ST AN1232 APPLICATION NOTE

AN1232
Application note
Ruggedness improvement
of RF DMOS devices
Introduction
RF amplifiers often experience impedance mismatch between output and load. Such an impedance mismatch generates a reflected wave towards the RF power transistor, making a much more stringent working environment for the transistor. Working conditions grow critical when the load is disconnected from the output of the RF power transistor, since, in this case, the reflected wave amplitude becomes comparable to the incident one.
RF transistors are able to withstand severe impedance mismatch conditions particularly essential for applications such as plasma generators or nuclear magnetic resonators which operate under rough conditions. DMOS devices used in such applications appeared to lack the necessary ruggedness when operating under severe RF load mismatch conditions. This weakness was believed to be intrinsic.
Based on the need to improve the ruggedness of RF power DMOS, an investigation was carried out and a theoretical model simulating the failure mode mechanism was developed. Finally, relevant corrective actions were undertaken.
July 2007 Rev 13 1/6
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Proposed model AN1232

1 Proposed model

Figure 1. Npn Bipolar parasitic transistor

Under impedance mismatch conditions the RF power transistor is subjected to a reflected wave with an amplitude that cannot be controlled and, in the worse case, with a voltage value that can exceed the BV clamp for this wave. Under such conditions the device is subjected to an electric current whose amplitude is proportional to the power of the incident wave. Simultaneously, the DMOS experiences a temperature rise proportional to the duration, voltage swing (BV and amplitude of the above current. In the DMOS cross section, shown in Figure 1, the presence of an npn bipolar parasitic transistor, in which the base and emitter are shorted by means of the DMOS source metallization, are clearly noticeable.
of the device itself. Hence, the DMOS works as a voltage
dss
dss
)
Under static conditions the parasitic transistor is inhibited by the short circuit, but under dynamic conditions, when the reverse breakdown current flows through the device, the short circuit condition itself is modified. In fact, this current crosses the base-emitter junction through the base resistance which is increased by the depletion layer due to the reverse voltage. This results in a variation in V
be
We can assume that:
Equation 1
V
If I
(base distributed current) and Rbe (base distributed resistance) are large enough, the
dis
potential on the emitter side opposed to the short circuit is sufficient to turn on the bipolar transistor, thus concentrating the current and destroying the device.
A simplified model was developed (see Figure 2) to simulate the mismatch condition on the drain of the DMOS by means of the inductance L.
2/6
be
.
RbeI
=
dis
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