Metallography is the study of the physical structure and components of metals, by using microscopy.
Many different microscopy techniques are used in metallographic analysis.
Prepared specimens should be examined with the unaided eye after etching to detect any visible areas that have responded to the etchant
differently from the norm as a guide to where microscopical examination should be employed. Light optical microscopy (LOM) examination
should always be performed prior to any electron metallographic (EM) technique, as these are more time-consuming to perform and the
instruments are much more expensive.
Inspection & Industrial
Further, certain features can be best observed with the LOM, e.g., the natural color of a constituent can be seen with the LOM but not with EM
systems. Also, image contrast of microstructures at relatively low magnifications, e.g., <500X, is far better with the LOM than with the scanning
electron microscope (SEM), while transmission electron microscopes (TEM) generally cannot be utilized at magnifications below about 2000
to 3000X. LOM examination is fast and can cover a large area. Thus, the analysis can determine if the more expensive, more time-consuming
examination techniques using the SEM or the TEM are required and where on the specimen the work should be concentrated.
Brightfield and darkfield microscopy
Most LOM observations are conducted using bright-field (BF) illumination, where the image of any flat feature perpendicular to the incident
light path is bright, or appears to be white. But, other illumination methods can be used and, in some cases, may provide superior images
with greater detail. Dark-field microscopy (DF), is an alternative method of observation that provides high-contrast images and actually greater
resolution than bright-field. In dark-field illumination, the light from features perpendicular to the optical axis is blocked and appears dark while
the light from features inclined to the surface, which look dark in BF, appear bright, or “self-luminous” in DF. Grain boundaries, for example, are
more vivid in DF than BF.
Polarized light microscopy
Polarized light (PL) is very useful when studying the structure of metals with non-cubic crystal structures (mainly metals with hexagonal
close-packed (hcp) crystal structures). If the specimen is prepared with minimal damage to the surface, the structure can be seen vividly in
cross-polarized light (the optic axis of the polarizer and analyzer are 90 degrees to each other, i.e., crossed). In some cases, an hcp metal
can be chemically etched and then examined more effectively with PL. Tint etched surfaces, where a thin film (such as a sulfide, molybdate,
chromate or elemental selenium film) is grown epitaxially on the surface to a depth where interference effects are created when examined with
BF producing color images, can be improved with PL. If it is difficult to get a good interference film with good coloration, the colors can be
improved by examination in PL using a sensitive tint (ST) filter.
Differential interference contrast microscopy
Another useful imaging mode is differential interference contrast (DIC), which is usually obtained with a system designed by the Polish physicist
Georges Nomarski. This system gives the best detail. DIC converts minor height differences on the plane-of-polish, invisible in BF, into visible
detail. The detail in some cases can be quite striking and very useful. If an ST filter is used along with a Wollaston prism, color is introduced.
The colors are controlled by the adjustment of the Wollaston prism, and have no specific physical meaning, per se. But, visibility may be better.
Oblique illumination
DIC has largely replaced the older oblique illumination (OI) technique,
which was available on reflected light microscopes prior to about 1975.
In OI, the vertical illuminator is offset from perpendicular, producing
shading effects that reveal height differences. This procedure reduces
resolution and yields uneven illumination across the field of view.
Nevertheless, OI was useful when people needed to know if a second
phase particle was standing above or was recessed below the planeof-polish, and is still available on a few microscopes. OI can be created
on any microscope by placing a piece of paper under one corner of
the mount so that the plane-of-polish is no longer perpendicular to the
optical axis.
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B-383MET - Metallurgical Microscope
3
Brightfield upright microscope with IOS W-PLAN MET objectives and metallurgical attachment combining the exclusive X-LED3 lighting source both for incident
and transmitted illumination. The NCG (no cover glass) objectives are especially designed for microscopy use without a cover slip ideal for metallographic
samples and other opaque specimens.
20
33
X-LED
4x
IOS
∞
W-PLAN
MET
10x
POLPOL
Inspection & Industrial
PartDescription
Observation mode: Brightfield, incident polarized light.
