16-Channel/Differential 8-Channel, CMOS
High Speed Analog Multiplexer
The Hl-516 is a monolithic, dielectrically isolated, highspeed, high-performance CMOS analog multiplexer. It
offers unique built-in channel selection decoding plus an
inhibit input for disabling all channels. The dual function of
address input A
programmed either as a single ended 16-Channel
multiplexer by connecting ‘out A’ to ‘out B’ and using A
a digital address input, or as an 8-Channel differential
multiplexer by connecting A
substrate leakages and parasitic capacitances are reduced
substantially by using the Intersil Dielectric Isolation
process to achieve optimum performance in both high and
low level signal applications. The low output leakage
current (l
(t
SETTLE
D(OFF)
= 800ns to 0.01%) characteristics of the device
make it an ideal choice for high speed data acquisition
systems, precision instrumentation, and industrial process
control.
For MIL-STD-883 compliant parts, request the Hl-516/883
data sheet.
1. For 16-channel single-ended function, tie ‘out A’to ‘out B’; for
dual 8-channel function use the A3 address pin to select
between MUX A and MUX B, where MUX A is selected with A
low.
A
A
A
3
2
1
OUT AOUT B
0
HI-516
3
HI-516 USED AS A DIFFERENTIAL 8-CHANNEL MULTIPLEXER
CAUTION: Stresses above those listed in “Absolute Maximum Ratings” may cause permanent damage to the device. This is a stress only rating and operation of the
device at these or any other conditions above those indicated in the operational sections of this specification is not implied.
NOTE:
2. θJA is measured with the component mounted on an evaluation PC board in free air.
FIGURE 8A. MEASUREMENT POINTSFIGURE 8B. TEST CIRCUIT
FIGURE 8. ENABLE DELAYS
2.4V
3.0V
V
V
OUT
A
∆V
0V
O
V
A
FIGURE 9A. MEASUREMENT POINTSFIGURE 9B. TEST CIRCUIT
∆VO is the measured voltage error due to charge injection. The error in coulombs is Q = CL x ∆VO.
FIGURE 9. CHARGE INJECTION
7
+15V
V+
A0, A1, A2,
A3/SDS
IN
EN
GND VDD/LLS
OUT
A OR B
V-
-15V
V
OUT
CL = 100pF
Die Characteristics
HI-516
DIE DIMENSIONS:
2250µm x 3720µm x 485µm
METALLIZATION:
Type: CuAl
Thickness: 16k
Å ±2kÅ
Metallization Mask Layout
IN 1/1A (19)
IN 2/2A (20)
ENABLE
(18)
HI-516
A
0
(17)
PASSIVATION:
Type: Nitride Over Silox
Nitride Thickness: 3.5k
Å ±1kÅ
Silox Thickness: 12kű2kÅ
WORST CASE CURRENT DENSITY:
5
2
A
(16)
1
1.64 x 10
A
A
2
(15)
/SDS
3
(14)
A/cm
V
DD
(13)
/LLS
GND
(12)
(10) IN 9/1B
(9) IN 10/2B
IN 3/3A (21)
IN 4/4A (22)
IN 5/5A (23)
IN 6/6A (24)
IN 7/7A (25)
IN 8/8A (26)
(27)
-V
(28)
OUT A
(8) IN 11/3B
(7) IN 12/4B
(6) IN 13/5B
(5) IN 14/6B
(4) IN 15/7B
(3) IN 16/8B
(1)+V(2)
OUT B
All Intersil semiconductor products are manufactured, assembled and tested under ISO9000 quality systems certification.
Intersil semiconductor products are sold by description only.Intersil Corporation reserves the right to make changes in circuit design and/or specifications at any time without notice. Accordingly, the reader is cautioned to verify that data sheets are current before placing orders. Information furnished by Intersil is believed to be accurate and
reliable. Howev er, no responsibility is assumed by Intersil or its subsidiaries for its use; nor foranyinfringements of patents or other rights of third parties which may result
from its use. No license is granted by implication or otherwise under any patent or patent rights of Intersil or its subsidiaries.
For information regarding Intersil Corporation and its products, see web site http://www.intersil.com
8
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