is a registered trademark of Varian Associates, Inc.
®
is a registered trademark of Microsoft Corporation
®
®
®
is a registered trademark of Microdot Inc.
is a trademark owned by Crawford Fitting Company
is a registered trademark of Microsoft Corporation
.
MENU
STATUS
SECTION 0.XX
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Warranty
The model 880 Deposition Controller is guaranteed against faulty materials, function, and workmanship for
a period of 12 months after delivery from Telemark. Components which are purchased by Telemark from
other manufactures will be guaranteed for any lesser time that such manufacturer warrants its product to
Telemark. This warranty is valid only for normal use where regular maintenance is performed as instructed.
This warranty shall not apply if repair has been performed or an alteration made by anyone other than an
authorized Telemark representative or if a malfunction occurs through abuse, misuse, negligence, or
accident. No charge will be made for repairs made under warranty at Telemark's facilities. Freight costs
both ways will be at customer's expense. Telemark reserves the right for final warranty adjustment.
.
User Responsibility
The user is responsible for proper operation an ordinary maintenance of the equipment, following
procedures described in this manual, including reference documents. Proper operation includes timely
replacement of parts that are missing, broken, or plainly worn. If the user has a reasonable doubt about
understanding the use or installation of a component, Telemark Technical Service should be called.
It is vitally important that the user properly install the equipment as described in the Installation sections of
this manual. The warranty will be void if the equipment is improperly installed.
Alteration of the design or any function of the equipment voids the warranty and is entirely the
responsibility of the user.
Safety Warning
General Precautions: Human contact with the voltages present within and around a vacuum system can be
fatal. Make sure that the input power is turned off before opening the doors or removing panels. Short all
HV feedthrough connections with a grounding hook before accessing the controller main body.
Disclosure
The disclosure of this information is to assist owners of Telemark equipment to properly operate and
maintain their equipment, and does not constitute the release of rights hereof. Reproduction of this
information and equipment described herein is prohibited without prior written consent from Telemark.
SECTION 0.XX
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SECTION 1.0
.specifications/included materials
(no intro here) unpacking.
Introduction
Unpacking
The Model 880
interfaces and analog outputs (see the following spare parts included list). If the essential OSC-100A
oscillator or crystals were ordered at the same time, they will also be included. The unit operates from 90
to 264 VAC with no adjustments required. If it is ever necessary to return the unit to Telemark, for any
reason, call and obtain a Return Material Authorization number (RMA#).
comes with a power cord and connectors for the RS-232 interface, the I/O
Description
The Model 880 provides both automatic control of single or multi-layer film deposition in either a
production or development environment and improved predictability and repeatability of deposited film
characteristics through dependable digital control of the deposition process. It runs unattended in the fully
automatic mode and provides a wide number of benefits including performance limit access and setting by
the end user.
SECTION 1.1
.[please read and understand this manual before proceeding w/ equipment useage].
Please read and understand the contents of this manual before proceeding with equipment useage in a
working system. This manual will take the reader through the appropriate setup and example steps,
providing along the way, an understanding of how the Model 880 instrument is used. A test mode is
available from the SERVICE menu for simulated out of system experiments. Crystal sensor head
information is simulated (actually rate info is simulated for the film) allowing setup of various
parameters/programming elements without crystal failure halting the simulated process. The power supply
control voltage output is, however, active while in the test mode. All these terms will be described shortly.
This manual is organized into a number of main sections: specifications, generalized overview,
menu programming specifics and setup, hardware setup, detailed host communications, microbalance
theory and maintenance. If any further assistance is needed, please contact Telemark (see section 1.6).
The specifications section describes Model 880 product specifics, both hardware and software,
along with related necessary and optional product specifics. The software specifics include programmable
parameter lists. The generalized overview section answers the what, the how is it used and the how does it work questions about the Model 880, that is, the solutions this product can provide. This section is intended
to discuss the concepts of main functions and elements with only enough detail to make the
conceptualization clear. In addition, rudimentary specifics are given in a number of other areas as an
introduction or a primer for the next section. This is information you typically only need to look at once.
Experienced users (those familiar with deposition controllers) should at least thumb through this section to
take an inventory of what is available. The menu programming specifics and operational details section
provides detailed information about product programming. Experienced users (those familiar with
deposition controllers) may decide to start here. If some elements are unclear, check back to the previous
section. The table of contents and index are helpful in this pursuit. This section provides descriptions for the
programming of film parameters and process steps, descriptions of menu navigation, descriptions of
screens, descriptions of fixed front panel keys, descriptions of run modes, parameter details, memory
defaults, programming summaries, etc. The hardware setup section describes and illustrates connectors,
interconnections, peripherals, mechanical connections, and the Model 880 as a component in a larger
system. Detailed host communications are found in the following section x6. See section x7 for
MANUAL DESCRIPTION
SECTION 1.XX
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Model 880 DEPOSITION CONTROLLER
Microbalance theory and thickness reading calibration with its attendant density, z factor (a material
reference table of elements is included) and tooling determination. Each section builds on the previous
sections such that no new elements are used that haven't been defined.
.Some sage advice that is
seldom heeded.
.
If all else fails
read the manual.
You can lead a customer to water
ut you can't make them read the
manual.
y
SECTION 1.2 DESCRIPTION OF SYMBOLS
Please familiarize yourself with the following warning/safety/caution symbols found within this manual
and their general meaning:
Note
Caution
Static
Sensitive
.note the following warning/safety/caution symbols [desc. of each].
Note: Highlights an important fact or condition.