Epi-illumination and
Eyepieces:WF10x/20 mm, high eye-point and secured by screw.
Nosepiece:Quintuple revolving nosepiece, rotation on ball
3
X-LED
with white 3.6 W LED (6.300 K) with brightness
control. Field and aperture diaphragms, polarizer &
analyzer filters.
Adjustable between 48 and 75 mm.
bearings.
20x
50x
PartDescription
Objectives
(strain-free):
Specimen stage:Double layer rackless mechanical stage, 233x147 mm,
Focusing:
Condenser:
Transmitted illumination
(Fixed Koehler type):
IOS W-PLAN MET 5x/0.12 IOS W-PLAN MET 10x/0.25
IOS W-PLAN MET 20x/0.40 IOS W-PLAN MET 50x/0.75
All with anti-fungus treatment.
78x54 mm X-Y range. With tempered glass plate.
Coaxial coarse (adjustable tension) and fine focusing
mechanism with limit stop to prevent the contact
between objective and specimen.
Abbe N.A. 1.25, with objective-coded iris diaphragm,
focusable and centerable.
X-LED3 with white 3.6 W LED (6.300 K) with brightness
control. Multi-plug 100-240Vac/6Vdc external power supply.
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3
B-510MET - Metallurgical Microscope
Advanced routine laboratory microscope with IOS W-PLAN MET objectives and metallurgical attachment with the exclusive X-LED3 lighting source for incident
illumination only. The NCG (no cover glass) objectives are especially designed for microscopy use without a cover slip ideal for metallographic samples and other
opaque specimens.
Interpupillary distance:
Dioptric adjustment: On the left eyepiece tube.
Eyepieces:WF10x/22 mm, high eye-point and with rubber cups.
Nosepiece:
330
8
X-LED
with white 8 W LED (6.300 K) with brightness
control. With aperture and field diaphragms, and
oblique illumination system. With polarizer and analyzer.
Multi-plug 100-240Vac/6Vdc external power supply.
Adjustable between 50 and 75 mm.
Quintuple revolving nosepiece, rotation on ball bearings.
PartDescription
Objectives
(strain-free):
Specimen stage:Double layer rackless mechanical stage, 233x147 mm,
Focusing:
IOS W-PLAN MET 5x/0.12
IOS W-PLAN MET 10x/0.25
IOS W-PLAN MET 20x/0.40
IOS W-PLAN MET 50x/0.75
All with anti-fungus treatment.
78x54 mm X-Y range.
Coaxial coarse (adjustable tension) and fine focusing
mechanism with limit stop to prevent the contact
between objective and specimen.
B-510METR - Metallurgical Microscope
3
Advanced routine laboratory microscope with IOS W-PLAN MET objectives and metallurgical attachment with the exclusive X-LED3 lighting source for both
transmitted and incident illumination. The NCG (no cover glass) objectives are especially designed for microscopy use without a cover slip ideal for metallographic
samples and other opaque specimens.
22
33
X-LED
88
X-LED
IOS
Inspection & Industrial
∞
W-PLAN
MET
POLPOL
PartDescription
Observation mode: Brightfield on transmitted light.
Brightfield, simple polarized light, oblique illumination
on incident light.
Interpupillary distance:
Dioptric adjustment: On the left eyepiece tube.
Eyepieces:WF10x/22 mm, high eye-point and with rubber cups.
Nosepiece:Quintuple revolving nosepiece, rotation on ball
8
X-LED
with white 8 W LED (6.300 K) with brightness
control.
With aperture and
oblique illumination system. With polarizer and analyzer.
Adjustable between 50 and 75 mm.
bearings.
field diaphragms, and
PartDescription
Objectives
(strain-free):
Specimen stage:Double layer rackless mechanical stage, 233x147 mm,
Focusing:
Condenser:
Transmitted illumination
(Full Koehler type):
IOS W-PLAN MET 5x/0.12
IOS W-PLAN MET 10x/0.25
IOS W-PLAN MET 20x/0.40
IOS W-PLAN MET 50x/0.75
All with anti-fungus treatment.
