The Intersil HS-65647RH is a fully asynchronous 8K x 8
radiation hardened static RAM. This RAM is fabricated using
the Intersil 1.2 micron silicon-on-sapphire CMOS technology.
This technology gives exceptional hardness to all types of
radiation, including neutron fluence, total ionizing dose, high
intensity ionizing dose rates, and cosmic rays.
Functional Diagram
AI
ROW
I/O0
I/O7
E2
E1
G
W
E1E2GWMODE
X0XXLow Power Standby
11XXDisabled
0111Enabled
0101Read
01X0Write
ROW
DECODER
INPUT
DATA
CIRCUIT
CONTROL
CIRCUIT
128 X 512
MEMORY ARRAY
COLUMN I/O
COLUMN DECODER
TRUTH TABLE
AI COL
Low power operation is provided by a fully static design. Low
standby power can be achieved without pull-up resistors,
due to the gated input buffer design.
Ordering Information
PART NUMBERTEMPERATURE RANGEPACKAGE
HS1-65647RH-Q-55oC to +125oC28 Lead SBDIP
HS1-65647RH-8-55oC to +125oC28 Lead SBDIP
HS1-65647RH/Proto-55oC to +125oC28 Lead SBDIP
HS1-65647RH/Sample+25oC28 Lead SBDIP
HS9-65647RH-Q-55oC to +125oC28 Lead Ceramic Flatpack
HS9-65647RH-8-55oC to +125oC28 Lead Ceramic Flatpack
HS9-65647RH/Proto-55oC to +125oC28 Lead Ceramic Flatpack
HS9-65647RH/Sample+25oC28 Lead Ceramic Flatpack
HS9A-65647RH-Q-55oC to +125oC36 Lead Ceramic Flatpack
CAUTION: These devices are sensitive to electrostatic discharge; follow proper IC Handling Procedures.
http://www.intersil.com or 407-727-9207
CAUTION: Stresses above those listed in “Absolute Maximum Ratings” may cause permanent damage to the device. This is a stress only rating and operation
of the device at these or any other conditions above those indicated in the operational sections of this specification is not implied.
Operating Conditions
Operating Voltage Range (VDD) . . . . . . . . . . . . . . . +4.5V to +5.5V
Operating Temperature Range (TA) . . . . . . . . . . . . -55oC to +125oC
1. The parameters listed are controlled via design or process parameters and are not directly tested. These parameters are
characterized upon initial design release and upon design changes which would affect these characteristics.
2. Applies to DIP device types only.
3. Applies to Flatpack device types only.
4. All measurements referenced to device GND.
TWHQXVDD = 4.5V and 5.5V1-55oC ≤ TA≤ +125oC0 - ns
VDD = 4.5V and 5.5V1-55oC ≤ TA≤ +125oC0 - ns
TE2HQX
TGLQXVDD = 4.5V and 5.5V1-55oC ≤ TA≤ +125oC0 - ns
TE1HQZ
TE2LQZ
TGHQZVDD = 4.5V and 5.5V1-55oC ≤ TA≤ +125oC-15ns
TAXQXVDD = 4.5V and 5.5V1-55oC ≤ TA≤ +125oC0 - ns
VDD = 4.5V and 5.5V1-55oC ≤ TA≤ +125oC-15ns
UNITSMINMAX
TABLE 4. POST 300K RAD DC ELECTRICAL PERFORMANCE CHARACTERISTICS
Data Retention Supply CurrentIDDDRVDD = 2.0V, IO = 0mA, E = VDD+25oC-6mA
NOTES:
1. DC parameters not listed in this table are tested at the +25oC pre-irradiation test limits. All AC parameters are tested at the +25oC preirradiation test limits.
