TIGHT PROCESS CONTROL AND HIGH
MANUFACTURING YIELDS
DESCRIPTION
This im prov ed version ofMDmesh™ which isbased
on Multiple Drain process represents the new
benchmark in high vo ltage MOSFETs.The resulting
product exhibits even lower on-resistance, impressively high dv/dt and excellent avalanche characteristics. The adoption of the Company ’s proprietary
strip technique yields overall performances that a re
significantly better than that of similar competition’s
products.
APPLICATIONS
The MDmesh™ family is verysuitable forincreasing
power density of high voltage converters allowing
system miniaturization and higher efficiencies.
3
2
1
TO-247
INTERNAL SCHEMATIC DIAGRAM
ABSOLUTE MAXIMUM RATINGS
SymbolParameterValueUnit
V
DS
V
DGR
V
GS
I
D
I
D
I
DM
P
TOT
dv/dt (1)Peak Diode Recovery voltage slope15V/ns
T
stg
T
j
(•)Pulse width limited by safe operating area
January 2003
Drain-source Voltage (VGS=0)
Drain-gate Voltage (RGS=20kΩ)
600V
600V
Gate- source Voltage±30V
Drain Current (continuous) at TC= 25°C
Drain Current (continuous) at TC= 100°C
()
Drain Current (pulsed)180A
Total Dissipation at TC= 25°C
47A
28A
417W
Derating Factor3.33W/°C
Storage Temperature–65 to 150°C
Max. Operating Junction Temperature150°C
Information furnished is believed to be accurate and reliable. However, STMicroelectronics assumes no responsibilit y for the
consequences of use of su ch in formation nor for any in fringement of patents or other rights of third parties w hich may result from
its use. No license is granted by implication or otherwise under any patent or patent rights of STMicroelectronics. Specifications
mentioned in this publication are subject to change without notice. This publication supersedes and replaces all information
previously suppli ed. STMi croelect ronics pr oducts are not author ized for use as cr itical component s in li fe suppo rt devi ces or
systems without express written approval of STMicroelectronics.
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