Ideal Regulator for Process Gas and Application
Gas Cabinet Valve Manifold Box
Process Gas
Acetylene* (C2H2)
Air
Ammonia (NH3)
Argon (Ar)
Arsine (AsH3)
Arsine Mixtures
(Nitrogen Balance)
Boron Trichloride (BCI3)
Boron Triflide (BF3)
Boron-11
Triflide Enriched (B11F3)
Butene-1 (C4H8)
Carbon Dioxide (CO2)
Carbon Monoxide (CO)
Chlorine (Cl2)
ChlorineTrifluoride
(ClF3)
* Use as a set, two stage pressure reduction
A: Vespel seat
H: Hastelloy trim
A: Vacuum pressure
Maximum
Flow
(slpm)
5 64-2800 74-2400 3 64-2600
50 64-3200 74-3800 6 64-2600-055
100 64-3200 50 64-5400 74-3000
30 64-2600 30 64-2600
100 64-2600-055 50 64-2600-055
200 74-3000 300 64-5400
5 64-2800 74-2400 5 64-2600
400 64-3200 74-3800 30 64-2600-055
1500 DH-124/15 series 100 64-5400 74-3000
100 64-2800 74-2400 10 64-2600
600
10 64-2800 74-2400 5 64-2600
40 64-3200 74-3800 20 64-2600-055
15 64-2800 74-2400 15 64-2600
74-3800 50 64-2600-055
50 64-3200 150 64-5400 74-3000
2 64-5000H 0.4 64-5000H 74-3000A
10 74-3000A 74-3000A 6 74-3000A 74-3000A
5 64-2800 74-2400 5 64-2600
25 64-3200 74-3800 10 64-2600-055
5 64-2800H 74-2400H 5 64-2600H
25 74-3800H 10 64-2600-055H
3 64-2800 74-2400 3 64-2600
50 74-3800 5 64-2600-055
3 64-2800V 74-2400V 8 64-2600
75 74-3800V 20 64-2600-055
150 64-3200V 23-3V 100 64-5400
500
10 64-2800 74-2400 5 64-2600
100 74-3800 20 64-2600-055
200 44-3200 100 64-5400 74-3000
3 64-2800H 74-2400H 10 64-2600H 74-2400H
50 74-3800H 50 64-2600H-055
200 64-3200H 100 64-5400H 74-3000
2 64-5000 1 64-5000
6 74-3000A 6 74-3000A
Gas Cabinet
Regulator
Supply System
449-254/44-3200*
449-254/44-3200V*
BSGS Gas
64-3200*
64-3200*
TESCOMTM Recommendations
for Semiconductor Gases
Threadless
Series
Maximum
Flow
(slpm)
100 64-5400-100
600 64-5400-100
1500 DH-16
250 64-5400-100
100 64-2600-055
250 64-5400
25 64-5400 74-3000
25 64-5400H
160 64-5400-100
800 DH-16
150 64-5400H-100
VMB
Regulator
Threadless
Series
Visit our website at Emerson.com
1
TESCOMTM Recommendations
for Semiconductor Gases
Process Gas
Diborane (B2H6)
Dichlorosilane (SiH2Cl2)
Diethyltelluride (Te(C2H5)2)
Dimethylsilane (C2SiH8)
Disilane (Si2H6)
Ethylene (C2H4)
Fluorine (F2)
Fluorine Mixtures
(10%, 500 psig)
(Nitrogen Balance)
Germane (GeH4)
Germane Mixtures
(Nitrogen Balance)
Halocarbon-12
Dichlorodiflomethane
(CCl2F2)
Halocarbon 12B2 (CBr F)
Halocarbon-13
Chlorotriflomethane (CClF3)
Halocarbon 13B1 (CBrF3)
Halocarbon-14
Tetraflomethane (CF4)
Halocarbon 21 (CHCl2F)
Halocarbon-23 Fluoroform
(CHF3)
Halocarbon 32 (CH2F2)
* Use as a set, two stage pressure reduction
A: Vespel seat
