Lethal RF and DC voltages are present in this system.
Only qualified personnel should install and service this equipment.
Prior to installation and operation of this system, this instruction manual should be consulted to ensure that
the installation and operation are in accordance with Manitou Systems' recommendations.
Failure to properly install or operate this unit will result in voiding the equipment warranty.
Copyright 2002 Manitou Systems, Inc.
This owner’s manual is provided to enable the user to safely install, operate and service the equipment
described.
Manitou Systems, Inc. reserves the right to make product changes and enhancements without notification
or obligation.
For more information, please write Manitou Systems, Inc. 12 South Street Danbury, CT 06810 USA or
contact us via:
• Telephone at (203) 792-8797
• FAX at (203) 792-7097
• e-mail info@manitousys.com
• Website at www.manitousys.com.
Published in the United States of America.
This document may not be reproduced without the written permission of Manitou Systems, Inc.
All rights reserved.
Revisions to Manual
12.8.02 SMS r1- Add new ground/return scheme to User I/O connection. Modified Section 2.4 Pg 11 &
Section 32. Pg 14
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The budget minded SERIES PB-3 is specifically designed for continuous operation in gas plasma
process applications.
The RF power generator and manual impedance matching network are both housed in a single,
compact enclosure.
The RF generator provides precise process control - even in the varying environment of plasma
processes. Ruggedized output transistors are used to ensure reliability during 100% duty-cycle
operation. A high current switch mode DC power module provides all necessary support power.
The system's control circuitry offers fine control resolution: A ten (10) turn control pot is used to
provide a 1% control resolution.
A manually controlled impedance matching network provides the user with a broad tuning range.
The network includes a tapped, field changeable series inductor and optional fixed shunt
capacitor(s) enabling the unit to match a wide range of plasma electrode impedances.
An optional common exciter input allows the PB-3 to be used in multiple cathode and substrate
bias applications.
External analog user interface connections permit the PB-3 to be controlled via the user's PLC or
computer.
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This symbol is used only where an immediate hazard exists.
WARNING
CAUTION
When this word is used, immediate danger exists and special
precautions are necessary to prevent possible injury, death or
significant property damage.
This symbol is used when unsafe operating or service
practices could result in damage to the equipment
This icon means "NOTE" or the information following should be
mentally highlighted.
The finger-pointing icon is used to indicate a procedure or step
required before powering on the system.
1.3 MECHANICAL DESCRIPTION
The system's chassis footprint measures 12" W x 7" H x 16" D, the chassis is attached to a 19"
wide rack mount front panel. The cabinet is constructed from chemically treated aluminum
components. The front panel and top cover are removable to provide access to system
components and adjustments.
The PB-3 is designed to be mounted in a 19” electronics rack cabinet.
Cooling air is drawn in through the rear panel inlets and exhausted through a side panel louver.
All operator controls are mounted on the front panel.
AC mains input, RF power output, common exciter in/out and a remote control connector are
grouped together on the rear panel.
The internal matching network is connected to the generator’s output by a short coaxial cable
(terminated with a BNC male connector) that protrudes from the rear of the unit. The matching
network may be bypassed by disconnecting this short cable from the generator’s output and
connecting the load in its place.
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RF Input Connector BNC male coaxial cable connector
Matching Network "L" using a variable shunt capacitor and a tapped series inductor &
variable capacitor. Additional fixed shunt capacitors are installed in the
network, these may be connected in parallel with the variable shunt
capacitor if needed to match low impedance loads.
Matching Network Shunt Capacitor: 1000 pF
Element Values Series Capacitor: 488 pF
Series Inductor: 2.5 uH
Shunt Cap (Fixed) 200 & 400pF
Output Impedance Wide range - will match to all sputtering sources and
plasma etching / deposition electrodes
1.5 SAFETY PRECAUTIONS
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