Caution: Warns of a condition that could cause damage to deposition controller, connected or
associated equipment. Also warns if some action taken could result with an undesireable and/or
unexpected outcome.
or
: Warns of a condition that will likely cause damage to the deposition controller, connected or
!
associated equipment. Also warns of a possible unsafe situation for the user. Examples are static
sensitivities, maximum component ratings, broken fuses, etc.
or
Hazardous
Voltages
Present
SECTION 1.XX
: Warns of a condition that is hazardous to user, deposition controller, connected or associated
equipment.
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SECTION 1.3
TABLE OF CONTENTS
TITLE PAGE................................................................................................................................................ 1
Select RunTime Mode: Sequencing/Non-Sequencing, Manual Mode, Test Mode............................................ 36
Memory Storage of Menu Parameters ............................................................................................................... 36
Films & Processes / Active, Non-Active ........................................................................................................... 36
Menu Parameter Dependencies.......................................................................................................................... 36
Tooling: Material Density & Z-Factor............................................................................................................... 37
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Model 880 DEPOSITION CONTROLLER
Power Related Menu Parameters....................................................................................................................... 37
Power Related Menu Parameter Dependencies ................................................................................................. 38
Navigating Through Model 880 Menus................................................................................................ 56
Menu Tree............................................................................................................................................. 57
Film Edit/Review Mode ........................................................................................................................ 63
Film Parameter Checksum................................................................................................................................. 67
Film Parameter Lock Code................................................................................................................................ 67
Film Parameter: Source Sensor Map Select....................................................................................................... 68
Review SS MAP................................................................................................................................................ 68
Selecting the Active Film in Non-Sequencing Mode......................................................................................... 69
Detailed Film Parameter Descriptions ................................................................................................ 71
Process Lock Code ............................................................................................................................................ 93
Factory Restoration vs. Purged Settings ............................................................................................................ 93
Manual Power Control......................................................................................................................... 97
Using Pendent.................................................................................................................................................... 97
Using LCD keys ................................................................................................................................................ 98
Memory Module Data Transfer ....................................................................................................................... 120
Entering The TEST Mode................................................................................................................................ 122
Line Power ......................................................................................................................................... 138
Material Reference Table:.................................................................................................................. 264
Aluminum Through Indium............................................................................................................................. 264
Indium Intimonide Through Terium................................................................................................................ 265
Thallium Through Zirconium Oxide................................................................................................................ 266
Start (Key) Process Flowchart ............................................................................................................. 55
Menu Tree............................................................................................................................................. 57
Model 880 Thin-Film Thickness and Rate Controller Specifications
High Resolution ±0.02Hz(5-6MHz), 0.0088 Angstroms/Measurement (for Aluminum)
High Accuracy ±0.5% thickness + 1 count
High Speed Ten measurements/second
Measurement Range 500KA Aluminum Equivalent
Standard Sensor Crystal 6 MHz AT cut, Plano/Convex
Sensor Capacity 2 per sensor PCB card [4 PCB cards max.]
Displays 240 x 64 pixel monochrome LCD with Backlight
12 digit LED display (7 segments each digit)
4 discrete indicator LEDs
Operation Menu driven "Windowing Type"
LCD Touch Panel (12 x 4 key matrix)
with 6 fixed function membrane keys
and 4 user programmable fixed membrane keys
Film Storage (Standard) 1 Active Film Program
98 Alternate Film Programs (with 30 Sensor maps)
9 Sequence recipes, 99 steps per recipe, system total is 250 steps
External Storage (Optional) Film Parameters for films 1-99 and System Parameters I/O programs,
and Process Accounting Can be stored in Transportable Data Module
(Optional)
Hardware I/O (Standard) per card: 8 SPDT Relays, 1.0 Amp @ 24 VDC Maximum
per card: 8 Optocoupled Inputs (Electrically Isolated), 5-24VDC [4
slots for input and/or output cards]
Computer Interface RS-232C (Sycon Format or ASCII)
Protocols
Communication Options DeviceNet, PROFIBUS, CANopen, others
Analog Outputs: 12 bit resolution (2 per sensor card, each for use as control or recorder)
As Control Outputs 2.5, 5, 10 volt @10ma. isolated output with range
menu programmable (maximum 2 control outputs per sensor card)
As Recorder Outputs 0 to 10 volt @ 10ma, isolated, function programmable
Final Thickness Limit (Trigger) 0.000 to 999.999 KÅ (non-sequencing only)
Setpoint Time Limit0:00 to 99:59 MM:SS
Soak 1 Power level Value 0.0 to 100.0%
Power Ramp 1 Time (to pwr level) 0 to 99:59 MM:SS
Power Soak 1 Time (@ pwr level) 0 to 99:59 MM:SS
Soak 2 Power level Value 0.0 to 100.0%
Power Ramp 2 Time (to pwr level) 0 to 99:59 MM:SS
Power Soak 2 Time (@ pwr level) 0 to 99:59 MM:SS
Soak 3 Power level Value 0.0 to 100.0%
Power Ramp 3 Time (to pwr level) 0 to 99:59 MM:SS
Deposit Rate (requested)0.0 to 999.9 A/S
Rate Ramp Mode OFF / ON
New Deposit Rate (Value)0.0 to 999.9 A/S
Rate Ramp Time (Duration)0:00 to 99:59 MM:SS
Rate Ramp (Thickn) Trigger Point 0 to 999.999 KÅ
Control Loop –Proportional term- 1 to 9999
Control Loop –Integral term- 0.0 to 99.9 sec
Control Loop –Derivative term- 0.0 to 99.9 sec
Max Power Limit 0.0 to 100.0%
Abort Max Power SWitchOFF/ON
Max Power Dwell 0:01-99:59 MM:SS
Shutter Delay Mode OFF, ON
Shutter Delay TIMEOUT 0:01-99:59 MM:SS
Shutter Delay QUALITY 1-50%
(XTAL) RATE SAMPLING OFF,TIMED,INTELL.