H: Hastelloy trim
A: Vacuum pressure
Maximum
Flow
(slpm)
25 64-3400 10 64-2600
2 64-5000H 1 64-5000
7 74-3000A 7 74-3000A 74-3000A
5 64-2800 74-2400 3 64-2600
25 64-3200 74-3800 25 64-5400 74-3000
3 64-2800 74-2400 3 64-2600
50 74-3800 50 64-5400 74-3000
75 64-3200 75 64-5400-100
1 64-2800 74-2400 1 64-2600
7 74-3800 7 74-3000
3 64-2800 74-2400 3 64-2600
50 74-3800 20 64-2600-055
75 64-3200 50 64-5400 74-3000
1 64-2800 74-2400 1 64-2600
7 74-3800 7 74-3000
10 64-2800 74-2400 10 64-2600
50 74-3800 20 64-2600-055
3 64-2800 74-2400 3 64-2600
50 64-3200 74-3800 5 64-2600-055
5 74-3800 1 64-2600
3 64-2800 74-2400 3 64-2600
50 64-3200 74-3800 5 64-2600-055
3 64-2800 74-2400 3 64-2600
50 64-3200 74-3800 5 64-2600-055
50 64-2800 74-2400 5 64-2600
200 64-3200 74-3800 30 64-2600-055
500
1000 DH-16
1 64-5000 1 64-5000
5 74-3000A 5 74-3000A
10 64-2800 74-2400 10 64-2600
50 64-3200 74-3800 20 64-2600-055
100 64-3200 50 64-5400
3 64-2800 74-2400 3 64-2600
50 64-3200 74-3800 6 64-2600-055
75 64-3200 50 64-5400
Gas Cabinet
Regulator
Ideal Regulator for Process Gas and Application
Gas Cabinet Valve Manifold Box
BSGS Gas
Supply System
Consult factory
449-254/44-3200*
64-3200*
Threadless
Series
Maximum
Flow
(slpm)
20 64-2600-055 74-3000
5 64-2600-055
75 64-5400-100
50 64-5400 74-3000
50 64-5400 74-3000
5 64-5400 74-3000
50 64-5400 74-3000
50 64-5400 74-3000
100 64-5400 74-3000
250 64-5400-100
75 64-5400-100
VMB
Regulator
Threadless
Series
2
Visit our website at Emerson.com
Ideal Regulator for Process Gas and Application
Gas Cabinet Valve Manifold Box
Process Gas
Halocarbon 114 (C2ClF4)
Halocarbon-115
Chloropentafloethane
(C2ClF5)
Halocarbon-116
Hexafloethane (C2F6)
Halocarbon 125 (C2HF5)
Halocarbon 134A (C2H2F4)
Halocarbon R218 (C3F8)
Halocarbon C318 (C4F8)
Helium (He)
Hydrogen (H2)
Hydrogen Bromide (HBr)
Hydrogen Chloride (HCl)
Hydrogen Chloride Mixtures
(Nitrogen Balance)
Hydrogen Fluoride (HF) Consult factory
Hydrogen Selenide (H2Se)
* Use as a set, two stage pressure reduction
A: Vespel seat
H: Hastelloy trim
A: Vacuum pressure
Maximum
Flow
(slpm)
7 74-3000A 1 64-5000
3 64-2800 74-2400 3 64-2600
50 64-3200 74-3800 5 64-2600-055
75 64-3200 50 64-5400
3 64-2800 74-2400 3 64-2600
50 64-3200 74-3800 10 64-2600-055
125 64-3200 50 64-5400
3 64-2800 74-2400 3 64-2600
25 64-3200 74-3800 5 64-2600-055
75 64-3200 25 64-5400
3 64-2800 74-2400 3 64-2600
50 64-3200 74-3800 5 64-2600-055
75 64-3200 50 64-5400
3 64-2800 74-2400 3 64-2600
50 64-3200 74-3800 5 64-2600-055
75 64-3200 50 64-5400
6 64-3200 74-3800 1 64-2600
125 64-2800 74-2400 65 64-2600