2. Typical IDDOP derating = 3mA/MHz (3mA increase in IDDOP per 1MHz increase in address frequency.)
IDDOPVDD = 5.5V, IO = 0mA, f = 2MHz,
E = 0V,VI = VDD or GND
+25oC-10mA
+25oC-82mA
+25oC-100mA
UNITSMINMAX
828
Spec Number 518729
HS-65647RH
TABLE 5. BURN-IN DELTA PARAMETERS (+25oC), GROUP B, SUBGROUP 5
PARAMETERSYMBOLDELTA LIMITS
Standby Supply CurrentIDDSB±150µA
High Impedance Output Leakage CurrentIOZH, IOZL± 2µA
2 Samples/Wafer, 0 Rejects
100% Nondestructive Bond Pull, Method 2023
Sample - Wire Bond Pull Monitor, Method 2011
Sample - Die Shear Monitor, Method 2019 or 2027
100% Internal Visual Inspection, Method 2010, Condition A
100% Temperature Cycle, Method 1010, Condition C,
10 Cycles
100% Constant Acceleration, Method 2001, Condition per
Method 5004
100% PIND, Method 2020, Condition A
100% External Visual
100% Serialization
100% Initial Electrical Test (T0)
100% Static Burn-In 1, Condition A or B, 72 Hours Min,
NOTES:
1. Failures from subgroup 1, 7 and deltas are used for calculating PDA. The maximum allowable PDA = 5% with no more than 3% of the
2. Radiographic (X-Ray) inspection may be performed at any point after serialization as allowed by Method 5004.
3. Alternate Group A testing may be performed as allowed by MIL-STD-883, Method 5005.
4. Group B and D inspections are optional and will not be performed unless required by the P.O. When required, the P.O. should include
5. Group D Generic Data, as defined by MIL-I-38535, is optional and will not be supplied unless required by the P.O. When required, the
6. Data Package Contents:
tity).
o
+125
C Min, Method 1015
failures from subgroup 7.
separate line items for Group B Test, Group Samples, Group D Test and Group D Samples.
P.O. should include a separate line item for Group D Generic Data. Generic data is not guaranteed to be available and is therefore not
available in all cases.
• Cover Sheet (Intersil Name and/or Logo, P.O. Number , Customer Part Number, Lot Date Code, Intersil Part Number, Lot Number, Quan-
• Wafer Lot Acceptance Report (Method 5007). Includes reproductions of SEM photos with percent of step coverage.
• GAMMA Radiation Report. Contains Cover page, disposition, Rad Dose, Lot Number , Test Package used, Specification Numbers, Test
equipment, etc. Radiation Read and Record data on file at Intersil.
• X-Ray report and film. Includes penetrometer measurements.
• Screening, Electrical, and Group A attributes (Screening attributes begin after package seal).
• Lot Serial Number Sheet (Good units serial number and lot number).
• Variables Data (All Delta operations). Data is identified by serial number. Data header includes lot number and date of test.
• Group B and D attributes and/or Generic data is included when required by the P.O.
• The Certificate of Conformance is a part of the shipping invoice and is not part of the Data Book. The Certificate of Conformance is signed
by an authorized Quality Representative.
2 Samples/Wafer, 0 Rejects
Periodic- Wire Bond Pull Monitor, Method 2011
Periodic- Die Shear Monitor, Method 2019 or 2027
100% Internal Visual Inspection, Method 2010, Condition B
100% Temperature Cycle, Method 1010, Condition C,
10 Cycles
100% Constant Acceleration, Method 2001, Condition per
Method 5004
100% External Visual
100% Initial Electrical Test
NOTES:
1. Failures from subgroup 1, 7 are used for calculating PDA. The maximum allowable PDA = 5%.
2. Alternate Group A testing may be performed as allowed by MIL-STD-883, Method 5005.
3. Group B, C and D inspections are optional and will not be performed unless required by the P.O. When required, the P.O. should include
separate line items for Group B Test, Group C Test, Group C Samples, Group D Test and Group D Samples.
4. Group C and/or Group D Generic Data, as defined by MIL-I-38535, is optional and will not be supplied unless required by the P.O. When
required, the P.O. should include a separate line item for Group C Generic Data and/or Group D Generic Data. Generic data is not guaranteed to be available and is therefore not available in all cases.
5. Data Package Contents:
• Cover Sheet (Intersil Name and/or Logo, P.O. Number , Customer Part Number, Lot Date Code, Intersil Part Number, Lot Number, Quan-
tity).
• GAMMA Radiation Report. Contains Cover page, disposition, Rad Dose, Lot Number , Test Package used, Specification Numbers, Test
equipment, etc. Radiation Read and Record data on file at Intersil.
• Screening, Electrical, and Group A attributes (Screening attributes begin after package seal).