(XTAL) SAMPLE INTERVAL 0:01-99:59 MM:SS
(XTAL) SAMPLE DWELL TIME 0:01-99:59 MM:SS
(XTAL) SAMPLE QUAL 1-50%
(XTAL) SAMPLE ALARM TIME 0:01-99:59 MM:SS
FILM Fail Mode ABORT IF FAIL, TIME POWER
Control Loop Qual Limits0 to 9
XTAL Stability S (Limits)0 to 9
XTAL Life Bounds 0.0-100.0%
Plot Vert Scale Volts1, 5, 10, 50, 100
Plot Horiz Scale H 1 to 600 samples
Data Plot Type Rate /Rate Deviation /Power
Programmable Parameter Lists
⇒ Abbreviated Menu Name
[Menu end point: Review Film Menu path: Main/Review Film]
[Menu end point: Review SS Map Menu path: Main/Review SS Map]
Source Sensor Full Power Volts 2.5, 5, 10 full scale volts
Source Sensor Max Power Value 0.0% - 100.0%
Source Sensor Analog Output Chnl 1 – 8 Channel Selection
Master Tooling Value10.0% - 400.0%
Minimum Start Xtal Channels 1 – 8 minimum channels
Minimum Backup Xtal Channels 0 – 7 minimum channels
Minumum Active Xtal Channels 1 – 8 minimum channels
(Xtal) Channel Drop Filter NONE, BALANCE
[Mask dropped Xtal channel Failure]
averaging mode only
Indexer Synchronization Mode NONE, DELAY, FEEDBACK
Indexer Synchronization Time 2 – 999 seconds
Channel 1 Start Mode OFF, ACTIVE, STANDBY
Channel 1 Fail Action (Mode) NONE, ABORT FILM
Channel 1 Backup List X – XXXXXXXX (1 item list to 8 item list), [where X = 1 to 8 (in
each position w/o redundancies, list extends to 0-8 for a 1 item list)]
Channel 1 Tooling Value 10.0% - 400.0%
Channel 1 Weight 10.0% - 400.0%
Channel 2 Start Mode OFF, ACTIVE, STANDBY
Channel 2 Fail Action (Mode) NONE, ABORT FILM
Channel 2 Backup List X – XXXXXXXX,
[X = 1 to 8 (in each position w/o redundancies)] see CH1
LESs than, and SELect. Editing: backspace, left/right arrows (to move
cursor), delete, undo, insert/delete line.
(Front Panel LEDs [4 discrete]) I/O programming elements (see table x in section 5xx and Section 2.2)
(User Front Panel Keys [4]) I/O programming elements (see table x in section 5xx and Section 2.2)
Pendent Keys (beyond specified Manual Mode use: I/O programming elements
[see table xxx in section 5xx ])
Service Menu values:
[Menu end point: Service Menu path: Main/Service]
(Test Mode Select) Test Off, Test On [Test Mode won't remain in effect if power is cycled)
(Seq/Non-seq Mode Select) Seq(uencing Mode Select en)able, Non-seq(uencing Select enabled)
(Memory Contents) as is (no modification), purged, factory (defaults) [see section x.2.2xx ]
(Reset) Arm reset, reset armed [Provide a product reset when back panel power
switch is not accessible. Also, use to generate ACCEPT key if not
present (e.g. to end the Test mode when in the Test mode).]
<<< move the following depenency lists to end of section 2.22? >>>
[Prerequisite states that must be in effect for the following parameters to be fully functional]
Film Parameter Dependency List:
Material Density Not Applicable
Material Z-Factor N.A.
Setpoint Thickness Limit N.A.
Final Thickness Limit (Trigger) Service Menu Parameter: Non Seq / Accept(Bug: 2
Setpoint Time Limit N.A.
Soak 1 Power level Value N.A.
Power Ramp 1 Time (to pwr level) N.A.
Power Soak 1 Time (@ pwr level) N.A.
Soak 2 Power level Value N.A.
Power Ramp 2 Time (to pwr level) N.A.
Power Soak 2 Time (@ pwr level) N.A.
Soak 3 Power level Value N.A.
Power Ramp 3 Time (to pwr level) N.A.
Deposit Rate (requested)N.A.
Rate Ramp Mode N.A.
New Deposit Rate ValueFilm Parameter: Rate Ramp Mode = ON
Rate Ramp Time DurationFilm Parameter: Rate Ramp Mode = ON
Rate Ramp (Thickn) Trigger Point Film Parameter: Rate Ramp Mode = ON
Control Loop –Proportional term- N.A.
Control Loop –Integral term- N.A.
Control Loop –Derivative term- N.A.
Max Power Limit N.A.
Abort Max Power SW N.A.
Max Power Dwell Film Parameter: Abort Max Power SW = ON
nd
µP not reset)
SECTION 1.XX
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Shutter Delay Mode N.A.
Shutter Delay TIMEOUT Film Parameter: Shutter Delay Mode = ON
Shutter Delay QUALITY Film Parameter: Shutter Delay Mode = ON
(XTAL) SAMPLE DWELL TIME Film Parameter: (XTAL) RATE SAMPLING = Timed
(XTAL) SAMPLE QUAL Film Parameter: (XTAL) RATE SAMPLING = Inteli
(XTAL) SAMPLE ALARM TIME Film Parameter: (XTAL) RATE SAMPLING = Inteli
FILM Fail Mode N.A.
Control Loop Qual LimitsN.A.
XTAL Stability S LimitsN.A.
XTAL Life Bounds N.A.
Plot Vert Scale VoltsN.A.
Plot Horiz Scale H N.A.
Data Plot Type N.A.
Source Sensor MAP SELECT N.A.
POCKET SELECT N.A.
ETCHING MODE N.A.
