Datasheet CB55000 Datasheet (SGS Thomson Microelectronics)

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CB55000 Series
February 2002
FEATURE
0.25 micron drawn (0.20 micron effective channel length process), six layers of metal connected by fully stackable vias and contacts, Shallow Trench Isolation, low resistance, salicided active areas and gates. Deep UV lithography.
2.5 V optimized transistor with 3.3 V I/O and supply interface capabilit y .
Average gate density: 30 K/mm2, plus low power consumption of 70 nanoWatt/Gate/MHz / Stdload.
Two input NAND delay of 90 pS (typical) with fanout=2.
Library available in commercial, industrial and military temperature range with supply ranging from 2.70 V down to 1.8 V for the core according to EIA/JESD 8-5 specification. Additional low voltage range down to 1.5 V for very low voltage/low power applications supported
Broad I/O functionality including: – Low Voltage CMOS. – Low Voltage TTL, PECL, HSTL, SSTL,
LVDS, PCI.
AGP 2X and 4X, USB to support 2.5 V and 3.3 V I/O interface according to EIA/JESD 8A specification.
Drive capability up to 8 mA per buffer with slew rate control, current spike suppression impedance matching, and process compensation capability to reduce delay variation.
Designs easily portable from previous generations of CB45000 through cell mapping with an average factor 2 density increase, 1.7 speed increase and 2.5 power reduction at respective nominal voltages.
Generators to support Single Port, Dual port and multiple Port RAM, and ROMs with BIST options.
Extensive embedded function library including ST DSP and micro-cores, third-party IPs, Synopsys and Mentor Inventra synthetic libraries id ea lly su it e d for c omplete System On Chip fast integration .
80µm pitch linear and 50µm staggered pad
libraries.
Fully independent power and ground configuration for core and I/Os supported.
I/O ring capability up to 1500 pads.
Latch-up trigger current > +/- 500 mA. ESD protection above 4 kV in H.B.M.
Oscillators and PLLs for wide frequency spectrum.
Broad range of more than 600 SSI cells.
Design for test features including IEEE 1149.1 JTAG Boundary Scan architecture.
Synopsys, Cadence and Mentor based design systems with interface from multiple workstations.
Broad range of packaging solutions, including BGA, LBGA, TQFP, PQFP, PLCC up to 1000 pins with enhanced power dissipation options.
1.25 GigaHertzGigabit DLL technique.
CB55000 Super Integration
Cost Effective Product
Architecture partitioning
Trouble-free integration
Application-specific
Your Product is Unique
User specified cell integration
Design confidentiality
IP fully re-usable
DPRAM ST20
ROM
DSP
HCMOS7 Standard Cells
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Figure 1. Metal 1 perspective view
CMOS 0.25µm, Shallow Trench Isolation, M1: Tungsten
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CB55000 Series
1 GENERAL DESCRIPTION
The CB55000 standard cell series uses a high performance, low -voltage, 0.25µm drawn (0.20µm effective), six metal levels CMOS process HCMOS7 to a 90 pico-second internal delay while offering very low power dis­sipation and high noise immunity.
With an average routed gate density of 30,000 gates/mm
2
, the CB55000 family allows the integration of up to 15 million equivalent gates and is ideal for high-c omplexi ty or high-performance devices fo r computer, tel ecom­munication and consumer products.
With a typical gate delay of 70 ps (for a 2-input NAND gate at fan-out 1), the library meets the most demanding speed requirements in telecommunication and computer application designs today.
Optimized for 2.5 V operation, the library features a power consumption of less than 70 nW/Gate/MHz (fan­out=1) and 30 nW/Gate/MHz (fan-out=1) at 1.8 V.
The I/O buffers can be fully configured for both 2.5 V and 3.3 V interface options, with several high speed buffer types available. These include: low voltage differential (LVDS) I/Os, PCI/AGP, PECLs, and HSTL.
The pad pitch down to 50µm, in a staggered arrangement, meets the requirements of high pin-count devices which tend to become pad-limited at such library densities. For very high pin-count ICs, advanced packaging solutions such as Chip Scale Packaging in fine pitch BGA are available.
New packaging solutions using a flip-chip approach are currently being developed.
Figure 2. HCMOS7 Front end cross section
MOS gate length: 0.25µm, Shallow Trench Isolation, M1: Tungsten
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2 TECHNOLOGY OVERVIEW
The advanced HCMOS7 transistor architecture: at 0.25µm drawn length and 0.20µm effective length, very thin gate oxide: 5 nanometers, optimized threshold voltages and salicided source, drain, and gate leads to intrinsi­cally high performances in both N c hannel and P channel driving currents.
The major scaling factor is obtained through deep UV lithography at most masking levels, making sub-micron pitch a reality.
Further integration in the process front-end comes from the use of the Shallow Trench Isolation process be­tween active regions, both improving density and planarity of transistors. In or der to allow full utiliz ation of such transistor density, up to 6 levels of metal are made available for routing.
The first metal level is Tungsten for local interconnection, while the other five metal levels are of low resistivity aluminum for long range interconnection and power distribution.
The thick inter-level dielectric is completely planarized by Chemical Mechanical Polishing, which provides de­fect-free isolation between stripes within the same as well as between different levels.
Usage of Tungsten plugs at contacts and vias allows extremely dense and reliable interconnection between metal layers. These vias and contacts are fully stackable, providing a direct vertical electrical connection from the active level up to the sixth metal level. This efficient interconnect scheme makes routing fast and easy, as well as having a very positive impact on high gate count, random-logic blocks density and routability.
The combination of both high drive and dense transistors, easily interconnected with up to six fine-pitch metal levels and isolated by thick dielectric leads to an optimum gate density, with low parasitic resi stance and capac­itance. This results in very short interconnected gate delay and minimized power consumption.
Figure 3. HCMOS7 Back end Cross Section
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CB55000 Series
3 LIBRARY
The CB55000 library is organized into three categories: – SSI cell libr ar y
– I/O cell library – Macrofunctions
3.1 SSI Cell Library Overview
The design of the CB55000 family has been opti mized to allow e xtremely high density , high speed and low pow­er designs. For these reasons, a wide range of cells with different ranges of driving capabilities are available in the library.
The library cells have been optimized in terms of functional and electrical parameters, in order to have: – Good balancing
– Maximum speed – Optimum threshold voltage –Symmetric V
dd/Vss
noise margins
– Minimum power-speed value The geometrical aspect of the cells was configured to allow an extremely dense design, fully exploiti ng the fea-
tures of the Place and Route tool in terms of horizontal and vertical routing grids. For Place and Route, up to six layers of metal are utilized; the first metal layer is dedicated to intracell wiring, the second layer to power distribution and routing, the third and forth layers to routing, and the fifth and sixth to power distribution, clock bussing and routing.
Figure 4. ND2 f ig ure from C B 55000
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3.2 Core Logic
The propagation delays shown in CB55000 data book are given for nominal processing, 2.5 V, 25°C tempera­ture. However, there are additional factors that affect the delay char ac teristics of the cells. These inc lude: load­ing due to fanout and interconnect routing, supply voltage, junction temperature of the device, processing tolerance and input signal transition time.
Prior to physical layout, the design system can estimate the del ays associated with any criti cal path. The impact of the placement and routing can be accur ately RC back -annotated from the lay out for fi nal simulati ons of critic al timing. The median effects on the cells delay of junction temperature (Kt coefficient) and supply voltage (K v co­efficient) are summarized in the following tables at a fixed cell input slope. A third factor is related to process variations and has a minimum median of 0.84 for best case process and a maximum median of 1.18 for worst case process.
Table 1. Junction temperature multipliers
Table 2. Voltage multipliers
3.3 I/O Buffer Libraries
Two basic buffer libraries are offered with CB55000, one 80µm pad in line pitch library and one 50µm stag­gered pad library to support pad limited designs.
Apart from standard ESD and latch-up protections present in each I/O, a proprietary clamp within each power supply provides proper paths to all types of E SD discharges, efficiently protecting the I/Os. As a result, the buff­ers withstand more than 4 kV ESD according to Mil 883C Human Body Model specification.