300 64-3400 125 64-2600-055
2000
125 64-2800 74-2400 65 64-2600
300 64-3400 125 64-2600-055
2000
10 64-2800H 74-2400H 1 64-2600H
30 74-3800H 74-3800H 10 64-2600-055H 74-3000H
50 64-3200H 74-3800H 50 64-5400H 74-3000H
2 64-2800H 74-2400H 8 64-2600H
90 74-3800H 74-3800H 20 64-2600-055H 74-3000H
500
600
10 64-2800H 74-2400H 10 64-2600H
40 74-3800H 20 64-2600-055H
5 64-2800 74-2400 5 64-2600
40 74-3800 20 64-2600-055
Gas Cabinet
Regulator
BSGS Gas
Supply System
449-254/44-3200*
64-3200*
449-254/44-3200*
64-3200*
449-254/44-3200*
64-3200*
449-254/44-3200*
64-3200*
TESCOMTM Recommendations
for Semiconductor Gases
Threadless
Series
74-3800H 100 64-5400H 74-3000H
74-3800H 150 64-5400H-100
Maximum
Flow
(slpm)
7 74-3000A
75 64-5400-100
90 64-5400-100
450 DH-16
75 64-5400-100
75 64-5400-100
75 64-5400-100
6 64-5400 74-3000
500 64-5400 74-3000
900 64-5400-100
2500 DH-16
500 64-5400 74-3000
900 64-5400-100
3000 DH-16
40 64-5400H 74-3000H
40 64-5400 74-3000
VMB
Regulator
Threadless
Series
Visit our website at Emerson.com
3
TESCOMTM Recommendations
for Semiconductor Gases
Process Gas
Hydrogen Selenide Mixtures
(Nitrogen Balance)
Hydrogen Sulfi (H2S)
Krypton (Kr)
Methane (CH4)
Methanol (CH3OH)
Methyl Chloride CH3Cl
Methyl Fluoride (CH3F)
Neon (Ne)
Nitrogen (N2)
Nitrogen Triflide (NF3)
Nitric Oxide (NO)
Nitrous Oxide (N2O)
Octafluorocyclopentene
(C5F8)
Oxygen (O2)
* Use as a set, two stage pressure reduction
A: Vespel seat
H: Hastelloy trim
A: Vacuum pressure
Maximum
Flow
(slpm)
10 64-2800 74-2400 10 64-2600
40 74-3800 20 64-2600-055
5 64-2800 74-2400 5 64-2600
40 74-3800 74-3800 10 64-2600-055
20 64-2800 74-2400 20 64-2600
60 74-3800 30 64-2600-055 74-3000
10 64-2800 74-2400 10 64-2600
100 74-3800 74-3800 50 64-2600-055 74-3000
3 64-2800 3 64-2600
50 74-3800 74-3800 50 64-2600-055
1 64-2800 10 64-2600
10 74-3800 74-3000
5 64-2800 5 64-2600
50 64-3200 74-3800 25 64-2600-055
100 64-5400 74-3000
20 64-2800 20 64-2600
100 64-3200 74-3800 40 64-2600-055
300
100 64-2600 25 64-2600
350 74-3000 50 64-2600-055
5 64-2800 74-2400 6 64-2600
150 74-3800 74-3800 30 64-2600-055 74-3000
400
3 64-2800 74-2400 3 64-2600
150 74-3800 74-3800 50 64-2600-055
200 64-3200 150 64-5400 74-3000
3 64-2800V 74-2400V 8 64-2600
60 74-3800V 74-3800V 20 64-2600-055 74-3000
150 64-3200V 100 64-5400
500
5 64-5000A 74-3000A 0.3 64-5000A
80 64-2800 74-2400 10 64-2600
1000
Gas Cabinet
Regulator
Ideal Regulator for Process Gas and Application
Gas Cabinet Valve Manifold Box
BSGS Gas
Supply System
449-254/44-3200*
64-3200*
449-254/44-3200*