Main Menu value Dependency List:
Next Active Process (Select)
If N/A, must use START + Reset / Start Proc keys to start a process.
Next Active Film (Select)
1
Service Menu: Sequence Able + Accept keys (for Sequencing Mode)2
1
Service Menu: Non-Sequence + Accept keys (Non-Sequencing Mode)2
Review Process (Select)Service Menu: Sequence Able + Accept keys (for Sequencing Mode)
Review Film (Select)N.A.
Review Source/Sensor Map (Sel)
[NOTE1: press to invoke number entry submenu, sequence of 1 or 2 digits is entered or discarded]
N.A.
Note2: [the Seq Able / Non Seq key shows the current mode upon entry into the
Service menu, changing the mode toggles key text and generates the Accept
key that in turn needs to be pressed to accept new mode described on the key
in text]
RunTime Screen parameter Dependency List:
(Crystal Quality Indicator Select) L/Q, Loop x, Qual xx Film Parameters
(Crystal Sample Select) Film Parameter: (XTAL) Rate Sampling = Timed or Intelligent?
Running in deposit mode
(Crystal Select) System Config Parameter: Need Source/Sensor Card X Review Source Sensor Map Element Parameters:
Minimum Start Xtal Channels
Minumum Active Xtal Channels
Channel X Start Mode
(ProcessX) Main Menu Parameter: [Next Process] Digit
Fixed Front Panel START key: sequence from N/A to 1
Service Menu: SEQuence enABLE
FILM Review Processes X: EDIT: CHANGE, INSERT, DELETE films
Review Film X:
[non-sequencing mode]
(Manual mode) Running Process + Pressing fixed front panel MANUAL key +
attached Pendent
[sequencing mode]
[sequencing mode]
Layers/steps
[sequencing mode]
2
SECTION 1.XX
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MAP# Film Parameter: Review Source/Sensor Map Select
SRC x Review Source/Sensor Map Parameter: Source Analog Output Channel
Film Parameter: Source/Sensor Map Select (select the map that
contains the above selected Source Analog Output Channel)
NOTE: If SRC is zero, this is an indication that a source analog output control voltage
has been assigned to a source sensor card that is not present, not working, etc.
Remember that the System Configuration parameters: Need Source/Sensor Card X and
I/O Slot X type are only evaluated on power up or on reset. Check the OPTions/INFo
menu, page 2 and 3 to see what is currently in effect. To work correctly, the S/S x: line
should end with OK. If it ends with EMPTY, the card is not present or not
communicating. If the line ends with INCOMPATable!, the software versions in at least
some of the various PCB cards is not compatible- check for field changed PCB cards. If
the line ends with MIA, that sensor card is configured but is not present. [See
OPTions/INFo menu]
RUN, PHASE automatic up/down timers. Function when process/film is started
(START key sequence). Effected by film parameters that control film
phases within the deposition cycle.
RUN x System Configuration Parameter: Run Number
TIME/Day of Week/DATE System Configuration Parameters: Clock Time, Clock Date
Graph Film Parameters: Plot Vert Scale Volts, Plot Horiz Scale H,
Data Plot Type
(process start) Carry out the following 2 key sequence up to 3 times.
Press the fixed front panel START key + 1 of 4 touch panel keys:
Break Wait, Next Layer, Restart Layer, Reset / Start Process
(see figure in end of section 3.0). Use the appropriate touch key for the
task at hand. If unsure, use Reset / Start Process key in all 3 sequences. Please read and understand this manual before starting a live process.
(Test mode) [to enter] Service Menu: Test Off ⇒ Test On (text toggles) + Accept
(Test mode) [to exit] Service Menu: Arm Reset ⇒ Reset Armed (text toggles) + Accept
Password Dependencies:
(Communications values) Main Menu/ Executive Menu/ Communications Setup: Com/IO Lock
Code [non-zero value enables the password dependency and is itself the
Coax Conductor and Shields ...................................... Copper/Silver
Braze Material ............................................................ High VAC Ni/CR/Cu Alloy
Crystal Quartz with Gold Electrodes
SECTION 1.XX
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SIMPLE QUICK GENERALIZED OVERVIEW
SECTION 2.0
for what is the Model 880 used ? .(result). [the problem, the solution]
.deposit material on a target surface with a controlled and repeatable process.
The Model 880 addresses the needs of thin film deposition within the vacuum coating industry.
The main function of the Model 880 is to provide the means for a controlled and repeatable process, which
is the deposition of material on a target surface. [process in which material is deposited on a target surface]
[process that deposits material on a target surface]
(PVD)
<< ii, 2-1 >>
this product is the basis of a controlled and repeatable process.
Without such control, the power [supplies] used to start (or stop) the generation of deposits could be
switched on (or off) at human reaction speeds. Once on, the power [supply] outputs could be altered to vary
the deposit rate, again at human reaction speeds. From the human perspective, the relatively brief time
intervals typically required would be unwieldy at best for accurate control of even a slow process. This
kind of direct human control also assumes that a time versus deposition rate and final thickness is known
for the various deposited materials. Factor in the many physical elements that effect deposition and the
system user, with only time based control, would find it extremely difficult at best for even slowly
accumulating thick depositions, and, for thin depositions, impossible to obtain the desired results, much
less the consistent desired results. The first need is to at least monitor the deposition and know the
thickness (and rate) at any point in time. The next is to be able to control the process based on the
monitored information in real time such that the reaction time between monitor and control is at the needed
speeds. Fortunately, the needed monitor/calculation/control speed is easily within the range of a
moderately priced microprocessor.