In order to limit switching noise and keep a fixed buffer delay, independent of process, supp ly voltage and tem­perature, compensated active slew rate buffers can be selected, providing a fixed and stable dI/dt at 8,16 or 32 mA/ns.
In order to interface with 3.3 V application (from 2.7 up to 3.6 V), a wide range of 3.3 V capable input/output buffers (mixable with standard 2.5V ones) can be chosen. In this case the 3.3 V rail in the chip periphery must be powered through a 3.3 V external supply.
True 5 volt tolerant input buffer is also available with process option.
Temperature (°C)
Kt
-55 .84
-40 .87 25 1.00 70 1.09 85 1.12
105 1.16 125 1.20
V
dd
(V)
Kv
1.80 1.33
2.00 1.21
2.25 1.09
2.50 1.00
2.75 0.94
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CB55000 Series
3.4 I/O Test Interface
The I/O cells have a dedicated test interface to facilit ate parametric and lddq testing of devices. Th is te st i nterf ace connects standard core signals or dedicated test signals to the I/O cells allowing all output buffers to be driven high, low or put into tri-state regardless of the state of the internal logic.
This greatly simplifi es parametric testing of the dev ice and also ass isting customer s who wish to use thi s feature during board testing. Note that all output buffers can be tri-stated by this func tion inc luding buffer s that normall y do not tri-state.
This test function also turns off all pull down resistors
,
shuts down all differential receivers and converts them into standard CMOS receivers. This allows lddq test methodologies to be employed in a very efficient way, avoiding unneeded circuit overhead.
3.5 Macrocells
The CB55000 series has internal macrocells that are robust in variety and performance. The cell selection has been driven by the need of Synthesis and HDL-based design techniques. This offering is rich in buffers, complex combination cells and multi-power drive cells, which allow the Synthesis tool to create a netlist compatible with the requirements of Place and Route tools.
Macrofunctions ar e a series of soft -macros f acil itating qui ck c apt ure of lar ge func tional bl ocks a nd ar e avail able for such functions as counters, shift registers and adders. Macrofunctions are implemented at layout by utilizing macrocells and interconnecting to create the logic function.
3.5.1 Module generator s
A series of module generators using compiled cell generation techniques are available to support a range of megacells. These modules enable the designer to choose individual parameters in order to create a compiled cell, which meets the specific application requirements. These include ROM, single and dual port RAM, multi­port RAM and FIFO.
For most of the above memories, two different generators are provided, one optimized for speed and one opti­mized for power. All memories h ave a compl ete standby mode where current consumptio n is li mited to pr ocess leakage.
Table 3. List of module generators
Generator Description Bit (Min.) Kbit (Max)
Word width
(Max.)
Romd Rom3
High speed Sync. Diffusion ROM Low power Sync. Diffusion ROM
128 128
2000
256
64 32
SPS2 SPS3 SPS4
SPS5 SPS6
High speed Sync. Single port RAM Low power Sync. Single Port RAM Small cuts Sync. Low power Single Port Ram Low power Sync. Single Port RAM High density Low power & voltage High density Sync. Single Port Ram
64 16
2
1000 2000
512
32 16
512
2000
byte write
suppor t ed
64 32
128
64 32
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Embedded Non Volatile Me m ories (OTP, Flash, ...) with specific process options are also under development .
3.5.2 Micro Li brary & I.P.s
MicroLibrary includes an extensive portfolio of microcores and application specific I.P.s; provided through both internal developments and partners licensing agreements.
A short list of this portfolio consists of:
General purpose macro functions. – Microcores (8,16,32 bits) like:8051,ST10,ST20, SH4 ,ARM 7TDM I , – DSP:D950,ST100, – PLL, Frequency synthesizer, Comparato rs, – DAC,ADC (8,10,16 bits).
Application specific I.P.s for: – Data communications (10/100 ETH MAC & PHY, Gigabit,..), – Telecommunication (622MHz phase aligner, clock recovery), – Computer and peripherals (PCI,USB,SSCI,RAMD AC,IEEE1394,FiberChannel), – Audio (CODEC,..).
SPS2HD High speed & density
High density Sync. Single port RAM
64 512 64
DPR2 DPR3
High speed Sync. Dual port RAM Low power Sync. Dual port RAM
64 16
256
32
64 32
DP7E Asynchronous Reg. file
Dual port RAM 1W + 1R
2 16 128
MP7A Multipor t RAM
High density Sync. 2W + 2R or 2W + 4R
2 32 128
FIFO High speed 8 4 32
Table 3. List of module generators
(continued)
Generator Description Bit (Min.) Kbit (Max)
Word width
(Max.)
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CB55000 Series
4 DESIGN FOR TESTABILITY
The test time and cost for ASIC testing increases exponentially as the complexity and size of the ASIC grows. Using a
design-for-testabili ty
methodology allows large, more complex ASICs to be efficiently and economically
tested. At system level, STMicroelectronics fully supports IEEE 1149.1; the I/O structure utilized in this family is com-
pletely compatible. Several types of core scan cells are provided in the CB55000 Series library. Examples in­clude FDxS/FJKxS edge sensitive and LDxS level sensitive cel ls. Non-ove rlapping clock generator macros ar e also available.
Test coverage and reliability are further supported by IDDQ (quiescent current) testing; all blocks are designed to be “IDDQable” so that anomalous leakage due to metal bridging and dielectr ic defects can be screened us ing proper set of vectors extracted from the test patterns.
For parametric and lddq testing, the I/O cells contain a dedicated test interface as described previously (see I/ O Test Interface’ on page 7).
5 EVALUATION DEVICE
As per STMicroelectronics’ standard policy, all cells and macro-blocks are fully validated and characterized on silicon through dedicated test vehicules, before final release in the library. In addition, a 3 million-gates evalua­tion chip: CB55Q, has been designed and in order to demonstrate the performances and qualify the global CB55000 library, as well as verify the effectiveness of the design system.
CB55Q is packaged in a 256 Ball Grid Array (BGA) and permits accurate characterisati on of most representative cells from the libr ary i ncluding I/O buff ers, sin gle and mixed cell chains (I V, ND2, NR2...),Flip-flops and memory cuts from various generators.
Typical result on ring SSI chain in ring oscillator mode show a mean between Thl and Tlh of around 37 ps for an inverter with 1 standard load , and toggle frequency of above 1 GigaHertz for an FD2.
Figure 5. CB55Q Die View
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Figure 6. CB55Q Silicon ring oscillator characterization
6 PACKAGE AVAILABILITY
The CB55000 Series is designed so that it can be made c ompatible with all t ypes of traditional (PLCCs, PQFPs) surface mount packages and also more advanced BGAs and Low Profile BGAs. The main packaging options include:
Plastic Leaded Chip Carriers (PLCC) up to 84 pins, Metric Q uad Flat Pack (xQFP) thi n and standard, up to 208 pins including high power dissipation versions with slug or spreader.
Ball Grid Array package family:
The diversity in pin count and package style gives the designer the opportunity to find the best compromise for system size, cost and performances requirements.
Plastic BGA, 1.27mm ball pitch from 208 to 456 pins High performance BGA, 1.27mm ball pitch from 168 to 640 pins Flip-Chip BGA, 1.27 or 1mm ball pitch from 352 to1000 pins Low profile BGA, 1mm ball pitch from 144 to 256 pins Low profile Fine pitch BGA. 8mm ball pitch from 36 to 180 pins Ultra Fine pitch BGA .5mm ball pitch from 40 to 304 pins
CB55Q Silicon
Ring Os cillator Characterization
3,00E+01
4,00E+01
5,00E+01
6,00E+01
7,00E+01
8,00E+01
9,00E+01
2,3 2,4 2,5 2,6 2,7
Vdd (Volt)
Cell delay (thl+tlh)/2 (ps)
ND2 NR2 IV
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CB55000 Series
Table 4. Package / pin availability
7 DESIGN METHODOL OGY
STMicrolectronics (STM) ASIC design flow is intended for high performance, high complexity submicron ASIC designs. 3rd parties tools from leading EDA vendors such as Synopsys, Cadence, Mentor Graphics and STM proprietary systems are integrated into a framework free design environment that efficiently supports all design phases.