64-3200*
449-254/44-3200V*
64-3200V*
449-254/44-3200*
64-3200*
Threadless
Series
Maximum
Flow
(slpm)
50 64-5400 74-3000
50 64-5400 74-3000
100 CN: 64-5400
100 64-5400
100 64-5400 74-3000
500 64-5400
800 64-5400-100
2000 DH-16
150 64-5400 74-3000
200 64-5400-100
150 64-5400-100
800 DH-16/15 series
5 74-3000A
25 64-2600-055
100 64-5400 74-3000
150 64-5400-100
1000 DH-16
VMB
Regulator
Threadless
Series
4
Visit our website at Emerson.com
Ideal Regulator for Process Gas and Application
Gas Cabinet Valve Manifold Box
Process Gas
Perflopropane (C3F8)
Perfluorobutadiene (C4F6)
Phosphine (PH3)
Phosphine Mixtures
(Nitrogen Balance)
Phosphorus Pentaflide (PF5)
Propane (C3H8)
Silane (SiH4)
Silane Mixtures
(Nitrogen Balance)
Silicon Tetrachloride (SiCl4)
Silicon Tetraflide (SiF4)
Sulfur Dioxide (SO2)
Sulfur Hexaflide (SF6)
Sulfur Tetraflide (SF4)
Trichlorosilane (SiHCl3)
Trimethylsilane ((CH3)3SiH)
Tungsten Hexaflide (WF6)
Xenon (Xe)
* Use as a set, two stage pressure reduction
A: Vespel seat
H: Hastelloy trim
A: Vacuum pressure
Maximum
Flow
(slpm)
2 64-2800 74-2400 2 64-2600
20 74-3800 10 64-2600-055
5 74-3000A 0.5 64-5000
5 64-2800 74-2400 5 64-2600
40 64-3200 74-3800 10 64-2600-055
10 64-2800 74-2400 10 64-2600
40 44-3200 74-3800 20 64-2600-055
10 64-2800 74-2400 10 64-2600
50 64-3200 74-3800 20 64-2600-055
3 64-2800 74-2400 3 64-2600
50 74-3800 5 64-2600-055
100 64-3200 50 64-5400 74-3000
5 64-2800 74-2400 10 64-2600
40 74-3800 25 64-2600-055
100 64-3200 100 64-5400 74-3000
500
10 64-2800 74-2400 10 64-2600
40 74-3800 20 64-2600-055
0.5 64-5000A 74-3000A 0.5 64-5000A
5 74-3000A 74-3000A 5 74-3000A
10 64-2800H 74-2400H 10 64-2600H
40 74-3800H 74-3800H 20 64-2600-055H
100 64-5400H
5 64-2800H 74-2400H 5 64-2600H
20 74-3800H 74-3800H 20 64-2600-055H
3 64-2800 74-2400 5 64-2600
40 74-3800 74-3800 12 64-2600-055
150 64-3200 50 64-5400
400 DH-124/15 Series 90 64-5400-100
3 64-2800H 74-2400H 3 64-2600H
15 74-3800H 74-3800H 5 64-2600-055H
3 64-5000 0.5 64-5000
10 74-3000A 10 74-3000A
2 64-5000A 0.5 64-5000
7 74-3000A 7 74-3000A
0.5 64-5000H 0.5 64-5000H
5 74-3000AH 74-3000AH 5 74-3000AH
5 64-2800 74-2400 5 64-2600
25 74-3800 74-3800 10 64-2600-055
Gas Cabinet
Regulator
449-254/44-3200*
BSGS Gas
Supply System
64-3200*
TESCOMTM Recommendations
for Semiconductor Gases
Threadless
Series
Maximum
Flow
(slpm)
40 64-5400
5 74-3000A
150 64-5400-100
1000 DH-16
100 64-5400 74-3000
30 64-5400H 74-3000H
50 64-5400
VMB
Regulator
Threadless
Series
Visit our website at Emerson.com
5
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