The Model 880 has a microprocessor: on each sensor card, on the user interface board (includes
interconnected displays, keys, touchscreens, etc.) and on the communications/control/database board. This
multiprocessor approach provides greater bandwidth and dedication to specialized functions with obvious
benefits: speed, control, etc. The microprocessors used are actually microcontrollers, which can include
A/D, D/A, communications, etc. thus providing cost savings and greater reliability because of the higher
degree of integration. .[in speed and control].
.[Along with an oscillator and crystal sensor(s), the STC-2002 instrument is the basis of a controlled and
repeatable material deposition process system. ].
Along with an oscillator and crystal sensor(s), the Model 880 instrument is the basis of process control and
repeatability within a material deposition system. [of a material deposition system] The Model 880 can be
used to monitor and control the process manually, or to monitor and control the process automatically.
Utilizing the inherent flexibility of the Model 880, there are many possible levels of manual control
(requiring human intervention at user determined points in the process). This is also true of the automatic
process mode. During an automated process, for example, an input state or some other condition can be
made to pause the process for user inspection. If satisfactory, the automated process can be resumed by
another preprogrammed user input. In addition, reactions between monitor and control (response time,
overshoot control, etching vs. depositing, etc.) can be tailored to meet various requirements by user
programmable parameters (discussed in PID control section).
The material deposited on the target may be from a single element or a compound (alloy) to create single or
multilayered metal deposits, lens coatings, the creation of an alloy combination that has special properties,
metalized plastic, etc. The products range from sunglasses, jewelry, automotive decoration, CDs at the low
end to optical lenses, mirrors, filters, semiconductors, superconductors, metallurgical research, etc. at the
high end.
SECTION 2.XX
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SECTION 2.1
how is it used ?
First, a few terms and their definitions are needed.
.the material to be deposited is referred to as an evaporant source.
The material to be deposited shall be alternately and henceforth referred to in this manual as an evaporant source.
.the target surface is referred to as a substrate.
The target surface shall be alternately and henceforth referred to as a substrate.
.the material is known as an evaporant when it has reached sufficient temp/excitation to leave the
source material supply prior to deposition.
The material is known as an evaporant when it has reached sufficient temperature/excitation to leave the
surface of the source material supply prior to deposition. The Model 880 automatically, as it monitors
material deposition rate and thickness, controls the power that generates the evaporant within the bounds of
the user-defined parameters and other programming. The Model 880 is programmed through an LCD
screen with a touch panel overlay. [All choices are deterministic or bounded by a screen specified range.]
All choices are made within groups of predetermined menu selection alternatives or, as in the case of some
data entries, bounded by a screen specified range with software enforcing the range of entry acceptance.
.layered metal deposits, lens coatings, create alloy combinations that have special properties, etc.
With the crystal sensor[s] in the same space as, but not necessarily in relative close proximity to, the
substrate, the crystal sensor[s] should accumulate the same amount (or a ratio) of deposited material as the
substrate. As the crystal frequency is proportionally related to a deposited mass (within specific bounds),
thickness on a substrate can be inferred and deposition rate can be calculated based on thickness values
through the progression of time.
Other dependent factors such as the type of material deposited (as reflected in material density and z factor)
and the physical positioning of the crystal sensor[s] (see tooling factor discussion) are also part of the
deposition calculations and are included among the user programmable parameters of the Model 880.
In a typical case of evaporant stream generation, a high current (or high voltage) power supply is used to
heat the material in a boat, crucible or coiled filament. This power supply is controlled by the control
output voltage of the Model 880 sensor card. This power supply can thus be controlled through the Model
880 either manually or automatically. Manual mode can be used to setup the system before the auto mode
is employed. The power supply, in this case, is manually controlled while the deposition is monitored. In
non-sequencing mode (defined shortly), the final thickness parameter can be set to terminate the process
when reached (evaporant source shutter closure). The power could be switched off via an output relay (a
poor man's controller). In the auto mode (sequencing mode), a user programmable PID loop can be used
for process monitor/power supply control with a relatively high degree of precision based on needed
system speed elements. All methods of evaporant stream generation need power supply control. A power
supply that is controlled by the Model 880 typically provides thermal excitation of the target material by
laser, electron beam (accurate control), resistance heating (low cost/complexity) or sputter (large area)
deposition, each process type having favorable attributes for specific process goals.
Regarding higher level system control, the Model 880 can be programmed to function in this capacity
(keeping in mind failsafe measures). [On a higher level of system control].
Using one of the four user programmable fixed front panel keys and output relays, gates/valves could be
closed and pumps could be activated as a prelude to the previously described automated process. A
pressure monitoring device would signal the Model 880 through an opto-input when the pressure was
correct and the automated deposition would begin. One of the user programmable front panel indicators
could be used to show this and that of other points during the process had been reached.
[For additional information, search the web using "quartz crystal microbalances".]
Returning to Model 880 specifics, some additional Model 880 terminology definitions must now be given.
Beyond sensor information and power supply control voltage, the Model 880 also allows the user to define
the other parameters that are critical in the deposition process.
In Model 880 terminology, a film is defined as a list of user programmable deposition related
parameters (see XXX). Typically, one material deposition is accomplished per film (describes specific:
material, mechanical setup, timing, etc.). The Model 880 can store up to 99 films (referred to as a film
recipe library). A process is a list of film implementations. Each film implementation is referred to as a
layer (or step in the process). Process layers can use the same film many times or use any combination of
different films (insert figure / see fig. xx).
The Model 880 has 2 basic process control modes: sequencing mode and non-sequencing mode.
While in either one of these modes, manual mode (manual control of power) may be invoked. In addition,
a test mode can be employed to simulate (w/ simulated rate information) a crystal sensor input while in any
combination of the modes just described. Simply put, the sequencing / non-sequencing mode difference is
that of having or not having a process. Non-sequencing mode does not have a process (or at least nothing
named as such). Non-sequencing mode uses 1 implicit process which can run 1 film. The non-sequencing
mode is easiest to configure (user programs an active film). The sequencing mode is more complicated
only by the additional programming of a process[es] that calls out a film or films.
