Dual N & P-Channel Enhancement Mode Field Effect Transistor
General Description Features
February 1996
These dual N- and P-channel enhancement mode power
field effect transistors are produced using Fairchild's
proprietary, high cell density, DMOS technology. This
very high density process is especially tailored to
minimize on-state resistance, provide superior switching
performance, and withstand high energy pulses in the
avalanche and commutation modes. These devices are
particularly suited for low voltage applications such as
notebook computer power management and other
N-Channel 3.7A, 30V, R
P-Channel -2.9A, -30V, R
High density cell design or extremely low R
=0.08Ω @ V
DS(ON)
=0.13Ω @ V
DS(ON)
=10V.
GS
=-10V.
GS
.
DS(ON)
High power and current handling capability in a widely used
surface mount package.
Dual (N & P-Channel) MOSFET in surface mount package.
battery powered circuits where fast switching, low in-line
power loss, and resistance to transients are needed.
DRAIN-SOURCE DIODE CHARACTERISTICS AND MAXIMUM RATINGS
I
S
Maximum Continuous Drain-Source Diode Forward CurrentN-Ch1.2A
P-Ch-1.2
V
SD
t
rr
Notes:
1. R
P
design while R
D
Typical R
Drain-Source Diode Forward
Voltage
VGS = 0 V, IS = 1.25 A
VGS = 0 V, IS = -1.25 A
(Note 2)N-Ch0.81.3V
(Note 2)
P-Ch-0.8-1.3
Reverse Recovery TimeVGS = 0 V, IF = 1.25 A, dIF/dt = 100 A/µsN-Ch75ns
VGS = 0 V, IF = -1.25 A, dIF/dt = 100 A/µs
is the sum of the junction-to-case and case-to-ambient thermal resistance where the case thermal reference is defined as the solder mounting surface of the drain pins. R
JA
θ
(t)
is determined by the user's board design.
CA
θ
T
=
R
θ
a. 78oC/W when mounted on a 0.5 in2 pad of 2oz cpper.
b. 125oC/W when mounted on a 0.02 in2 pad of 2oz cpper.
c. 135oC/W when mounted on a 0.003 in2 pad of 2oz cpper.
T
J−TA
=
(t)
R
θJ A
θJ C+RθCA
for single device operation using the board layouts shown below on 4.5"x5" FR-4 PCB in a still air environment: