm,
thereby enabling the observation of fiber ends and other
tools.

With column riserWithout column riser

Combination of LV-150 with LV-SUB Substage 2
and Suruga Seiki B23-60CR stage

82mm

47mm

Modular design

LV150 standard combination

Appropriate holder and substage are selected based on
sample and stage combination.

Compact industrial stage: LV-S32 3x2 Stage

The newly designed LV-S32 3x2 is a compact stage for
industrial microscopes. Its triple-plate design ensures

durability, stability and ease of
use, even when heavy samples
such as metallic materials are
observed. The standard glass
plate makes this stage suitable
for episcopic and diascopic
illumination.

An example of LV-DIA Dia Base built into a taped sample inspection system

LV-DIA Bia Base

LV-S6 6x6 Stage
Stroke: 150 x 150 mm

LV-S64 6x4 Stage
Stroke: 150 x 100 mm

L-S6WH Wafer Holder 6
(for LV-S6 6x6 Stage)

L-S6PL ESD Plate
(for LV-S6 6x6 Stage)

LV-S32PL ESD Plate
(for LV-S32 3x2 Stage)

LV-S32SGH Slideglass Holder
(for LV-S32 3x2 Stage)

LV-SUB Stage
(exclusive for LV150/LV150A)

LV-SUB Substage 2
(exclusive for LV150/LV150A)

LV-S32 3x2 Stage
Stroke: 75 x 50 mm

Tape-suction

section

Roll-out section Roll-in section

Tape-transport
section

Stage section

6

7

Optical PerformanceExtend your vision

A wide variety of observation methods is available with the Eclipse LV series. Observations with first-order
compensator, UV polarizing, and epi-fluorescence observations with UV excitation, in addition to brightfield,
darkfield, DIC, simple polarizing, epi-fluorescence (excitation using visible light) and double-beam
interferometry are all possible. Two new light sources also have been developed: high-intensity, low power­consumption 12V-50W halogen light source and adjustable high-intensity mercury-fiber light source.

Field Aperture Shutter UV-cut

diaphragm diaphragm filter

BF Any diameter Any diameter Open Insert

DF Open Open Open Insert

FL1 Any diameter Any diameter Open —

FL2 Any diameter Any diameter Open —

Universal epi-illuminator: LV-UEPI

The LV-UEPI universal epi-illuminator enables
brightfield, darkfield, simple polarizing and DIC
observations. Field and aperture diaphragms are
automatically opened when the observation is switched
from brightfield to darkfield, and return to their original
position when switched back to brightfield.

High-intensity 12V-50W halogen
light source:

LV-LH50PC Precentered
Lamphouse

Although the LV-LH50PC Precentered Lamphouse
is 12V-50W, the brightness is equivalent to or
higher than that of 12-100W types. The low power­consumption halogen light source contributes to
the compact design of the microscope while also
being friendly to the environment. Focus drift due
to heat from the illuminator is substantially
reduced.

Universal epi-illuminator 2: LV-UEPI2

The LV-UEPI2 universal episcopic illuminator is
equipped with advanced optics suited to a wide variety of
observation methods—brightfield, darkfield, DIC and epi­fluorescence—and automatically sets optimal
illumination in accordance with the field and aperture
diaphragm, shutter, and filters, including diffuser and
ND. This design enables the operator to concentrate on
the observation.

Auto optimal illumination
selection

• Brightfield

• Darkfield

• Simplepolarizing

• DIC

• Brightfield

• Darkfield

• Simplepolarizing

• Observationwithfirst-ordercompensator

• UVpolarizingepi-fluorescence

• DIC

• Epi-fluorescence(UVexcitationpossible)

CFI60 LU Plan Fluor EPI series

CFI60 LU Plan Fluor BD series

CFI60 L Plan EPI CR series of objective lenses
with correction ring

With correction at 0.7 mm (50x)

Without correction (50x)

Transmission wavelength coverage
extended to UV

CFI LU Plan Fluor series

The new CFI LU Plan Fluor series covers transmission
wavelength ranges up to UV. These objective lenses are suitable
for various research, analysis and examination needs, while
maintaining Nikon’s commitment to high NA and long working
distance. Only one kind of objective lens is needed for
brightfield, darkfield, simple polarizing, observation with first­order compensator, DIC and UV epi-fluorescence observations.
These objective lenses, which offer high resolution and easy-to­use performance, can be combined not only with microscopes
but also with other equipment for even greater versatility.

Objective lenses with correction ring

CFI L Plan EPI CR series

The CFI60 series now includes the CFI L Plan EPI CR series to
cope with the thinner coverglass used in liquid crystal displays,
and highly integrated, and dense devices. Coverglass correction
can be continuously made from 0 mm up to 1.2 mm (0-0.7 mm
and 0.6-1.3 mm for 100x) with the correction ring. The 100x
objective lens offers 0.85 high NA, while enabling high-contrast
imaging of cells and patterns without being affected by the
coverglass.

Environmentally friendly

The eco glass used in the CFI LU Plan Fluor and L Plan EPI CR
series does not contain harmful substances such as lead and
arsenic.

Model Magnification NA

Working Distance (mm)
CFI L Plan EPI 2.5X 0.075 8.8
CFI LU Plan Fluor EPI 5X 0.15 23.5

New

10X 0.30 17.3
20X 0.45 4.5
50X 0.80 1.0

100X 0.90 1.0

CFI LU Plan EPI ELWD 20X 0.40 13.0

50X 0.55 10.1

100X 0.80 3.5

CFI L Plan EPI SLWD 20X 0.35 24.0

50X 0.45 17.0

100X 0.70 6.5

CFI LU Plan Apo EPI 100X 0.95 0.4

150X 0.95 0.3

CFI L Plan Apo EPI WI 150X 1.25 0.25

Model Magnification NA

Working Distance (mm)

CFI LU Plan Fluor BD 5X 0.15 18.0

New

10X 0.30 15.0
20X 0.45 4.5
50X 0.80 1.0

100X 0.90 1.0

CFI LU Plan BD ELWD 20X 0.40 13.0

50X 0.55 9.8

100X 0.80 3.5

CFI LU Plan Apo BD 100X 0.90 0.51

150X 0.90 0.4

Model Magnification NA (mm) Working Distance (mm) Glass Thickness Correction Range
CFI L Plan EPI CR

New

20x 0.45 10.9-10.0 0-1.2mm

CFI L Plan EPI CR

New

50x 0.7 3.9-3.0 0-1.2mm

CFI L Plan EPI CRA

New

100x 0.85 1.2-0.85 0-0.7mm

CFI L Plan EPI CRB

New

100x 0.85 1.3-0.95 0.6-1.3mm

CFI60 Series Objectives