The Model 880 retains the non-sequencing mode for historical compatibility and for simple
depositions.
On the subject of films and processes, that which is referred to as active is that which is queued to
be run when the start sequence is initiated. In other words, except for a co-deposition process, only one
film is being deposited at one time and one process (the active process) is calling out that one film in one of
its steps. When a process is run (start key sequence), it uses the single process that was selected as the
active process (on the Main Menu). Likewise, the film that was selected by the active process as the active
film will become the running film. [The non-sequencing mode has only one inherent unspecified process
and films are manually selected to be active. Only the film selected as active will be run (Main Menu in
non seq mode).] Regardless of mode selection, an active process or active film can be edited (modified)
while a process or film is running but only in a limited manner. This prevents potentially dangerous
situations from occurring. The limitations, that is, the parameters that are not changeable while a process
(or film ) is running include the following:
Film parameters: SS Map Select, Pocket Select, Etching Mode.
Map parameters: CH x Start Mode, Source full power, Source out channel, Indexer Sync Mode.
Min ~~~ XTALS
[3 parameters]
(evaluated at start only except for RE-VERIFY key usage).
Process: Film# of current running step, Process length (no step insertion/deletion).<<<move?>>>
SEQ MODE
1 active process
(process selects 1 or more films)
Up to 9 programmable processes
NON-SEQ MODE
1 implicit active process
(user selects 1 active film)
1 ACTIVE FILM
(up to 99 programmable films)
Film parameters define the
constituent elements of the
osition
de
SECTION 2.XX
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Model 880 DEPOSITION CONTROLLER
In terms of Model 880 usage, the simplest configurations would be either in sequencing mode with: 1
crystal, 1 oscillator, 1 process, 1 film, 1 material, and 1 deposit or in non-sequencing mode with: 1 crystal,
1 oscillator, 1 film, 1 material, and 1 deposit. Also for these simplest configurations, in either sequencing
or non-sequencing mode, a single sensor input would be employed along with a single control voltage
output (controls power to that which is generating the evaporant). The simplest means of evaporant stream
generation would be resistive heating.
In terms of unit hardware, this translates into an Model 880 with 1 sensor card, 1 output card and 1
input card.
In terms of unit software (menu programming), a specific film is either called by a process (in
sequencing mode) or called directly (in non-sequencing mode). The film, in turn, calls out a specific sensor
map. Except for co-deposition applications, which will be explained elsewhere, only 1 process, only 1 film,
only 1 map can be active (running) at a single point in time. A process can call a different film at each of
its steps (or layers) up to 99 steps.
Density
Z Factor
Setpoint Limits
Rate Ramp Power/Time
Soak Power/Time
Deposit Rate Values
PID Loop
Max Power Values
Shutter Parameters
Rate Sampling Values
Film Fail Mode
Xtal Loop Stability/Quality
Xtal Life Bounds
Graph Plotting Values
Map Select
Pocket Select
Source Power Options
Master Tooling
Xtals: Start, Backup, Active
Xtal Drop Filter Mask
Indexer
Channel X:
Start mode
Fail action
Backup List
Tooling
.general case usage .(differences: few) traditional.
The typical usage would not be much beyond the simplest case as described above. This would include
more films (implying more materials), multiple deposits of the same or different materials or more
processes. In addition, a multiple crystal head with an integral either/or shutter is sometimes used as an
input to 2 sensor inputs. Although these configurations represent most systems, the capabilities of the
Model 880 are far beyond these necessities.
input is not supported with this product (no switching with zeroing on a single input, etc.).]
[A multiple crystal head that is used as an input to a
Examples of added usage complications would be using (or using more) digital inputs, relays, more
crystals, more sensor channels, external I/O voltages, strip chart recorders, communication terminals, ebeam source indexer (model: 376, 379 or 395), etc.
A pendent is supplied for some remote front panel functions and manual mode usage. The pendent plugs
into the front panel of the Model 880 and has a 6 foot coiled cord.
A sensor card has 2 identical sensor inputs and 2 identical analog outputs. The 2 analog outputs, in a single
sensor card system, are typically used as 1 control output voltage and 1 strip chart output voltage. When
multiple sensor cards are used, the strip chart recorder output can be set up on any of the analog outputs but
only one strip chart recorder function per system is programmatically allowed. Each of the two analog
outputs arrive at the external connector in 2 polarities: isolated and a negative version of the isolated
output. A less expensive non-isolated version of the card is TBD? There are slots for 4 sensor cards (1
sensor card is standard in the Model 880). Crystal sensor and control voltage output usage has been
described above. If one of the analog outputs is programmed for strip chart recorder output, a software
menu change can convert the strip chart output into a second isolated control voltage output.
There is another group of 4 slots for either input cards and/or output cards (1 of each type in the first 2 slots
are standard in the Model 880). Input cards have 8 opto-coupled inputs. Output cards have 8 form C
(SPDT) relays. Inputs are typically used to trigger events at some meaningful point in the process or to
SECTION 2.XX
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Model 880 DEPOSITION CONTROLLER
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indicate to the system user that some point has been reached. Outputs (relays) are typically used to
open/close shutters on material sources and crystal sensors, but are also used to control many other valves,
relays, solenoids, etc. The card IDs (software addresses) of the PCBs (sensor, input, output cards) are not
unique within their types nor are they programmed by hardware or software. It is the location into which
they are connected that gives them their unique identity (software address).
A communication port is used to interrogate the Model 880. By using a set of commands, various
information can be downloaded or uploaded, front panel control can be simulated, process control can be
modified/stopped/started/driven, etc. .other useages (i.e. limp along).
There are also other useages and subuseages. Some other useages would be test mode and rate sample/hold
mode.
Multiple material co-deposition are also possible with additional hardware and different software described
in a different manual.
SECTION 2.2
how does it work ?
.
crystal osc, crystal sensor
Be forewarned that the general information contained herein is meant only as an overview of the system.
The information presented here does not adequately describe the many hazardous situations that could
occur brought about by the incorrect constellation of valve states, temperatures, pressures and voltages.
The system needs to have safety provisions should inadvertent human intervention cause changes or should
a power failure of any or all parts of the system occur. Safety concerns include electrocution and
explosion.
techniques) needs a number of components. A vacuum chamber provides the space and environment in
which the deposition process will occur. A vacuum is necessary to provide a decreased potential for atomic
collisions and contamination (better dispersion with less impurities). Vacuum pumps are needed: roughing
pump (starts vacuum), cryogenic pump (provides final high vacuum), etc. Relays, valves and solenoids to
control the pumps, pump valves and seal/vent the chamber are needed. A vacuum gauge is needed to
monitor the chamber vacuum. Additional vacuum gauges may be used to monitor other points in the
vacuum system. At the appropriate pressures, the system user can close/open valves, start the deposition
process, etc. A heat/excitation source (electron beam, resistive filament, etc.) to react with the source
material to be deposited, the source material itself, a boat, coil or crucible, etc. into which the source
material is placed, a power supply for the heat/excitation source, and the target (substrate) material are all
needed. A source of water for cooling various components is also needed. An air compressor is necessary
to activate solenoid controlled valves, shutters, etc. Various traps can be used to keep gases clean. Crystal
sensor[s] and attendant oscillator need to be connected to the STC_2002. Shutters are usually placed to
shield the crystal sensors or the source material's evaporant stream, at least during process startup. The
Model 880 typically acts to tie most, or all, of these elements together to control the deposition process.
For e-beam use, a sweeper control unit may also be needed. In multipocket e-beam gun systems, a pocket
indexer or rotator would also be needed.
The roughing pump creates a low vacuum in the chamber first through the open gate valve, the cryopump
and the open rough valve with the purge valve closed. When the desired level of low vacuum is attained,
the roughing pump is powered off as the rough valve between the cryopump and roughing pump is closed.
The cryopump begins to pump the chamber to a higher vacuum (by condensing gas molecules on an
extremely cold surface of a container). When the cryopump reaches saturation, the gate valve is closed and
the purge valve is opened so that the cryopump can be regenerated (a heater may be needed). After
cryopump regeneration is complete (condensed gases have been dissipated), the purge valve is closed, the
gate valve is opened and the pump-down to a higher vacuum using the cryopump continues.
vacuum deposition: vacuum chamber, roughing pump, heat source, evaporated material, p.s.,
cryogenic pump (which condenses gas molecules on an extremely cold surface of a container).
uniform deposition of material in a vacuum, material deposition on crystal and target substrate.
.
A generalized, simple, thin film vacuum deposition system (using physical vapor deposition
SECTION 2.XX
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p
Model 880 DEPOSITION CONTROLLER
y
Chamber
Gate Valve
Cryopump
Roughing Pump
Purge Valve Rough Valve
<< crystals 2.2 >>
cal and theory (ch 4, 1
st
page) [keep ch 4-like intact, repetition ok, use see ch 4 to link].
When the chamber is appropriately pumped down, the source material is heated/excited such that molecules
become the evaporant stream and are dispersed.
To reiterate, the source material is known as an evaporant when it has reached sufficient
temperature/excitation to leave the surface of the source material supply prior to deposition. A vacuum is
necessary to provide a decreased potential for atomic collisions and contamination (better dispersion with
less impurities). The Model 880 automatically, as it monitors material deposition rate and thickness,
controls the power that generates the evaporant within the bounds of the user-defined parameters and other
programming. The Model 880 is programmed through an LCD screen with a touch panel overlay. All
choices are deterministic or bounded by a screen-specified range with software enforcing the range of entry
acceptance. The Model 880 can also be programmed through the communication port.
The Model 880 monitors material deposition rate and thickness by means of the crystal sensor, which
occupies the same space as the substrate.
.<< control loop=2-12 >>.
As the deposition process is transpiring within a vacuum chamber, the resonant frequency of a quartz
crystal sensor, also exposed to the same evaporant as the substrate within the chamber, accumulates
deposited film[s] on its surface. The equation in section x7 describes the relationship between the mass of
such a film deposition and the measured frequency of the sensor crystal. Knowing the frequency change
due to accumulated mass, the film thickness can be determined. The rate of accumulated material thickness can be calculated using the film thickness along with other elements and progression through
time. Contributing factors include crystal sensor placement, material characteristics, etc. The Model 880
numerically displays rate, thickness and power. It graphically displays rate, power or rate deviation.
SECTION 2.XX
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Model 880 DEPOSITION CONTROLLER
y
As the Model 880 measures the rate of material deposition (in auto deposit mode), it compares this
measured value to a user programmed rate setting. If there is a difference between the actual rate and the
user programmed rate, the control voltage (from the sensor card) is used to generate a feedback to adjust
the deposition source power supply keeping it in compliance with the user programmed rate setpoint value.
This method of Model 880 control has automatic compensation for changing source conditions.
Since there are many different types of deposition power supplies and sources in use today, the deposition
control voltage provided by the Model 880 has been made user configurable: can be wired positive
isolated or negative isolated and menu scaled for 2.5, 5 or 10 volts full scale. The sense of the control loop
can also be set for either deposition or etching applications by menu programming.
To accommodate the extremely wide range of control loop responses required for the diverse deposition
sources available today, a P-I-D type of control loop has been implemented. With this type of control loop
available to the user, it should be possible to achieve very good control of any deposition source (see
section X3X).