• Group B, C and D attributes and/or Generic data is included when required by the P.O.
• The Certificate of Conformance is a part of the shipping invoice and is not part of the Data Book. The Certificate of Conformance is signed
by an authorized Quality Representative.
100% Dynamic Burn-In, Condition D, 160 Hours, +125oC or
Equivalent, Method 1015
100% Interim Electrical Test
100% PDA, Method 5004 (Note 1)
100% Final Electrical Test
100% Fine/Gross Leak, Method 1014
100% External Visual, Method 2009
Sample - Group A, Method 5005 (Note 2)
Sample - Group B, Method 5005 (Note 3)
Sample - Group C, Method 5005 (Notes 3 and 4)
Sample - Group D, Method 5005 (Notes 3 and 4)
100% Data Package Generation (Note 5)
831
Spec Number 518729
Timing Waveforms
HS-65647RH
TAVAX
E1
E2
A
Q
ADDRESS 1
TAVQV
TAXQX
DATA 1
ADDRESS 2
DATA 2
FIGURE 1. READ CYCLE I: W, E2 HIGH; G, E1 LOW
TAVAX
A
TAVQV
TE1LQV
TE1LQX
TE2HQV
TE2HQX
G
TGLQV
TGLQX
Q
TE1HQZ
TE2LQZ
TGHQZ
E1
E2
FIGURE 2. READ CYCLE II: W HIGH
TAVAX
A
TAVWLTWLWHTWHAX
W
TWHQX
TDVWH
D
TWLQZ
Q
TWHDX
FIGURE 3. WRITE CYCLE I: LATE WRITE
832
Spec Number 518729
HS-65647RH
Timing Waveforms
A
W
E1
E2
D
A
W
(Continued)
TAVAX
TAVE1L
TE1LE1H
TAVE2H
TDVE1H
TE1HDX
FIGURE 4. WRITE CYCLE II: EARLY WRITE - CONTROLLED BY E1
TAVAX
TAVE2H
TE2HE2L
TAVE2L
TE1HAX
TE2LAX
E1
E2
TDVE2LTE2LDX
D
FIGURE 5. WRITE CYCLE III: EARLY WRITE - CONTROLLED BY E2
HS-65647RH (8K x 8 TSOS4 SRAM) 28 LEAD CERAMIC DIP
VDD
NOTES:
1. VDD = 5.5V ± 0.5V
R = 10kΩ± 10%
2. Group E sample size is two die/wafer.
NC
NC
1
A12
2
A7
3
A6
4
A5
5
A4
6
A3
7
A2
8
A1
9
A0
10
DQ0
11
DQ1
12
DQ2
13
VSS
14
VDD
E2
A8
A9
A11
A10
E1
DQ7
DQ6
DQ5
DQ4
DQ3
28
W
27
26
25
24
23
G
22
21
20
19
18
17
16
15
Test Patterns
MARCH (II)PATTERN
After a background of zeros is written, each cell (from beginning to end in sequence) is read, written to a one and
reread. When the array is full of ones each cell (from the end
to the beginning) is read, restored to a zero and reread.
After this the pattern is repeated but with complemented
data.
MASEST PATTERN (Multiple Address Select Pattern)
A checkerboard pattern is written into the memory. Then the
first cell is read, then its binary address complement is read.
The second cell is read and then its binary address complement is read. This pattern of incrementing the address and
then reading its binary address complement is repeated until
the entire memory is read.
This is then repeated but using a checkerboard bar pattern.
GALROW PATTERN (Row Galloping Pattern)
After a background of zeros is written into the memory a one
is written into the first cell. It is then read alternately with
each other cell in the row. The test cell is then rewritten back
to a zero. The test cell is then incremented and the
sequence is repeated until all cells in the memory have been
used as a test cell.
This is pattern then repeated but using complemented data.
GALCOL PATTERN (Column Galloping Pattern)
After a background of zeros is written into the memory a one
is written into the first cell. It is then read alternately with
each other cell in the column. The test cell is then rewritten
back to a zero. The test cell is then incremented and the
sequence is repeated until all cells in the memory have been
used as a test cell.
This is pattern then repeated but using complemented data.