A hierarchical design methodology with a FastLoop, between floorplanning timing-driven placement and syn­thesis/static timing analysis, guarantees a fast timing prediction and closure after routing.
Other features such as hierarchical Clock tree synthesis, advanced test methodology, formal verification, 3D parasitic extraction, Crosstalk analysis, IP-reuse, qualifies the STM ASIC design flow as one of the industry's leading solutions for today's and tomorrow's complex designs.
Pack a g e N a m e
PLCC
TQFP 7x7
TQFP 10x10
TQFP 14x14
TQFP 20x20
TQFP 24x24
PQFP 10x10
PQFP 14x14
PQFP 14x20
PQFP 28x28
PQFP 28x28
with slug
PQFP 28x28
with spreader
Pin Count
20
28
44
❍❍
48
64
❍❍
68
80
❍❍
84
100
❍❍
120
128
❍❍ ❍
144
160
❍❍ ❍
176
208
❍❍ ❍
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8 ELECTRICAL SPECIFICATIONS
Table 5. Absolute Maximum Ratings
(refer to Notes 1 and 2)
Notes: 1. Referenced to Vss. Stresses above those listed under “absolute Maximum Ratings” may cause permanent damage to the device.
This is a str ess rating only and func tiona l operatio n of the devi ce at these or an y other co ndition s above tho se indica ted in the operati on sections of this specifi cation is not implied. Exp osure to absolute maximu m rating condit i ons for exten ded periods m ay affect the device reliability.
2. A dedicated 3.3 V power sup pl y is needed for 3.3 V inputs and ou tputs.
Table 6. Recommended DC Operating Conditions
Notes: 1. Commercial, Industrial, and Military Conditions.
2. Mandatory for 3.3 V buffers only.
3. 3 V buffer specifications are not applicable for main supply below 2.25 V.
4. All circuits will operate to full specifications with a junction temperature of -40 to +125 degrees centigrade. These junctio n temper­atures are compatibl e with the Co m m ercial and Industrial Te m perature Ran ges.
5. All circuits will be functional from -55 to +150 degrees centigrade junction temperature (military Ambient Temperature Range) but will not necessary operate to published specifications. Only circuits specified as operational to extended temperature range may be used when operating to Military temperature conditions.
Table 7. General Interface DC Electrical Characteristics
Symbol Parameters Value Unit
V
dd
2.5 V Power Supply Voltage -0.5 to 3.3 V
2.5 V Input or Output Voltage -0.5 to (V
dd
+ 0.5) V
V
dd
3.3 V Power Supply Voltage -0.5 to 4 V
3.3 V Input or Output Voltage -0.5 to (V
dd3
+ 0.5) V
Main Supply Normal Range Operating Voltage V
dd
(refer to note 1)
2.5 V +/- 10% (2.25 V to 2.75 V)
Additional Ring Supply Voltage (refer to notes 1 and 2) 3.3 V + 0.3V/-0.6 V (2.7 V to 3.6 V) Main Supply Extended Range Operating Voltage
(refer to notes 1 and 3)
2.5 V +/- 10% -28% (1.8 V to 2.75 V)
Operating Ambient Temperature Commercial (refer to note 4) Industrial (refer to note 4) Military (refer to note 5)
0 to 70 degrees Centigrade
-40 to +85 degrees Centigrade
-55 to +125 degrees Centigrade
Symbol Parameter Conditions Min. Type Max Unit
I
il
Low level input current without pull-up device
Vi=0V
1
1
1) The leakage currents are generally very small (<1 an). The value given here, 1µA, is the maximum that can occur after an electrostatic stress on the pin.
µA
I
ih
High level input current without pull-down device
Vi=V
dd
1
1
µA
I
ox
Tri-state output leakage without pull up/ down device
Vo=0V or V
dd
1
1
µA
C
in
Input capacitance
C
out
Output capacitance
C
io
I/O capacitance
I
latchup
I/O latch-up current
V<0V; V>V
dd
2
2) V > V
dd3
for 3.3V buffers.
500
3
3) V > V
dd3
for 3.3V buffers.
mA
V
exd
Electrostatic protection
4
4) Human body model.