All the control loop parameters interact to some degree in the overall response of the control loop resulting
in many combinations of settings that will give equally satisfactory results. Also, the control loop that is
optimized for steady state control will have quite different settings from one requiring fast control
acquisition with minimal overshoot. By supplying real time rate, rate deviation, or control power to the
graph on the Model 880 RunTime display, determination of control loop settings and performance can be
made. By introducing a change into the control system and observing the graphical display responses, it is
quite easy to "tune" the control loop. Source response is another contributing control consideration.
Sources can be categorized as fast responding (electron beam), medium responding (resistive type boats,
baskets, or filaments), or slow responding (Knudsen or induction heated types). User programmable
shutter delay can also be used to achieve good deposition rate control before exposing substrates to the
evaporant stream. Refer to the I/O programming information later in this section and in section x5x of this
manual for a guide on selecting or implementing the logic used to control the substrate and/or sensor
shutter[s].
There are several phases during a deposition layer of the Model 880 related to the source and deposition
rate control. There are three main parts to a deposition layer: pre-deposition, deposition control, and
post-deposition. The pre-deposition parameters control the source and material conditioning prior to the
film deposition. The Model 880 can control a variety of different types of deposition sources. The typical
run cycle phases(rise/soak/rise/soak/shutter delay/deposit/rate ramp/deposit/idle ramp/idle) are for an
electron-beam, resistive element or other thermal source. There are also several film parameters (such as
DENSITY and Z FACTOR) and associated map parameters (TOOLING, WEIGHT) which relate to the
deposition material and sensor calibration. All of these issues will be described in greater detail later in this
manual.
.<< co-dep 3-31 >>.
Co-deposition is the running of 2 process layers simultaneously (2 materials, 2 evaporants, 1 or more
crystals for each of the 2 co-deposition processes). One of the 2 co-deposition processes will be designated
as the one with a final thickness parameter that will terminate the entire co-deposition process. The codeposition process without the final thickness parameter designation will have a parameter specifying its
percentage of the thickness rate of the other process. Another parameter unique to co-deposition is codeposition interaction which specifies quantitatively [by] how much each process contributes (is seen by) to
the other process (the other crystal sensor). Multiple material co-deposition is possible with additional
hardware (2
nd
set of LED/LCD displays) and different software that is described in a different manual.
.<< multi-sensor dep >>.
In addition to the typical configuration of 1 crystal sensor, 1 oscillator, 1 control voltage output, the Model
880 can utilize (by means of the 2
nd
sensor channel and optional sensor cards) multiple sensors to acquire
evaporant stream data at various locations, insuring greater repeatability of process control as well as better
process control (compensating for the vicissitudes of the evaporant stream in location and in time). A
number of user programmable parameters effect multiple sensor depositions. Review Source Sensor Map
SECTION 2.XX
e page 28 of 275 ^
p
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Model 880 DEPOSITION CONTROLLER
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chooses the sensors that are part of the multiple sensor group. Since each sensor has a unique parameter
group, programming 2 or more crystals as active automatically invokes an averaging mode. Lost channels
during averaging are handled by menu programmed alternatives (Main Menu/Review SS Maps/Channel
Drop Filter Mask). TBD multiple sensor deposition: averaging multiple, averaging weight, interaction calibration (among the crystal sensors) . [additive]
Although the Model 880 cannot control multiple depositions (multiple sources as is the case with
co-deposition), but it can maintain other multiple sources (depending on installed and available sensor
cards) such that one source output is controlled while other source outputs can be maintained at a non-zero
power level. This would provide the ability to precondition other materials that could become activated
(controlled) when the currently controlled source reaches its preset conditions. In other words, multiple
source outputs can be providing some level of output to multiple power supplies while deposition control
can be focused on a single source output (moved) among these. The preconditioning mentioned above
would include the soak phases of the deposition process cycle. The soak phase is (or soak phases are)
characterized by power being maintained at a constant level.
Ris e
Note soak power levels in deposition cycle
The more imaginative among us might, at this time, see an opportunity here to use the Model 880 for a co-deposition process (set the
.
Soak
Ris e
Soak2Shutt er
De l a
Depo s it
Rat e
Depos it
Idle
Idle
rate for a source output when active, select another source output as active and then allow the non-controlled output to deposit along
with the controlled output deposition). The problem with this scenario is in the shutter control that is linked to the active output
channel. Alternately, the shutter control could be accomplished with an I/O program but it would not control the process like a true co-
deposition unit nor would it have the same co-deposition oriented amenities
hardware setup discussion
(for actual installation details see Sections x3 & 4 but please read this section first)
.
.necessities: crystal sensor head, osc, bnc cables, vacuum chamber, etc.
Following is a diagram of a typical evaporator installation. This diagram is repeated and described further
in Section 3 (see fig. 3.7).
NOTE: Chart recorder function through memory module connection uses optional hardware and TBD software.
I/O 4 1/O 3 I/O 2 I/O 1
INPUTS / OUTPUTS
CHAMBER
CRYSTAL SENSOR
SENSORS
7 5 3 1
8 6 4 2
7 5 3 1
8 6 4 2
SOURCE
RS232
MEM
COMM OPTION
FUSE: 2 x 2.00 AMP
QUICK-ACTING (F) 250v
90-264 vac, 50-60 Hz, 230VA MAX
!
WARNING
The power cord protective
connected to ground. No user
servicing to qualified personnel.
Memory Module
grounding conductor must be
serviceable parts inside. Refer
SHUTTER
DEPOSITION
SOURCE
OSCILLATOR
SECTION 2.XX
e page 29 of 275 ^
COMPUTER
CHART RECORDER
DATA AQUISITION
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