78x54 mm X-Y range. With tempered glass plate.
Coaxial coarse (adjustable tension) and fine focusing
mechanism with limit stop to prevent the contact
between objective and specimen.
Swing-out N.A. 0.2/0.9, with iris diaphragm, focusable and centerable.
X-LED3 with white 3.6 W LED (6.300 K) with brightness
control. Multi-plug 100-240Vac/6Vdc external power supply.
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3
B-
1000MET
The modular OPTIKA B-1000 is available with brightfield and darkfield incident light, helping you working in a comfortable way during extended periods of
use and performing reliable, accurate and rapid diagnosis benefiting from modularity, which gives the chance to create customized configurations tailored on
customer needs. Versatile, robust, durable and sturdy, B-1000 offers premium quality optics, the state-of-the-art, exclusive
designed by OPTIKA and the Koehler diaphragm. Incident light through 100 W halogen lamp or 18 W LED illumination.
B-1000 gives multiple options as manual or motorized configuration.
Inspection & Industrial
22
88
X-LED
IOS
∞
- Metallurgical Microscope
8
X-LED
(8 W) illumination system,
W-PLAN
U-PLAN
MET
POLPOL
DFDF
332
B-
1000MET
- Configuration Chart
3
PL10x/22 eyepiece, high eyepoint,
with micr
ometric scale (10mm/100um)
& rubber cup (retractable)
Trinocular head, three positions
(100/0, 50/50, 0/1
M-1021M
Main body with focus system
and X-LED
8
illumination,
for metallurgical model
Build the microscope that suites your needs by choosing among the components
* Code M-1156 must be added only once for any motorized configuration
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IM-3MET- Metallurgical Microscope
Routine inverted microscope with IOS LWD U-PLAN MET objectives for material science and metallographic applications, combining a sturdy yet compact structure
with dedicated components required in this field, like the NCG (no cover glass) objectives working without cover slide ideal for metallographic samples and other
opaque specimens. A particularly simple and ingenious optical design allows stable alignments and smooth and accurate movements.
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Inspection & Industrial
IOS
∞
U-PLAN
MET
POLPOL
CAST IRON CAST IRON
BRIGHTFIELDBRIGHTFIELD
CAST IRON CAST IRON
POLARIZED LIGHTPOLARIZED LIGHT
334
IM-3 Series - Specifications
PartDescription
Observation mode: Brightfield, simple polarized light on incident light.
Epi-illumination and polarizing
Interpupillary distance:Adjustable between 50 and 75 mm.
Dioptric adjustment:On the left eyepiece tube.
Eyepieces:WF10x/22 mm, high eye-point and with rubber cups.
Nosepiece:
ObjectivesIOS LWD U-PLAN MET 5x/0.15
Halogen 12 V/50 W with brightness control.
With aperture and eld (centrable) diaphragms.
With polarizer and analyzer.
Quintuple revolving nosepiece, rotation on ball bearings.
IOS LWD U-PLAN MET 10x/0.30
IOS LWD U-PLAN MET 20x/0.45
IOS LWD U-PLAN MET 50x/0.55
All with anti-fungus treatment.
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Inspection & Industrial
Specimen stage:Fixed stage, 250x160 mm, with metal stage insert.
Focusing: Coaxial coarse (adjustable tension) and fine focusing mechanism with limit stop to prevent the contact between objective
and specimen.
IM-3 Series - Optical performance
Eyepiece10x (M-780)15x (M-601)
Field number (mm)2216
ObjectiveN.A.W.D. (mm)Total magnication Field of view (mm)Total magnication Field of view (mm)
5x
10x
20x
50x0.557.90500x0.44750x0.32
100x0.802.101000x0.221500x0.16
0.1510.80
0.3010100x2.20
0.454200x1.10
50x
4.4075x3.20
150x1.60
300x0.80
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3
IM-5MET - Metallurgical Microscope
Industrial and materials science inverted microscope especially designed for opaque specimens (including metals microstructure
investigation and studies such as grain size, grain boundaries, phases, transformation, inclusions, and non-metals, as well as
sample preparation and treatment) in metallography labs. Freely configurable lenses according to customer ’s preferences ,
FN 24 high eyepoint, infinity corrected optical system, coaxial focusing, mechanical stage, and epi-illumination attachment
powered by halogen 12 V/100 W with brightness control. Sturdy and incredibly reliable, it is equipped with all the main controls
in ergonomic position and with long lasting, efficient LED illumination to provide over 20 years of use.