CHECKERBOARD PATTERN and CHECKERBOARD
BAR
A checkerboard is written (101010) into the memory and
then the pattern is read back. This is then repeated but using
complemented data.
836
Spec Number
518729
Metallization Topology
DIE DIMENSIONS:
313 x 291 x 21 ±1mils
METALLIZATION:
Type: Al/Si/Cu
Metal 1 Thickness: 7500
Å ± 2kÅ
Metal 2 Thickness: 10kÅ ± 2kÅ
Metallization Mask Layout
HS-65647RH
GLASSIVATION:
Type: SiO
Thickness: 8kÅ ± 1kÅ
WORST CASE CURRENT DENSITY:
1.5 x 10
HS-65647RH
2
5
Amps/cm
2
VSS
NC
(7) A3
(6) A4
(5) A5
(4) A6
(3) A7
(2) A12
(28) VDD
(27) W
(26) E2
(25) A8
(24) A9
(23) A11
(22) G
NC
VSS
VDD
NC
A2 (8)
A1 (9)
A0 (10)
VDD
VDD
DQ0 (11)
DQ1 (12)
DQ2 (13)
VSS (14)
DQ3 (15)
DQ4 (16)
D15 (17)
DQ6 (18)
DQ7 (19)
E (20)
NC
A10 (21)
Spec Number 518729
837
Packaging
HS-65647RH
e
PIN NO. 1
ID AREA
-A--B-
b
E1
0.004H A - BMD
Q
A
-C-
SEATING AND
BASE PLANE
SS
L
E3E3
c1
M
SECTION A-A
E
LEAD FINISH
BASE
METAL
b1
M
(b)
0.036H A - BMD
(c)
-D-
LE2
A
A
S1
SS
C
-H-
NOTES:
1. Index area: A notch or a pin one identification mark shall be located adjacent to pin one and shall be located within the shaded
area shown. The manufacturer’s identification shall not be used
as a pin one identification mark. Alternately, a tab (dimension k)
may be used to identify pin one.
2. If a pin one identification mark is used in addition to a tab, the limits of dimension k do not apply.
3. This dimension allows for off-center lid, meniscus, and glass
overrun.
4. Dimensions b1 and c1 apply to lead base metal only . Dimension
M applies to lead plating and finish thickness. The maximum limits of lead dimensions b and c or M shall be measured at the centroid of the finished lead surfaces, when solder dip or tin plate
lead finish is applied.
5. N is the maximum number of terminal positions.
6. Measure dimension S1 at all four corners.
7. For bottom-brazed lead packages, no organic or polymeric materials shall be molded to the bottom of the package to cover the
leads.
8. Dimension Q shall be measured at the point of exit (beyond the
meniscus) of the lead from the body. Dimension Q minimum
shall be reduced by 0.0015 inch (0.038mm) maximum when solder dip lead finish is applied.
9. Dimensioning and tolerancing per ANSI Y14.5M - 1982.
All Intersil semiconductor products are manufactured, assembled and tested under ISO9000 quality systems certification.
Intersil products are sold by description only. Intersil Corporation reserves the right to make changes in circuit design and/or specifications at any time without
notice. Accordingly, the reader is cautioned to verify that data sheets are current before placing orders. Information furnished by Intersil is believed to be accurate
and reliable. However, no responsibility is assumed by Intersil or its subsidiaries for its use; nor for any infringements of patents or other rights of third parties which
may result from its use. No license is granted by implication or otherwise under any patent or patent rights of Intersil or its subsidiaries.
For information regarding Intersil Corporation and its products, see web site http://www.intersil.com
Sales Office Headquarters
NORTH AMERICA
Intersil Corporation
P. O. Box 883, Mail Stop 53-204
Melbourne, FL 32902
TEL: (407) 724-7000
FAX: (407) 724-7240
EUROPE
Intersil SA
Mercure Center
100, Rue de la Fusee
1130 Brussels, Belgium
TEL: (32) 2.724.2111
FAX: (32) 2.724.22.05
839
ASIA
Intersil (Taiwan) Ltd.
Taiwan Limited
7F-6, No. 101 Fu Hsing North Road
Taipei, Taiwan
Republic of China
TEL: (886) 2 2716 9310
FAX: (886) 2 2715 3029
Spec Number
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