Leakage < 1 µA 4000 V
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CB55000 Series
Table 8. Pull-Up and Pull-Down Characteristics
8.1 2.5 V Buffer Specifications
The buffers are called “CMOS” buffers. The nominal supply voltage is 2.25 V < Vdd< 2.75 V. However, the specifications shown in are still valid for lower voltages.
Table 9. Low Voltage CMOS DC Input Specifications
2.5 V output buffers will be offered with passive slew rate control and process-compensated slew rate control. In both cases, the typical output current is that shown in Table 10.
Table 10. Slew Rate Versus Drive
Symbol Parameter Conditions Min. Type Max Unit
I
pu
Pull-up current Vi=0V -50 µA
I
pd
Pull-down current
Vi=V
dd
1
1) Vi=V
dd3
for 3.3V buffer
50 µA
R
pu
Equivalent pull-up resistance Vi=0V 50 k
R
pu
Equivalent pull-down resistance
V
i=Vdd
1
50 k
Symbol Parameter Conditions Min. Type Max Unit
V
il
Low level threshold (input falling)
No Schmitt 0.5*V
dd
V
V
ih
High level threshold (input rising)
No Schmitt 0.5*V
dd
V
V
il
Low level input voltage Schmitt input 0.26*V
dd
V
V
ih
High level input voltage Schmitt input 0.7*V
dd
V
V
hyst
Schmitt trigger hysteresis Schmitt input 0.23*V
dd
V
V
ol
Low level output voltage
1
1) Takes into acc ount 0.075*Vdd voltage drop in both supply lines.
I
ol
=XmA
2
2) “X” is the source/sink current under worst case conditions and is reflected in the name of the I/O cell according to the drive capability.
0.15*V
dd
V
V
oh
High level output voltage
(1)
I
oh
=-XmA
2
0.85*V
dd
V
Drive (mA): 2 4 8 Slew Rate
(mA/ns Typical)
81632
Active Slew Rate (mA/ns Typical)
81632
Typical peak current (mA)
25 50 100
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8.2 3.3 V Buffer Specifications
The 3.3 V buffers comply with the JEDEC s tandard 8- A (June, 1994) . They are als o compati ble w ith the 74VCX DC specifications for 2.7 V to 3.6 V operation. These buffers are called “TTL”, however they also comply with Low Voltage CMOS levels. For all buffers, V
dd
(min) = 2.25 V and Vdd(max) = 2.75 V (core supply).
Table 11. LVTTL and LVCMOS DC Input Specifications (2.7 V < V
dd3
<3.6V)
Table 12. LVTTL DC Output Specifications (3.0 V < V
dd3
<3.6V)
Table 13. LVCMOS DC Output Specifications (2.7 V < V
dd3
<3.6V)
Table 14. Slew Rate Versus Drive
Symbol P arameter Conditions Min. Type Max Unit
V
il
Low level input voltage 0.8 V
V
ih
High level input voltage 2.0 V
V
ilhyst
Low level threshold (input falling)
0.8 1.35 V
V
ihhyst
High level threshold (input rising)
1.3 2.0 V
V
hyst
Schmitt trigger hysteresis 0.3 0.8 V
Symbol Parameter Conditions Min. Type Max Unit
V
ol
Low level input voltage
1,2
1) The output buffers are functional at V
dd3
= 2 . 7 V, but the above sp ecifications are not guaranteed at this voltage.
2) Takes into acc ount a 200 mV voltage drop in both supply lines.
I
ol
=XmA
3
3) “X” is the source/sink current under worst case conditions and is reflected in the name of the I/O cell according to the drive capability.
0.4 V
V
oh
High level input voltage
1,2
I
oh
=-XmA
3
2.4 V
Symbol Parameter Conditions Min. Type Max Unit
V
ol
Low level input voltage I
ol
= 100 µA 0.2 V
V
oh
High level input voltage I
oh
= -100 µAV
dd3
- 0.2 V
Drive (mA): 2 4 8 Slew Rate
(mA/ns Typical)
81632
Typical peak current (mA)
25 50 100
Page 15
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