Inspection & Industrial
24
IOS
∞
U-PLAN
MET
POLPOL
DFDF
DDIICC
WAFER, POLARIZED WAFER, POLARIZED
LIGHTLIGHT
WAFER, DICWAFER, DIC
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IM-5MET - Specifications
PartDescription
Head:Trinocular (split ratio: 100/0, 50/50), 45° inclined.
Dioptric adjustment:Both eyepieces.
Eyepieces:WF10x/24 mm, high eyepoint, secured by screw and with retractable rubber cups.
Epi-illumination & lters:Halogen 12 V/100 W with brightness control. With eld and aperture diaphragms, polarizer and analyzer lters.
Objectives:Selectable according to customer’s preferences. All with anti-fungus treatment.
Specimen stage:
Focusing:Coaxial coarse and ne focusing mechanism with limit stop to prevent the contact between objective and specimen.
Mechanical stage, 240x250 mm.
Adjustable tension of coarse focusing knob.
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Inspection & Industrial
IM-5MET is freely configurable in terms of objectives, by choosing among:
MET Innity-corrected Plan-Achromatic, Long Working Distance
objectives, eld atness up to F.N. 25:
M-1100 IOS LWD U-PLAN MET objective 5x/0.15
M-1101IOS LWD U-PLAN MET objective 10x/0.30
M-1102IOS LWD U-PLAN MET objective 20x/0.45
M-1103IOS LWD U-PLAN MET objective 50x/0.55
M-1104IOS LWD U-PLAN MET objective 100x/0.80 (dry)
MET Innity-corrected Plan-Achromatic, Long Working Distance
objectives, for brighteld and darkeld, eld atness up to F.N. 25:
M-1094IOS LWD U-PLAN MET BD objective 5x/0.15
M-1095IOS LWD U-PLAN MET BD objective 10x/0.30
M-1096IOS LWD U-PLAN MET BD objective 20x/0.45
M-1097IOS LWD U-PLAN MET BD objective 50x/0.55
M-1098
IOS LWD U-PLAN MET BD objective 100x/0.80 (dry)
¨
¨
¨
¨
¨
¨
¨
¨
¨
¨
MET Innity-corrected Semi-Apochromatic, Long Working Distance
objectives, eld atness up to F.N. 25:
M-1171IOS LWD U-PLAN F MET objective 5x/0.15
M-1172IOS LWD U-PLAN F MET objective 10x/0.30
M-1173IOS LWD U-PLAN F MET objective 20x/0.50
M-1174IOS LWD U-PLAN F MET objective 50x/0.80
M-1175IOS LWD U-PLAN F MET objective 100x/0.90 (dry)
MET Innity-corrected Semi-Apochromatic, Long Working Distance
objectives, for brighteld and darkeld, eld atness up to F.N. 25:
M-1180IOS LWD U-PLAN F MET BD objective 5x/0.15
M-1181IOS LWD U-PLAN F MET BD objective 10x/0.30
M-1182IOS LWD U-PLAN F MET BD objective 20x/0.50
M-1183IOS LWD U-PLAN F MET BD objective 50x/0.80
M-1184
IOS LWD U-PLAN F MET BD objective 100x/0.90 (dry)
Included n Optional
¨
¨
¨
¨
¨
¨
¨
¨
¨
¨
¨
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Inspection & Industrial
v 2.0 - OPTIKA reserves the right to make corrections, modications, enhancements, improvements and other changes to its products at any time without notice.